Title:
POSITIVE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2004271844
Kind Code:
A
Abstract:
To provide a positive resist composition exhibiting sufficient transmitting property when a light source at 157 nm is used and improved in development defects, coating property and line edge roughness.
The positive resist composition contains: (A-1) an alkali-soluble fluorine-containing resin having a specified repeating unit; (A-2) a fluorine-containing resin which is decomposed by the effect of an acid having a specified group so as to be soluble with an alkali developing solution; (B) a fluorine-containing low molecular weight compound which is decomposed by the effect of an acid to generate a group soluble with an alkali developing solution; and (C) a compound which generates an acid by irradiation of active rays or radiation.
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Inventors:
MIZUTANI KAZUYOSHI
Application Number:
JP2003061749A
Publication Date:
September 30, 2004
Filing Date:
March 07, 2003
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C08F212/14; C08F216/04; C08F216/14; C08F220/00; C08F232/04; C08F232/08; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; C08F212/14; C08F216/04; C08F216/14; C08F220/00; C08F232/04; C08F232/08; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Hamada
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Hamada