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JP6215298B2 |
An object of the invention is to provide a charged particle beam apparatus capable of performing high-precision measurement even on a pattern in which a width of edges is narrow and inherent peaks of the edges cannot be easily detected. ...
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JP2017187302A |
To provide a fluid measurement system capable of measuring distribution of a substance under measurement in an exhaust gas processing device without having to modify the device for the measurement.A fluid measurement system 1 includes a ...
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JP6210841B2 |
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JP6212388B2 |
A method and device for measuring the thickness of a coating material layer of a running strip according to which, by means of an eddy current sensor for at least one area of the strip, a quantity is measured, representative of the thick...
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JP2017181262A |
To provide a measuring system which can extract particles from an electron microscope image of the particles in a liquid.The method includes: sampling means for dropping a liquid containing specific particles to a film-like filter with p...
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JP6207893B2 |
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JP6208958B2 |
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JP6194226B2 |
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JP2017150485A |
To provide a system and method for detecting distortion in a component of a gas turbine engine.The present disclosure is directed to a system 100 and method for detecting distortion in a component 102 of a gas turbine engine. The system ...
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JP2017151159A |
To inspect patterns with high accuracy, and to prevent throughput from being reduced.An inspection apparatus according to an embodiment comprises: an irradiation part for irradiating a substrate 110 with multiple beams including energy b...
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JP2017151053A |
To provide a thickness measurement device free from errors in thickness measurement of a measurement object.A thickness measurement device 1 comprises: a radiation source 10 which irradiates a measurement object 90 with radiation; a main...
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JP6188695B2 |
One embodiment relates to a method of classifying a defect on a substrate surface. The method includes scanning a primary electron beam over a target region of the substrate surface causing secondary electrons to be emitted therefrom, wh...
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JP6184490B2 |
Structural parameters of a specimen are determined by fitting models of the response of the specimen to measurements collected by different measurement techniques in a combined analysis. Models of the response of the specimen to at least...
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JP2017142126A |
To provide a thickness specifying method of a lower part of a reactor pressure vessel capable of accurately monitoring a thickness of the lower part of the reactor pressure vessel at a time of a severe accident.A thickness specifying met...
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JP2017138296A |
To solve the following problem: when a search for a radiation source of unknown generating position is performed in a three-dimensional space, the efficiency of the search is enhanced if a space to be scanned is prelimited with respect t...
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JP6177615B2 |
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JP6173659B2 |
To improve throughput by acquiring and length-measuring a minimum image including an edge part of a pattern to be measured on a sample, and while securing reproducibility of length measurement, shortening image acquisition time in an app...
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JP6171940B2 |
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JP6165207B2 |
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JP6167182B2 |
Provided is an apparatus and method for measuring a thickness of thin film using x-ray where a thickness of a thin film of nanometer_(nm) level can be accurately measured without destructing an target sample, through determination of thi...
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JP6165444B2 |
This charged-particle beam device changes conditions for combining an intensity ratio between upper and lower deflectors and rotation angles of the deflectors in multiple ways when obtaining images having different pixel sizes in the ver...
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JP2017121647A |
To provide a projection arrangement measuring method of a checkered steel plate capable of measuring arrangement of projections on the checkered steel plate without using an optical device; and to provide a measuring apparatus.When measu...
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JP6160170B2 |
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JP6151721B2 |
An analytical model simulates the propagation of radiation through a coated continuous web where layer thickness and refractive index, as variables, determine the speed and direction of transmitted radiation. The model predicts character...
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JP6147879B2 |
To provide a method for easily and robustly measuring an overlay in an area where an actual device circuit pattern is formed in manufacturing a semiconductor device.An overlay measuring method is a method for measuring an overlay of a se...
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JP6147602B2 |
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JP6147868B2 |
The present invention is: a pattern measurement device that, regardless of increased fineness, deviation, or the like of a pattern, accurately and stably performs measurement on the basis of edge identification or pattern or edge judgmen...
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JP6147852B2 |
Provided is a device capable of suppressing a drop in detection accuracy, and a manufacturing method of a structure. A detection device (1) is a device that irradiates a subject (S) with X-rays and detects the X-rays transmitting through...
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JP2017102039A |
To provide a pattern measurement program, method, and device in which the effect of noise is small, and with which it is possible to make appropriate measurement up to a high frequency component.The program includes the steps of: detecti...
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JP2017096625A |
To provide a pattern measurement device for quantitatively evaluating influence caused by existence of pattern deformation in a circuit, and a computer program.A pattern measurement device performs dimension measurement of a first interv...
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JP6133603B2 |
To provide a technique for automating classification about length measurement and shape observation that has been performed visually and for supporting determination by an operator.An inspection data processing device for a charged parti...
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JP6134366B2 |
An object of the present invention is to provide an image processing apparatus and a computer program which detects a defect such as a scum at high speed and with high precision. In order to accomplish the above-described object, the pre...
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JP6133725B2 |
Pattern critical dimension measurement equipment includes an electron source configured to generate a primary electron beam, a deflector configured to deflect the primary electron beam emitted from the electron source, a focusing lens co...
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JP6130234B2 |
A metallic reflection plate is disposed so as to face oppositely an antenna connected to a transmitter-receiver. A detection wave from the antenna is reflected by the reflection plate so as to enter an interior of a blast furnace through...
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JP6128009B2 |
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JP6129651B2 |
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JP6122796B2 |
In an X-ray thickness gauge 100 provided with an X-ray generator 1 which is provided with a cooling unit 1b to cool an X-ray tube 1a with cooling medium, and a power source unit 1c to supply a power source to be applied to the relevant X...
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JP6118505B2 |
In order that a displacement between patterns of different heights, formed on a sample in a plurality of different pattern-forming steps, can be measured at fixed throughput and with high accuracy, correspondence between parameters of le...
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JP2017067442A |
To provide a pattern measurement device that properly evaluates a pattern formed by a patterning method that forms a pattern nonexistent in a photomask.To achieve the above objective, the present invention proposes a pattern measurement ...
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JP2017067443A |
To provide a pattern measurement device that quantitatively evaluates a pattern formed by a DSA method with high accuracy.The present invention proposes a pattern measurement device for measuring a dimension between patterns formed in a ...
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JP6106573B2 |
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JP6111220B2 |
To provide a tire condition detection device which can reduce the electric power consumption when detecting the condition of a tire using an electric wave.Each of a plurality of wheels includes a tire sensor unit 13 which detects a dista...
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JP6108684B2 |
An improved method of high accuracy beam placement for local area navigation in the field of semiconductor chip manufacturing is described. Preferred embodiments of the present invention can be used to rapidly navigate to one single bit ...
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JP6101445B2 |
To provide a signal processor which sets proper smoothing conditions in spite of changes in the kind of a material and the shape of a pattern, etc., and a charged particle beam device.There are provided: a signal processor which performs...
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JP6096725B2 |
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JP6088523B2 |
An improved apparatus for determining the position of a drive rod within the interior of a drive rod housing includes a transmission antenna at one location on the housing and a receiving antenna at another location on the housing. An el...
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JP6088803B2 |
An image processor, a method for generating a pattern using self-organizing lithographic techniques, and a computer program are provided to achieve image processing suitable for addressing a sample generated by patterning using Directed ...
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JP6088337B2 |
A first differential image of a defect observation region including an observation target pattern is generated by a differential value between signals from electron detectors arranged in a direction of edges of the observation target pat...
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JP2017032365A |
To provide a pattern measurement method and measurement device that appropriately evaluate pattern deformation and the like generating due to a micro loading effect.A pattern measurement method and device measuring a dimension of a patte...
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JP6078356B2 |
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