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JP7371574B2 |
An onium salt having a partial structure of formula (A) is provided wherein Ra1 and Ra2 are hydrogen or a C1-C10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH2— may be replaced by —O— or —C(═O)—,...
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JP7367503B2 |
To provide a composition that has a liquid crystal phase in a broad temperature range, is excellent in solubility to a liquid crystal composition, and is stable to heat or light, while realizing high Δn, a liquid crystal composition tha...
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JP7363742B2 |
An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits di...
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JP2023152862A |
To provide a photoactive compound, a photoresist composition containing the same, and a pattern formation method.A photoactive compound is represented by formula (1a) or (1b). (In formula, R1 is substituted or unsubstituted C1-30 alkyl, ...
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JP7361820B2 |
Iodine-containing photoacid generators and compositions including the same. A photoacid generator compound is provided having formula (I) wherein, in formula (I), the groups and variables are the same as those described in the specificat...
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JP2023150474A |
To provide a novel method with which a fluorine-containing aromatic compound such as perfluorotoluene is efficiently produced.A compound represented by general formula (2) {In formula, X3 identically or differently represents a hydrogen ...
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JP7354557B2 |
To provide a high molecular weight compound useful for manufacturing a light emitting element excellent in luminance life.There is provided a high molecular weight compound having a constitutional unit consisting of a group by excluding ...
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JP2023138106A |
To produce optically active tetrafluoroiodophenylalanine using a highly versatile and simple process.Tetrafluoroiodobenzoic acid is produced by mixing tetrafluorobenzoic acid with an iodine solution and n-BuLi, and tetrafluoroiodobenzyl ...
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JP7353012B2 |
The invention relates to a use of a fluorination gas, wherein the elemental fluorine (F2) is present in a high concentration, for example, in a concentration of elemental fluorine (F2), especially of equal to much higher than 15 or even ...
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JP7353013B2 |
The invention relates to process for the manufacture or preparation of fluorinated benzene, in particular monofluorobenzene, in a vapor-phase fluorination process. The process of the invention, for example, can comprise a batch or contin...
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JP7353011B2 |
The invention relates to a new process for the manufacture or synthesis, respectively, of fluorinated benzenes and fluorinated benzophenones, and derivatives thereof, in particular of fluorobenzenes and derivatives thereof. The present i...
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JP2023119583A |
To provide a fluorinated material for patterning a metal or an electrode (cathodes) that can reduce time and cost required for a patterning process while forming a precise electrode pattern in a display device.Disclosed is a fluorinated ...
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JP2023116405A |
To provide an industrially practical production method of a compound obtained by cyclizing an octafluorobutyl group derived from a raw material and adding the group to an aromatic compound, and to provide a novel fluorine-containing cycl...
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JP2023116173A |
To provide a liquid crystalline compound having low phase transition temperature and excellent processability and a method for producing the same.A liquid crystalline compound herein has a 6,7-dihydro-5H-dibenzo[a,c][7]annulene skeleton ...
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JP7330456B2 |
An object of the present invention is to provide a novel compound having the same packing structure and exhibiting superior solubility in organic solvents compared to curved nanographene, and a method for producing the same. It was found...
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JP2023116474A |
To provide a carboxylic acid iodonium salt that gives a resist composition, used as a quencher in photolithography with high energy rays such as KrF or ArF excimer laser beams, EB, EUV as a light source, excelling in rectangularity, and ...
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JP2023535330A |
The present specification relates to methods of making deuterated aromatic compounds and deuterated reaction compositions.
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JP2023535329A |
The present specification relates to methods of making deuterated aromatic compounds and deuterated reaction compositions.
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JP2023111911A |
To provide ylide-functionalized phosphane ligands, production thereof, use thereof in transition metal compounds, and use thereof as catalysts in organic reactions.It has now been found that the ylide-functionalized phosphane ligands of ...
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JP2023101396A |
To provide a resist composition for organic solvent development from which a resist pattern having good CD uniformity can be produced.The resist composition contains: a carboxylic acid generator containing a carboxylate represented by fo...
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JP2023101395A |
To provide a salt, a resin, and a resist composition which allow a resist pattern having good line edge roughness to be produced.The resist composition contains: an acid generator containing a salt represented by formula (I); and a resin...
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JP7310724B2 |
An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of goo...
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JP2023094591A |
To provide compounds and compositions that can be used as liquid crystal materials in adjustable ophthalmic lenses.The present invention provides a compound having a structure of formula (I). (R1 is H, C1-C10 alkyl, halogen or the like; ...
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JP7298105B2 |
A full continuous flow synthesis process of fluorine-containing aromatic hydrocarbon compounds. Aromatic amine and hydrogen fluoride are respectively pumped into thermostats A and B, then flow into micro-channel reactor C for salt formin...
