METHOD FOR PRODUCING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ONIUM SALT COMPOUND FOR ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ONIUM SALT COMPOSITION

WIPO Patent Application WO/2024/024844

A1

The present invention provides: a method for producing an active ray-sensitive or radiation-sensitive resin composition, the method comprising a step (X) for mixing a specified onium salt compound (1) with a specified salt compound (2) in a non-aqueous solvent (S) to obtain a specified onium salt compound (3), a step (Y) for obtaining a specific onium salt compound (A) from the onium salt compound (3), and a step (Z) for mixing the onium salt compound (A) with a resin (B), which solubility in an alkali developer solution changes due to the effect of acid; a method for producing an onium salt compound (A) for an active ray-sensitive or radiation-sensitive resin composition comprising the aforementioned step (X) and step (Y); a pattern forming method; and a method for producing an electronic device.

JP2002371204	MODIFIED CARBON BLACK, PHOTOSENSITIVE BLACK RESIN COMPOSITION AND BLACK MATRIX RESIST COMPOSITION FOR COLORED FILTER
WO/2019/017386	COMPOUND, PATTERN FORMING SUBSTRATE, COUPLING AGENT, AND PATTERN FORMING METHOD
JPH11119017	PRODUCTION OF COLOR FILTER

KANEKO AKIHIRO (JP)
GOTO AKIYOSHI (JP)

PCT/JP2023/027402

February 01, 2024

July 26, 2023

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FUJIFILM CORP (JP)

G03F7/004; C07C25/00; C07C63/70; C07C311/51; C07C381/12; G03F7/039; G03F7/20

JP2020181064A

2020-11-05

KOH-EI, P.C. (JP)

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