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WO/2024/149537A1 |
A method of calibrating a lithographic apparatus, the method comprising the following steps: obtaining a substrate having a Young's modulus which is substantially invariant to the orientation of an axis within the plane of the substrate ...
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WO/2024/141235A1 |
A metrology system can include an illumination system, a camera, and an analyzer system. The illumination system transmits illumination toward a target. The illumination has a plurality of illumination parameters associated with a corres...
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WO/2024/138520A1 |
The present disclosure provides a template and substrate alignment method, comprising: respectively performing grayscale summation on a marked image according to rows or columns to obtain first projection summation curves corresponding t...
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WO/2024/141215A1 |
An inspection system includes a radiation source, a multimode optical fiber, an optical structure, a two-dimensional detector array, and a computing device. The radiation source irradiates a target to generate scattered radiation from th...
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WO/2024/130764A1 |
A gap detection system, which is used for detecting global gap data between a template (4-3) and a substrate (5-4), and comprises: a support frame (3); a template frame (4), comprising a focus detection module (4-4) used for monitoring g...
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WO/2024/132446A1 |
Disclosed herein is a computer system configured to perform, before performing a lithographic process on a first substrate in a lot of substrates, reticle alignment, RA, measurements with a first and second plurality of edge markers of t...
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WO/2024/132607A1 |
A mechanism for aligning a stamp and a substrate during a substrate conformal imprint lithography (SCIL) process. A stamp marker, comprising a first diffraction grating, is positioned on the stamp and a substrate marker is positioned on ...
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WO/2024/129253A1 |
Aspects of the present disclosure generally relate to a digital lithography system and methods for alignment resolution with the digital lithography system. The digital lithography system includes a metrology system configured to improve...
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WO/2024/127383A1 |
Apparatus and methods are provided for autofocusing of a metrology system, including positioning a measurement site at a working distance separated from the focus distance by a defocus distance; acquiring an including the measurement sit...
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WO/2024/120435A1 |
an alignment method based on holographic lithography, a system, and equipment, which relate to the technical field of holographic lithography. The alignment method comprises: controlling irradiated light to pass through an alignment imag...
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WO/2024/120738A1 |
A sensor apparatus includes a sensor array and a metrology stage coupled to the sensor array. The sensor array includes a plurality of sensors. Each sensor of the sensor array is configured to illuminate radiation to a diffraction target...
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WO/2024/119422A1 |
Disclosed in the present invention is a deep-neural-network-based class-incremental learning method for a mobile phone radiation source spectrogram. The method comprises: acquiring a data set of a mobile phone radiation source spectrogra...
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WO/2024/115041A1 |
Disclosed is an apparatus for and method of simultaneous capture and presentation of multiple types of alignment information in which a pupil is divided and the radiation from the pupil is spatially separated. In some versions the alignm...
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WO/2024/104730A1 |
An optical system comprising a double quad mirror is described. The optical system is configured to reflect two quadrants of an incident radiation beam approaching from either side of the mirror, while allowing the opposite two quadrants...
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WO/2024/104293A1 |
The present disclosure provides a multi-point flatness detection and leveling method and apparatus. The method comprises: using a wafer bearing table to support and drive a silicon wafer to move to a target area of the wafer bearing tabl...
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WO/2024/099740A1 |
Systems and methods of measuring a focus position in a metrology system include introducing an optical element into a measurement arm of the metrology system, the optical element being configured and arranged to modify a point spread fun...
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WO/2024/099744A1 |
Disclosed is a method for determining at least one set of correction weights to correct metrology data is disclosed. The method comprises obtaining first and second metrology data relating respectively to a first layer and a second layer...
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WO/2024/088708A1 |
Disclosed is an illumination configuration module comprising: a polarizing and wavelength separation arrangement operable to separate input broadband illumination into at least first dispersed illumination comprising a first polarization...
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WO/2024/083559A1 |
A source selection module comprising an adjustable diffraction element comprising multiple pixels. The source selection module further comprises a light dispersive element configured for receiving a first and a second light. The light di...
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WO/2024/085055A1 |
The purpose of the present invention is to, when a substrate (or substrates) is (are) disposed on a substrate holder for holding the substrate(s), detect the position(s) of the substrate(s) disposed in various forms, in which, for exampl...
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WO/2024/083435A1 |
Described is a method for predicting a parameter of interest of a manufacturing process for manufacturing integrated circuits. The method comprises: obtaining metrology data relating to the parameter of interest; applying a first predict...
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WO/2024/078813A1 |
An optical arrangement for aberration correction, comprising: a beam dispersing element for spatially dispersing a broadband radiation beam in a first transverse direction; a focusing lens for focusing the broadband radiation beam subseq...
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WO/2024/078818A1 |
An inspection system includes an integrated optical system with a substrate, waveguide system, and first and second grating couplers disposed on the substrate, first and second detectors, and a micro-structured illumination adjuster. The...
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WO/2024/074286A1 |
Systems and methods for providing variable spot size and variable focus at a substrate are described. Sets of variable focal length lenses can be added to an alignment system to allow for adjustment of the spot size and focus. A variable...
