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WO/2021/122016A1 |
Disclosed is a metrology method relating to measurement of a structure on a substrate, said structure being subject to one or more asymmetric deviation. The method comprises obtaining at least one intensity asymmetry value relating to th...
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WO/2021/115735A1 |
Disclosed is a substrate, associated patterning device and a method for measuring a position of the substrate. The method comprises performing an alignment scan of an alignment mark to obtain simultaneously: a first measurement signal de...
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WO/2021/115574A1 |
The invention relates to a device and to a method for aligning substrates.
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WO/2021/118698A1 |
A method and system for controlling a position of a moveable stage having a substrate supported thereon is provided. First position information representing a position of the substrate relative to a mark on an object is obtained from a s...
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WO/2021/110416A1 |
A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumin...
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WO/2021/110391A1 |
Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining po...
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WO/2021/102934A1 |
An alignment mark comprising a first alignment identifier located on a first face of a substrate; and a second alignment identifier located on a second face of the substrate. The second alignment identifier is matched with the first alig...
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WO/2021/098849A1 |
The present application provides an alignment method for backside photolithography process of the wafer, the alignment method includes: cutting the wafer, and using at least two edges formed by cutting as the first alignment mark; bondin...
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WO/2021/083704A1 |
Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method compr...
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WO/2021/083649A1 |
A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured t...
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WO/2021/078474A1 |
An apparatus for and method of sensing alignment marks in which a self-referencing interferometer based sensor outputs standing images of the alignment marks and camera device is used to capture the images as output by the sensor and a d...
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WO/2021/075355A1 |
An exposure device 1 divides a region to be exposed 14 into a first region to be exposed 14A and a second region to be exposed 14B, and transfers mask patterns 17A, 17B to a substrate 10 by a first photomask 11A corresponding to the firs...
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WO/2021/073854A1 |
Described herein is a structure of the semiconductor device with a sub-segmented grating structure as a metrology mark and a method for configuring the metrology mark. A method for configuring a metrology mark may be used in a lithograph...
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WO/2021/063663A1 |
An apparatus for and a method of determining alignment of a substrate in which the intensity of a radiation source illuminating an alignment mark is varied in accordance with whether an element in the system for converting an analog sign...
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WO/2021/058571A1 |
A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radia...
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WO/2021/058313A1 |
A system (500) includes an illumination system (502), a lens element (506), and a detector (504). The illumination system generates a beam of radiation (510) having a first spatial intensity distribution (800) at a pupil plane (528) and ...
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WO/2021/052695A1 |
A method of configuring a mark comprising a trench etched into a substrate, the method comprising: a) obtaining a relation between an extent of height variation across a surface of a probationary layer deposited on a probationary trench ...
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WO/2021/052790A1 |
An improved light laser module is disclosed. The laser module can include a laser source (310) configured to generate laser light, and an infinite impulse response filter configured to reduce coherence effect of the laser light by decorr...
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WO/2021/053932A1 |
The present invention provides a semiconductor device such that the quality of a pixel region can be improved, an electronic device equipped with the semiconductor device, and a method for manufacturing the semiconductor device. The se...
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WO/2021/047903A1 |
A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pr...
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WO/2021/037453A1 |
The invention provides a method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus, the method comprising: a. generating a measurement signal re...
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WO/2021/037475A1 |
The invention relates to a method for exposing a light-sensitive recording medium (14) by means of: an exposure device (11), which comprises at least one exposure head (16) in a process chamber (35) for exposing the recording medium (14)...
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WO/2021/037695A1 |
A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from ...
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WO/2021/027388A1 |
An alignment method for a photolithographic process, comprising: providing a base comprising a substrate, as well as a first functional pattern (2), an alignment mark (1) and a filling medium (3) formed on the substrate, the first functi...
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WO/2021/028174A1 |
The disclosure relates to determining information about a target structure formed on a substrate using a lithographic process. In one arrangement, a cantilever probe is provided having a cantilever arm and a probe element. The probe elem...
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WO/2021/028292A1 |
An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a se...
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WO/2021/023792A1 |
A metrology system includes a radiation source configured to generate a plurality of light beams, each centered at different wavelength, a dynamic polarization controller configured to dynamically alternate polarization orientation of ea...
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WO/2021/018627A1 |
The invention provides a method of determining a mark measurement sequence for an object comprising a plurality of marks, the method comprising: • receiving location data for the plurality of marks that are to be measured; • obtainin...
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WO/2021/018676A1 |
An alignment method includes directing an illumination beam with a varying wavelength or frequency towards an alignment target, collecting diffraction beams from the alignment target and directing towards an interferometer. The alignment...
