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JP5951223B2 |
The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy...
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JP5948074B2 |
An image forming device is provided that is capable of forming a proper integrated signal even when an image or a signal waveform is acquired from a pattern having the possibility of preventing proper matching, such as a repetition patte...
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JP5946012B2 |
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JP5941704B2 |
The present invention aims at providing a pattern dimension measuring device that realizes the measurement of a dimension of a pattern difficult to set up a measurement box, or between patterns away from each other with high precision. I...
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JP5941782B2 |
An inspection device that performs pattern matching on a searched image performs matching between a template image of an inspection object and the searched image by using: a feature region extraction process unit that extracts a feature ...
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JP2016114473A |
To precisely identify a measurement error by contamination.An error evaluation method includes: a process of performing N scans of each of a plurality of areas set in a sample where a pattern is formed using an electron beam; a process o...
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JP5934309B2 |
The invention relates to a distance measuring device and a method for determining a distance, which uses a sensor in the form of a cavity resonator to determine a distance on a continuous basis and which can be used for a wide range of a...
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JP5934053B2 |
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JP5934501B2 |
A scanning electron beam device having: a deflector (5) for deflecting an electron beam (17) emitted from an electron source (1); an objective lens (7) for causing the electron beam to converge; a retarding electrode; a stage (9) for pla...
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JP5932746B2 |
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JP5932428B2 |
An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conduct...
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JP5924778B2 |
At least two values of an X-ray irradiation width are set for a single specimen. A rocking curve is measured for each of the X-ray irradiation widths. A rocking curve width value is determined for each of the rocking curves. The values o...
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JP5919146B2 |
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JP5919949B2 |
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JP2016065749A |
To provide an eccentricity calculation device and method usable for calculating the eccentricity without relatively requiring labor.An eccentricity calculation device 100 includes: radiating means 110 for radiating a terahertz wave (THz)...
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JP5907343B2 |
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JP2016058637A |
To solve such a problem that when measuring overlay of a pattern formed on the upper and lower layers of a semiconductor pattern, by comparing a reference image obtained by imaging with a SEM and a measurement image, contrast of the SEM ...
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JP5904799B2 |
To solve such a problem that when an internal construction of a sample is analyzed, there is a case where a dedicated device is required, there is a fear of physical damage, such as destruction, loss, or deformation, of the sample due to...
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JP2016053522A |
To provide a distance estimation method for roughly estimating a direction of and a distance to a contaminated region by a radioactive substance at a required resolution with a simple measurement instrument.A distance estimation method i...
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JP2016050771A |
To provide a pattern measuring method capable of accurately measuring a pattern provided on a board, an electronic component manufactured using a pattern measured by the measuring method, and an electronic apparatus and a mobile body com...
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JP2016048297A |
To provide a method and a device for pattern shape evaluation, which enable analysis and evaluation of an exact shape inside a phase defect without spending too much time.Provided is a pattern shape evaluation method including a defectiv...
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JP5899248B2 |
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JP5899678B2 |
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JP5891311B2 |
The purpose of the present invention is to provide a pattern measurement device which evaluates quantitatively and with high precision random patterns such as finger print patterns. In order to fulfill this purpose, a pattern measurement...
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JP5888000B2 |
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JP5880134B2 |
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JP5879953B2 |
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JP5868813B2 |
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JP5868462B2 |
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JP5863832B2 |
A method for positioning a welding head or welding torch of a robot welding system over a workpiece sends microwaves as a measuring signal from a transmitter arranged on the welding head to the workpiece. The microwaves reflected on the ...
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JP5859795B2 |
The objective of the invention is to provide a measuring method that can determine pattern contours and dimensions with high precision even if an object to be measured shrinks due to electron beam radiations. In order to achieve this obj...
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JP5863101B2 |
To measure a thickness dimension or the like of an object to be measured easily and at low cost by means of a simple device and arithmetic processing.An article is created based on design information and includes a substrate of a known X...
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JP5859339B2 |
The present invention includes: a char feeding hopper body that feeds separated char toward a coal gasifier; a char communicating tube that communicates with a bottom portion of the char feeding hopper body and extends in a vertical axis...
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JP5857106B2 |
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JP2016024113A |
To provide a cable search machine and a cable search method capable of dispensing with operation for allocating receivers to a plurality of cables one by one and alleviating operator's burden.A cable search machine of the present inventi...
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JP2016017855A |
To provide a new X-ray inspection device capable of cutting to separate a portion with a foreign object and a normal portion even if a foreign object is in an article.An X-ray inspection device comprises: image-forming means for irradiat...
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JP5847674B2 |
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JP5839284B2 |
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JP5835892B2 |
A drawing apparatus performs drawing on a substrate with a plurality of charged particle beams. The apparatus comprises a stage configured to hold the substrate and to be moved; a projection system configured to project the plurality of ...
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JP2015230210A |
To highly accurately evaluate the density and shape of a CNT (Carbon NanoTube).An evaluation method includes the steps of: applying an X ray 50 having irradiation intensity to a carbon nanotube 12 growing on a substrate 10; detecting tra...
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JP5831323B2 |
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JP5831144B2 |
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JP2015219129A |
To save space by making a horn length short even when millimeter waves are used, while using a horn antenna having a simple structure.A surface detection device for blast furnace charging materials includes: a reflection plate disposed d...
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JP5817383B2 |
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JP5818904B2 |
The invention relates to a measurement means and a method for measuring and/or acquiring layer thicknesses and/or voids of one or more layers of a wafer stack on a plurality of measuring points distributed on the wafer stack and a corres...
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JP5813468B2 |
A scanning electron microscope (SEM) is configured so that SEM images are acquired while scanning a pyramid pattern on a sample plane from four directions. Landing angle of the electron beam is calculated from these SEM images, which are...
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JP5813413B2 |
In the present invention, at the time of measuring, using a CD-SEM, a length of a resist that shrinks when irradiated with an electron beam, in order to highly accurately estimate a shape and dimensions of the resist before shrink, a shr...
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JP5809997B2 |
One of the objects of the present invention is to provide a semiconductor measurement apparatus capable of obtaining a measurement result that appropriately reflects the deformation of a pattern even if plural causes for the deformation ...
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JP5810181B2 |
An image for measuring a pattern or an image for making positioning for measurement is formed by scanning a sample with a focused electron beam and an estimation value of the image is compared with an image estimation value of a previous...
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JP5807303B2 |
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