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JP7295451B2 |
The present invention makes it possible to efficiently produce a perfluoroalkyl group-containing aromatic compound by reacting, in a solvent, a compound represented by general formula (3): R6Cu (3) [where R6 indicates a perfluoroalkyl gr...
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JP7289729B2 |
An organic compound is represented by formula (1). In the formula (1), R1 to R24 are each independently selected from the group consisting of a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or u...
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JP2023081337A |
To provide a salt that enables production of a resist pattern having good resistance to pattern collapse, an acid generator, and a resist composition including the same.Salt represented by formula (I), an acid generator including the sal...
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JP7285144B2 |
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF).The salt is represented by formula (I) [where Rrepresents a fluorine atom or the like; nn1 represents an integer of 1-5; Rrepresents a C1-8 alk...
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JP7283374B2 |
A resist composition comprising a base polymer and a quencher in the form of an ammonium salt compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent ...
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JP7282741B2 |
The invention relates to ylide-functionalized phosphane ligands, the production of same and use in transition metal compounds, as well as the use of same as catalysts in organic reactions.
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JP7280264B2 |
The invention relates to a use of a fluorination gas, wherein the elemental fluorine (F2) is preferably present in a high concentration, for example, in a concentration of elemental fluorine (F2), especially of equal to much higher than ...
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JP7279412B2 |
To provide a method for producing a novel aromatic compound which is a coating-type organic semiconductor material having high carrier mobility, high thermal resistance, and appropriate solubility.Provided is a production method, compris...
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JP2023070620A |
To provide a dibenzo [g,p] chrysene derivative having horizontally asymmetrical substituent to a central naphthalene ring, and a method for producing the derivative, especially a dibenzo [g,p] chrysene derivative having a same first subs...
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JP2023067756A |
To provide a polymer compound useful for manufacturing a light-emitting element excellent in luminance life.The polymer compound according to one embodiment contains a constituent unit represented by formula (1). [X0 is -C(R1)2-, -N(R1')...
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JP7254552B2 |
An organic compound is represented by formula (1) below. In the formula (1), R1to R24are each independently selected from the group consisting of a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted ...
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JP7226017B2 |
A graphene nanoribbon precursor having a structural formula represented by a following chemical formula (1), wherein in the following chemical formula (1): n is an integer greater than or equal to 0; X is bromine, iodine or chlorine; and...
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JP7224813B2 |
To provide an organic compound that allows red emission with high color purity in a long wavelength region by a basic skeleton itself.The present invention provides an organic compound illustrated by general formula [1]. In general formu...
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JP7223445B2 |
Provided is a method for preparing a coupled body represented by general formula (3), the coupled body being obtained by reacting a compound represented by general formula (1) and a compound represented by general formula (2) in the pres...
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JP7220450B2 |
To manufacture an aromatic iodine compound under a mild condition at low cost and high yield.There is provided a manufacturing method of an aromatic iodine compound by reacting an aromatic compound and an iodination agent in a presence o...
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JP7205419B2 |
A novel onium salt having formula (1) and a resist composition comprising the same as a quencher are provided. When the resist composition is processed by photolithography using high-energy radiation, there is formed a resist pattern whi...
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JP2022190871A |
To provide a production method for producing a compound suitable as an acid generator for a resist composition at high yield.A method for producing a compound includes the steps of: subjecting a compound represented by general formula (C...
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JP7182971B2 |
An organic compound represented by formula (1). In the formula (1), each of Ri to R22is independently selected from the group consisting of a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or uns...
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JP2022179407A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided a salt represented by a formula (I), an acid generator, and a resist compositio...
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JP2022179408A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided a salt represented by a formula (I), an acid generator, and a resist compositio...
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JP7179564B2 |
To provide an organic compound that outputs red light emission of long wavelength.The present invention provides an organic compound represented by general formula (1) [In formula (1), Rto Rare independently selected from a hydrogen atom...
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JP2022171610A |
To provide a salt which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.There are provided a salt represented by a formula (I), an acid generator, and a resist co...
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JP2022171608A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided a salt represented by a formula (I), an acid generator, and a resist compositio...
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JP2022171611A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having a good pattern collapse margin (PCM) to be produced.There are provided a salt represented by a formula (I), an acid generator, and a resis...
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JP2022161017A |
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resist compositio...
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JP2022160249A |
To provide a dibenzo[g,p]chrysene derivative that has 2 or more substituents that facilitate solubility in organic solvent, and 2 or more halogeno groups or the like that facilitate reaction, and in which the number of all substituents i...
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