PURPOSE: To eliminate an individual difference caused by human judgement and to surely detect a focus position by providing a focus position detecting pattern capable of moving the focus position.
CONSTITUTION: Phase shift patterns 102 and 103 are provided to come in contact with the long side of a light shielding pattern 101 as a mask. The size and the shape of the patterns 102 and 103 from the end of a light shielding part are made the same, and the phase angle thereof to the wavelength of exposing light to be used is made the same. Provided that the phase angle of a shifter is made a value other than the integer multiple of 180°. In such a case, the movement of the best focus is performed on both sides, that is, a side near to the optical system or a side distant therefrom with respect to the best focus position in the case the shifter does not exist, and the moving direction of the best focus is different between the cases that the phase angle of the shifter is an odd number multiple and an even number multiple other than the integer multiple of 180°. Furthermore, the moving amount of the best focus is decided according to the phase angle of the phase shifter and the size of the shifter.
ONODERA TOSHIO
OTSUKA HIROSHI
Next Patent: HALFTONE SYSTEM PHASE SHIFT MASK AND ITS PRODUCTION