SUBSTRATE-PROCESSING SYSTEM, SUBSTRATE-PROCESSING APPARATUS MANAGING METHOD, SUBSTRATE-PROCESSING APPARATUS, PROGRAM AND STORAGE MEANS

Japanese Patent JP2003086479

A

To provide a technique for efficiently managing the consumption degree of parts of a substrate processing apparatus.

The attrition rate of each part of the substrate-processing apparatus 1 is measured by measuring the use time of the part by a timer 117 or by counting the number of processed substrates using the part. The measured attrition rate of the parts is accumulated as attrition rate information 241, in a hard disk 24 of an information accumulating server 2. The information 241 is obtained from a supporting computer 3, and it is decided for each part, whether or not the consumption degree exceeds a prescribed value. If the resulted value exceeds the prescribed value, an alarming section 313 issues an alarm to urge replacement of the corresponding part, and a order placing signal transmission section 314 transmits an order placing signal for a new part for replacing the corresponding part to an order-placing server 8 of a part center 7.

JPS60169848	DEVELOPING SOLUTION COMPOSITION
JPH07295234	PRINTING PLATE PROCESSING DEVICE
JP3799764	TREATING DEVICE OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE

HAMADA TETSUYA
KAMEI KENJI
INOUE HIDEKAZU
KITAMOTO TORU

JP2001271599A

March 20, 2003

September 07, 2001

Click for automatic bibliography generation  

DAINIPPON SCREEN MFG

G03F7/30; G03F7/20; H01L21/02; H01L21/027; H01L21/677; H01L21/68; (IPC1-7): H01L21/02; G03F7/20; H01L21/027; H01L21/68

JP2000124094A	2000-04-28
JPH10135094A	1998-05-22
JPS62238621A	1987-10-19

Shigeaki Yoshida (2 outside)

Previous Patent: MANUFACTURING METHOD OF SEMICONDUCTOR GAS RATE SENSOR

Next Patent: PRODUCTION SYSTEM OF SEMICONDUCTOR DEVICE