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JP2022141597A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided a salt represented by a formula (I), an acid generator, and a resist compositio...
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JP7140729B2 |
To provide a distillation separating device and a method for TCB that can reduce TCB included in PCB to the utmost, and can thereby reduce the amount of a catalyst used for dechlorination on PCB and lower the costs for harmless facilitie...
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JP7140730B2 |
To provide a distillation stabilization method for realizing stable distillation by using respective substitutes of PCB and TCB even when the PCB and the TCB mixedly exist.In a distillation stabilization method for separating an object d...
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JP7137590B2 |
A process for fluorination of aromatic compounds employing iodonium ylides and applicable to radiofluorination using 18F is described. Processes, intermediates, reagents and radiolabelled compounds are described.
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JP7130491B2 |
An organic compound that emits red light having a long wavelength is represented by formula (1). In formula (1), R1to R24are each independently selected from the group consisting of a hydrogen atom, a halogen atom, a substituted or unsub...
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JP2022538487A |
A liquid crystal medium and a liquid crystal display containing it and compounds are provided. The invention relates to a liquid-crystalline medium having a nematic phase and comprising one or more compounds of the formula X and to the u...
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JP7123958B2 |
The invention relates to a new process for the manufacture of fluoroaryl compounds and derivatives thereof, in particular offluorobenzenes and derivatives thereof, and especially wherein said manufacture relates to an environmentally fri...
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JP2022121449A |
To stably synthesize a graphene nanoribbon having a predetermined length and width.A compound represented by general formula (1) is used as a precursor of a graphene nanoribbon. In general formula (1), s is an integer of 1-3, t is an int...
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JP7113630B2 |
To provide a difluoromethylene compound useful as a synthetic intermediate of medical and agricultural chemicals and functional materials; and a production method thereof.The invention provides: a fluorine-containing compound represented...
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JP7091218B2 |
To provide an organic compound.Provided is an organic compound represented by the following general formula (1). In the formula (1), Rto Rare each independently selected from the group consisting of a hydrogen atom, a halogen atom, a sub...
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JP7088690B2 |
To solve such problems that the replacement of a nitro group with a hydrogen atom in production of an aromatic compound requires two-type reactions different from each other comprising reduction to an amino group and conversion of diazon...
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JP2022089280A |
To provide a highly active heat-sensitive or active energy ray-sensitive acid generator which has excellent acid-generating ability upon irradiation with heat or an active energy ray and improves storage stability of a curable or resist ...
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JP2022087523A |
To provide a dibenzo[g,p]chrysene derivative that has four or more substituent groups making it easier to dissolve in an organic solvent and a halogeno group selectively at four or more positions making it easier to react.Provided is a d...
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JP7075544B2 |
The invention discloses a method for the preparation of fluoro alkylated compounds by homogeneous Ni catalyzed fluoro alkylation with fluoro alkyl halides in the presence of a base.
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JP2022078721A |
To provide, e.g., a graphene nanoribbon capable of enhancing the selection freedom of a bandgap value.The graphene nanoribbon has as a repeating unit a compound represented by the structural formula (1), where n1 and n2 represent integer...
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JP2022077982A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.The salt represented by formula (I), the acid generator, and the resist composition are provided. ...
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JP2022075556A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.The salt represented by formula (I), the acid generator, and the resist composition are provided. ...
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JP7071036B2 |
The invention relates to a new process for the manufacture or synthesis, respectively, of acylated or alkylated aryl compounds, for example, acylated or alkylated benzenes, by the so-called Friedel-Crafts reaction, and a new catalyst the...
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JP7069027B2 |
The present invention relates to a process to produce compounds of the formula (1) which are suitable for use in electronic devices, as well as to intermediate compounds of formula (Int-1) and compounds of formula (1-1) and (1-2) obtaine...
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JP7067081B2 |
A resist composition comprising a base polymer and a quencher in the form of an iodonium salt of fluorinated aminobenzoic acid, fluorinated nitrobenzoic acid or fluorinated hydroxybenzoic acid offers a high dissolution contrast and minim...
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JP7041204B2 |
Iodine-containing photoacid generators and compositions including the same. A photoacid generator compound is provided having formula (I) wherein, in formula (I), the groups and variables are the same as those described in the specificat...
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JP2022042339A |
To provide a method for producing p-dichlorobenzene that has a small amount of unreacted chlorine to occur in a reaction system having a phenothiazine compound as a cocatalyst, which has high selectivity of p-dichlorobenzene.A method for...
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JP7035101B2 |
The invention relates to compounds of the formula I, to a liquid-crystalline medium which comprises at least one compound of the formula I, in which R1, R1*, L1, L2, L3 and L4 have the meanings indicated herein, and to the use thereof fo...
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JP7032549B2 |
The present invention provides: an active-light-sensitive or radiation-sensitive resin composition containing (A) a resin that decomposes due to the action of an acid, the degree of solubility increasing in an alkaline developing solutio...
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JP2022034432A |
To provide a dibenzo [g, p] chrysene derivative that is easily dissolved in organic solvent and has selectively halogeno groups at symmetrical two positions: the positions 2 and 7 or the positions 10 and 15.The present invention disclose...
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JP7023080B2 |
In a cross coupling reaction, in a case where a halogen atom is selected as the leaving group of the raw material compound, a harmful halogen waste forms as a by-product after the reaction, and disposal of the waste liquid is complicated...
