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Title:
TREATMENT LIQUID SUPPLY DEVICE, TREATMENT LIQUID SUPPLY METHOD AND COMPUTER STORAGE MEDIUM
Document Type and Number:
WIPO Patent Application WO/2013/018414
Kind Code:
A1
Abstract:
Provided is a treatment liquid supply device for supplying a treatment liquid from a treatment liquid supply source, through a treatment liquid supply tube, to a supply nozzle which supplies the treatment liquid to a substrate. The treatment liquid supply device is provided with: an electrode which is provided in the treatment liquid supply tube and applies DC voltage to the treatment liquid inside the treatment liquid supply tube; a power source unit which applies DC voltage to the electrode in a polarity reversible manner; a washing liquid supply tube which is connected to the treatment liquid supply tube and is for supplying a washing liquid from a washing liquid supply source to the treatment liquid supply tube; and a waste liquid tube for discharging, from the treatment liquid supply tube, washing liquid which has passed the position where the electrode in the treatment liquid supply tube is provided.

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Inventors:
KIYOTOMI AKIKO (JP)
Application Number:
PCT/JP2012/062394
Publication Date:
February 07, 2013
Filing Date:
May 15, 2012
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
KIYOTOMI AKIKO (JP)
International Classes:
B05B15/55; H01L21/027; G03F1/82; G03F7/30; H01L21/304
Foreign References:
JP2006066799A2006-03-09
JP2007035776A2007-02-08
JPH09289156A1997-11-04
JP2010192549A2010-09-02
JPH0794459A1995-04-07
JP2007258367A2007-10-04
JP2003324064A2003-11-14
JP2011100863A2011-05-19
JP2005334775A2005-12-08
JP2010103366A2010-05-06
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
Tetsuo Kanamoto (JP)
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Claims:



 
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