Title:
METHOD FOR MANUFACTURING ARRAY SUBSTRATE, AND ARRAY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2021/077674
Kind Code:
A1
Abstract:
The present invention provides a method for manufacturing an array substrate, and the array substrate. The method for manufacturing an array substrate comprises: depositing a gate metal layer on a base substrate, and enabling the gate metal layer to form a gate electrode by means of a first photolithographic process; sequentially depositing a gate insulating layer, a first semiconductor layer, a second semiconductor layer, a first barrier layer, a second barrier layer and a source-drain metal layer, enabling the first semiconductor layer and the second semiconductor layer to form an active island by means of a second photolithographic process, and forming a source electrode and a drain electrode by means of the source-drain metal layer; depositing a passivation layer, and forming a conductive via in the passivation layer above the drain electrode by means of a third photolithographic process; and depositing a transparent conductive layer, enabling the transparent conductive layer to form a pixel electrode by means of a fourth photolithographic process, and enabling the pixel electrode to be communicated with the drain electrode by means of the conductive via. According to the method for manufacturing an array substrate, and the array substrate, the manufacturing of the array substrate can be realized only by means of four photolithographic processes, the process is simple, and the manufacturing cost is low.
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Inventors:
LIU XIANG (CN)
SUN XUEJUN (CN)
LI GUANGSHENG (CN)
MA QUN (CN)
SUN XUEJUN (CN)
LI GUANGSHENG (CN)
MA QUN (CN)
Application Number:
PCT/CN2020/080722
Publication Date:
April 29, 2021
Filing Date:
March 23, 2020
Export Citation:
Assignee:
CHENGDU CEC PANDA DISPLAY TECHNOLOGY CO LTD (CN)
International Classes:
H01L27/12; H01L21/336; H01L21/77; H01L27/15; H01L27/32; H01L29/786
Foreign References:
| CN110718561A | 2020-01-21 | |||
| CN107968097A | 2018-04-27 | |||
| CN103872141A | 2014-06-18 | |||
| US20170278873A1 | 2017-09-28 | |||
| CN104681626A | 2015-06-03 | |||
| CN104779254A | 2015-07-15 | |||
| CN102916016A | 2013-02-06 | |||
| US20100051934A1 | 2010-03-04 | |||
| US9012994B2 | 2015-04-21 |
Attorney, Agent or Firm:
CHOFN INTELLECTUAL PROPERTY (CN)
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