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Title:
PRODUCTION OF SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPS53129970
Kind Code:
A
Abstract:
PURPOSE:To make a flat SiO2 layer by spin-coating liquid glass on a SiO2 layer having protrusions to bury the protrusions thereafter etching the layer from the glass layer side.

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Inventors:
ISHIKAWA TAKASHI
KONDOU HIROYUKI
Application Number:
JP4445977A
Publication Date:
November 13, 1978
Filing Date:
April 20, 1977
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
H01L21/283; H01L21/314; H01L21/316; (IPC1-7): H01L21/283; H01L21/314



 
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