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WO/2021/015508A1 |
The present invention relates to a leveling unit for imprinting and an imprint apparatus comprising same, the leveling unit for imprinting comprises a baseplate, a moving plate, and a plurality of link parts. The moving plate is disposed...
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WO/2021/013483A1 |
A sensor apparatus includes an illumination system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path and includes an adjustable optic. The adjustable op...
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WO/2021/014816A1 |
According to the present invention, an exposure device 1 comprises an optical unit 30 and a movement unit 20 that moves a substrate 50 relative to the optical unit 30, wherein: the optical unit 30 includes a light source 31 that emits in...
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WO/2021/015099A1 |
The present invention can accommodate variations in a height direction due to various kinds of substrates with different thicknesses, assembly error, and the like without using a complicated mechanism. On the upper surface of a stage o...
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WO/2021/008794A1 |
A resonant amplitude grating mark has a periodic structure configured to scatter radiation (602) of wavelength λ incident (600) on the alignment mark. The scattering is mainly by coupling of the incident radiation to a waveguiding mode ...
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WO/2021/007940A1 |
Provided are a display panel and a method for monitoring the precision of a printed circuit of the display panel. The display panel comprises a color filter substrate (101, 201, 301), a thin-film transistor substrate (100, 200, 300), a m...
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WO/2021/004720A1 |
A method for determining a center of a radiation spot irradiated on a surface by a sensor, said sensor comprising a radiation source and a detector. The method comprises the following steps: emitting, with the radiation source, a first e...
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WO/2021/004826A1 |
A device for measuring reference points in real time during lithographic printing comprises a light source providing an exposure beam, a light modulator modulating the exposure beam according to an exposure pattern, a measurement system ...
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WO/2021/004724A1 |
An apparatus for measuring a height of a substrate for processing in a lithographic apparatus is disclosed. The apparatus comprises a first sensor for sensing a height of the substrate over a first area. The apparatus also comprises a se...
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WO/2021/001119A1 |
Apparatus and methods for determining a focus error for a lithographic apparatus and/or a difference between first and second metrology data. The first and/or second metrology data comprising a plurality of values of a parameter relating...
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WO/2020/262674A1 |
This mirror-mounting member is composed of a square column-like or square tubular ceramic structure, and is provided with, as external lateral faces, a bonding face for bonding to a to-be-bonded surface and a slant face inclined with res...
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WO/2020/263871A1 |
A method of aligning a stencil to an eyepiece wafer includes providing the stencil, positioning the stencil with respect to a first light source, and determining locations of at least two stencil apertures. The method also includes provi...
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WO/2020/249394A1 |
A patterning device alignment system including a multipath sensory array including a first collimating light path and one or more other light paths, a first detector positioned at a first end of the first collimating light path, and a se...
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WO/2020/249339A1 |
The invention provides an interferometer system to determine a position of a movable object, comprising: a laser source to provide a radiation beam, an optical system arranged to split the radiation beam into a first beam along a first o...
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WO/2020/244854A1 |
An image formation apparatus comprising: an illumination system operable to direct a radiation beam onto a first plane; a first support structure operable to support a first marker in the first plane and a second support structure operab...
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WO/2020/239516A1 |
A self-referencing interferometer (SRI) system for an alignment sensor apparatus includes a first prism and a second prism. The first prism has an input surface for an incident beam. The second prism is coupled to the first prism and has...
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WO/2020/242702A1 |
In one embodiment, a method for creating a forecasting model for a multiple-imaging unit DLT is disclosed. A stage of the DLT is positioned so that a set of alignment marks provided on a substrate are placed under a set of the DLT's eyes...
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WO/2020/224879A1 |
Described herein are methods of determining an alignment model associated with a mark layout. A method includes obtaining (a) first measurement data a relatively dense mark layout (e.g., more than 200 marks) in comparison with a relative...
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WO/2020/224808A1 |
The invention relates to an autofocusing method for an imaging device (2) (for semiconductor lithography) comprising an imaging optical unit (9), an object (3) to be measured and an autofocusing device (1 ) having a reflective illuminati...
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WO/2020/224882A1 |
Disclosed is a dark field metrology device comprising an objective lens arrangement and a zeroth order block to block said zeroth order radiation. The objective lens (OL) arrangement directs illumination onto a specimen (W) to be measure...
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WO/2020/212000A1 |
The present invention provides a method of providing a pulsed radiation beam for exposing a first object and a second object in a lithographic apparatus. The method comprising providing the pulsed radiation beam at a first frequency for ...
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