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Title:
PHOTOSENSITIVE COMPOSITION PRODUCTION METHOD, PASTY PHOTOSENSITIVE COMPOSITION, ELECTRONIC COMPONENT PRODUCTION METHOD, ELECTRONIC COMPONENT, DEVICE FOR DETERMINING MIXING RATIO FOR ORGANIC COMPONENT IN PHOTOSENSITIVE COMPOSITION, AND COMPUTER PROGRAM
Document Type and Number:
WIPO Patent Application WO/2021/005910
Kind Code:
A1
Abstract:
The present invention provides a photosensitive composition production method comprising: the step of measuring the particle size of a conductive powder to be used to obtain an actually measured value (step S1); the step of comparing the actually measured value with a first correlation formula, which represents the correlation between particles size for the conductive powder and any factor among factors that change in correlation with change in particle size, to identify a predicted offset value for the factor relative to a pre-determined target level (step S2); and the step of determining a mixing ratio for an organic component to cancel out the predicted offset value on the basis of a second correlation formula, which represents the correlation between the factor in the first correlation formula and said organic component, said organic component being any of the organic components included in the photosensitive composition and for which changes in the mixing ratio are correlated with changes in the factor (step S3).

Inventors:
SAGO YUICHIRO (JP)
NAGAE SHOGO (JP)
Application Number:
PCT/JP2020/021134
Publication Date:
January 14, 2021
Filing Date:
May 28, 2020
Export Citation:
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Assignee:
NORITAKE CO LTD (JP)
International Classes:
G03F7/38; G03F7/40; H01B1/00; H01B1/22; H01B13/00
Domestic Patent References:
WO2013118875A12013-08-15
Foreign References:
JP2014170051A2014-09-18
Attorney, Agent or Firm:
ABE, Makoto (JP)
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