Title:
極端紫外光を用いる半導体露光装置
Document Type and Number:
Japanese Patent JP5061069
Kind Code:
B2
More Like This:
Inventors:
Masato Moriya
Wakabayashi Osamu
Georg Smann
Wakabayashi Osamu
Georg Smann
Application Number:
JP2008226548A
Publication Date:
October 31, 2012
Filing Date:
September 04, 2008
Export Citation:
Assignee:
Gigaphoton Co., Ltd.
International Classes:
H01L21/027; G02B5/08; G02B5/10; G02B19/00; G03F7/20
Domestic Patent References:
| JP2004506315A | ||||
| JP2004108876A | ||||
| JP2003084095A | ||||
| JP2005142569A | ||||
| JP2009272622A | ||||
| JP2005049845A | ||||
| JP2005302998A | ||||
| JP7297103A | ||||
| JP4120717A | ||||
| JP62502145A | ||||
| JP2002184691A | ||||
| JP9021900A | ||||
| JP2004258423A | ||||
| JP2007273749A |
Foreign References:
| US20060087738 | ||||
| US4915463 | ||||
| US6469827 | ||||
| US20040007902 |
Attorney, Agent or Firm:
Hiroaki Sakai