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Title:
ALTERNATING PHASE SHIFT MASK
Document Type and Number:
WIPO Patent Application WO2002088844
Kind Code:
A3
Abstract:
A photoresist mask (30) used in the fabrication of an integrated circuit is described. This mask (30) can include a first portion (32) having a phase characteristic; a second portion (32) being located proximate the first portion (32) and having the same phase characteristic as the first portion (32); and a segment (38) disposed between the first portion (32) and the second portion (34) to prevent phase conflict between the first portion (32) and the second portion (34).

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Inventors:
KIM HUNG-EIL
Application Number:
PCT/US2001/049828
Publication Date:
September 12, 2003
Filing Date:
December 19, 2001
Export Citation:
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Assignee:
ADVANCED MICRO DEVICES INC (US)
International Classes:
G03F1/30; (IPC1-7): G03F1/00
Foreign References:
US5576126A1996-11-19
US5672450A1997-09-30
US5538815A1996-07-23
Other References:
SOCHA R J ET AL: "Resolution enhancement with high transmission attenuating phase shift masks", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 3748, 13 April 1999 (1999-04-13), pages 290 - 314, XP002219911
LIN B J: "PHASE-SHIFTING MASKS GAIN AN EDGE", IEEE CIRCUITS AND DEVICES MAGAZINE, IEEE INC. NEW YORK, US, vol. 9, no. 2, 1 March 1993 (1993-03-01), pages 28 - 35, XP000441752, ISSN: 8755-3996
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