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JP2022018084A |
To provide a compound which has a large refractive index anisotropy (Δn), a sufficiently high Tni and high compatibility with a liquid crystal composition and exhibits a large dielectric anisotropy (Δε) in a high frequency region and ...
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JP2022506382A |
The present invention relates to compounds that can be used as active compounds in organic electronic devices, especially for use in electronic devices. The present invention further relates to a method for producing a compound according...
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JP2022009119A |
To provide an excellent composition for a charge transport film and an electron-accepting compound with which it is possible to obtain an organic electroluminescent device which has excellent heat resistance as well as high hole injectio...
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JP6994496B2 |
Disclosed are an aromatic acetylene or aromatic ethylene compound, an intermediate, a preparation method, a pharmaceutical composition and a use thereof. The aromatic acetylene or aromatic ethylene compound has a significant inhibitory e...
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JP2021187752A |
To provide a method of economically and conveniently producing 2,3,4,5,6-pentafluorostyrene.The production method comprises reacting a pentafluorophenyl-zinc halide represented by the general formula (1) in the figure (where X represents...
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JP2021187753A |
To provide a method of economically and conveniently producing 2,3,4,5,6-pentafluorostyrene.The production method comprises reacting a pentafluorophenyl-zinc halide represented by the general formula (1) in the figure (where X represents...
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JP6977033B2 |
Provided herein is a process for preparing triaryl organoborates proceeding from alkyl or cycloalkyl boronates in the presence of an n-valent cation 1/n Kn+ to obtain organoborates of the formula 1/n Kn+R34B−—R1 (IV), where one equiv...
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JP6973208B2 |
A graphene nanoribbon precursor has a structure that is indicated by a predetermined chemical formula. In the chemical formula (1), n1 is an integer that is greater than or equal to 1 and less than or equal to 6; X, Y, and Z are F, Cl, B...
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JP6970031B2 |
The present invention relates to a method for refining a specific organic compound which is a target compound from at least two types of organic compounds. One example of the refinement method of the present invention is a method includi...
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JP6968809B2 |
The present invention concerns a method of synthesizing a iodo- or astatoarene comprising the reaction of a diaryliodonium compound with a iodide or astatide salt, respectively. The invention also relates to said iodo- or astatoarene and...
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JP2021176823A |
To provide a manufacturing method capable of selectively and simply preparing dibenzo[g, p] chrysene into which 4 hydroxyl groups are position selectively introduced with very small amount of a byproduct of an isomer, and a novel dibenzo...
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JP6952113B2 |
The invention relates to a process for preparing triaryl organo borates proceeding from organoboronic esters in the presence of an n-valent cation 1/n Kn+, comprising the anhydrous workup of the reaction mixture and the use of the triary...
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JP6949855B2 |
There is provided a substituted bis(trifluorovinyl)benzene compound that is excellent in heat stability and is industrially useful, and a method for producing the same. There are used a substituted bis(trifluorovinyl)benzene compound rep...
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JP2021155329A |
To provide a method for producing graphene nanoribbon, and in which a graphene nanoribbon having predetermined length and width is stably synthesized.In a method for producing graphene nanoribbon, as a precursor of graphene nanoribbon, a...
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JP2021526140A |
The present invention is based on the formula Ar-R.1The present invention relates to the method for preparing the polyfluorinated compound of (I). However, Ar-R1(I) is an aromatic ring system(However, R1Is SF4Cl, SF3,SCIENCE FICTION2CF3,...
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JP2021147381A |
To provide a method for efficiently producing an aromatic compound containing a halogen group(s).Provided is a method for producing a halogen compound represented by the following general formula (1), comprising reacting an iodine compou...
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JPWO2020071018A1 |
We will build a technology that can synthesize aromatic sodium compounds easily, in a short time, and efficiently with a small number of steps. In the reaction solvent, the general formula I (R)1-X1) [Here, in the formula, R1Is an alkyl ...
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JP6920615B2 |
To provide a method for producing graphene nanoribbon, and in which a graphene nanoribbon having predetermined length and width is stably synthesized.In a method for producing graphene nanoribbon, as a precursor of graphene nanoribbon, a...
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JP6923559B2 |
Disclosed is a fluorination method comprising providing an aryl fluorosulfonate and a fluorinating reagent to a reaction mixture; and reacting the aryl fluorosulfonate and the fluorinating reagent to provide a fluorinated aryl species.Al...
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JP6914577B2 |
The present specification provides a method for preparing a styrene monomer including preparing a styrene monomer of Chemical Formula 2 by reacting a compound represented by Chemical Formula 1 in the presence of phosphoric acid, wherein ...
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JP2021091666A |
To provide a chemically amplified resist composition that has high sensitivity in photolithography using, as a light source, high energy rays such as KrF excimer laser light, ArF excimer laser light, electron beams, extreme ultraviolet r...
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JP2021070676A |
To provide an organic compound excellent in chromatic purity based on a conventional skeleton.An organic compound includes: a base skeleton of a condensed ring structure; an electron-attracting group bonded to the base skeleton; and an e...
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JP2021070684A |
To provide a method of efficiently producing an aromatic compound including a halogen group of interest.A method of producing a halogen compound represented by the specified general formula (1) comprises reacting a compound represented b...
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JP6867590B2 |
A compound represented by the following general formula (1) is used as a precursor of a graphene nanoribbon: where X's are independent of each other and are leaving groups, R's are independent of one another and are hydrogen atoms, fluor...
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