PURPOSE: To provide a method by which the surface temperature of a sintered nitride body can be measured in a nondestructive way.
CONSTITUTION: By irradiating the surface of a sintered silicon nitride body exposed to a high temperature with X rays, the intensity of diffracted X rays is measured and the ratio of the intensity of diffracted X rays from an arbitrary diffracting surface in a surface-oxide phase to the intensity of diffracted X rays from another arbitrary diffracting surface in β/3-Si3N4 phase which is the main constituent of the sintered body from the measuring signal of the intensity of diffracted X rays. Then the surface temperature of the sintered silicon nitride body exposed to the high temperature is measured from the ratio and exposing time by using previously found relations among the ratio, exposing time, and exposing temperature.
JPH1151770 | RADIATION THERMOMETER |
JP2003139618 | TEMPERATURE MEASURING METHOD AND METHOD AND APPARATUS FOR MANUFACTURING DEVICE |
JP2000051155 | RADIATION THERMOMETER |
TSUNODA HIDEO
UMADA MASAHIRO
TAKITA KATSUHIKO
MATSUO SHIGETO
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