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WO/2024/068297A1 |
Systems and methods for providing variable spot size and variable focus at a substrate are described. Sets of variable focal length lenses can be added to an alignment system to allow for adjustment of the spot size and focus. A variable...
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WO/2024/061572A1 |
An optical alignment system comprising an illumination system configured to condition a radiation beam to form a first off-axis monopole, a marker configured to diffract the first off-axis monopole to form zeroth and first diffraction or...
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WO/2024/063968A1 |
Systems and methods disclosed herein relate to a digital lithography system and method for alignment resolution with the digital lithography system. The digital lithography system includes a metrology system configured to improve overlay...
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WO/2024/055712A1 |
The present invention provides a double-sided superlens processing method. The method comprises: providing a first structural layer on a first surface of a substrate, and performing a first photolithography operation on the first structu...
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WO/2024/052061A1 |
A method can include directing radiation toward at least two targets using an optical scanning system so as to generate first and second portions of scattered radiation. A first target can include a plurality of first grating line struct...
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WO/2024/045204A1 |
A method and apparatus for locating a production monitoring point of a photomask, and an electronic device. The method for locating a production monitoring point of a photomask comprises: determining coordinates of one or more target det...
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WO/2024/028327A1 |
A method of determining contamination of an optical sensor in a lithographic apparatus, the method comprising illuminating a pattern on a patterning device using EUV radiation, projecting patterned reflected EUV radiation towards the opt...
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WO/2024/022773A1 |
A method of determining contamination of an optical sensor of a sensing system in a lithographic apparatus, the method comprising directing EUV radiation through an opening in a reticle masking blade (26) and onto a patterning device, pr...
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WO/2024/017765A1 |
This discloses apparatus and methods for obtaining topographical information about a sample surface. In one arrangement, a sensing system comprises a group of proximal sensors for measuring positions of respective portions of a sample su...
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WO/2024/017649A1 |
Disclosed is a metrology apparatus in which some of the measurement radiation that has interacted with a mark is split into channels or arms and then each channel or arm is spatially separated. In some versions the alignment information ...
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WO/2024/017807A1 |
Systems, methods, and computer software are disclosed for optimizing a metrology mark. One method includes simulating an etch process based on one or more of a pattern density, a microloading effect induced intra-mark variation, or a sen...
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WO/2024/005011A1 |
The present disclosure provides a reflection structure comprising a frequency-selective reflection plate that reflects a specific frequency band of electromagnetic waves in a different direction than a regular reflection direction. The r...
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WO/2024/000632A1 |
The present disclosure relates to a method and apparatus for monitoring the measurement accuracy of a semiconductor, a device, and a medium. The method comprises: obtaining real-time measurement data and scanned image measurement data of...
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WO/2024/002546A1 |
Disclosed is a wedge arrangement comprising a plurality of wedge elements, arranged around an optical axis, the plurality of wedge elements comprising at least a first wedge element, a second wedge element and a third wedge element; wher...
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WO/2023/247125A1 |
A method of determining a physical quantity is disclosed. The method uses a sensor system configured to sample a plurality of positions in parallel, wherein sampling each position uses radiation incident on an object plane patterning dev...
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WO/2023/247178A1 |
A novel approach for an alignment system by using glass plates to create off-axis illumination beams is described. A pair of glass plates is inserted into an alignment system to create a pair of off-axis illumination beams. The off-axis ...
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WO/2023/241867A1 |
A method for calibrating a height measuring optical sensor for a substrate in a lithographic apparatus. The method comprises determining, using the height measuring optical sensor, a first height of a surface of the substrate within a re...
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WO/2023/242012A1 |
An inspection system includes a radiation source, an integrated optical system, and first and second detectors. The radiation source generates radiation to irradiate a target. The integrated optical system includes: a substrate; first, s...
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WO/2023/241850A1 |
Method of spatially aligning a patterning device and a substrate, wherein the patterning device and the substrate are separated by an optical path comprising one or more moveable optical components, the method comprising: - projecting a ...
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WO/2023/236069A1 |
An alignment calibration system and a method therefor. After an image sensing device (3) and an image capturing apparatus (4) respectively acquire alignment information, positioning information is obtained through computation so as to ac...
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WO/2023/208487A1 |
Disclosed is a source selection module for selecting spectral characteristics of a broadband illumination beam to obtain a modulated illumination beam. The source selection module comprises a first beam dispersing element for dispersing ...
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WO/2023/198382A1 |
A method of spatially aligning a patterning device and a substrate, wherein the patterning device and the substrate are separated by an optical path comprising one or more moveable optical components is described, the method comprising: ...
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WO/2023/198466A1 |
An apparatus includes an illumination system, a projection system, and an inspection system. The illumination system illuminates a pattern of a patterning device. The projection system projects an image of the pattern onto a substrate. T...
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WO/2023/198444A1 |
Disclosed herein are embodiments that relate to a metrology apparatus and associated methods for imaging a plurality of targets (e.g., alignment marks) disposed on of a substrate (550, 650) in parallel using a fixed sensor (510, 530, 610...
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WO/2023/196783A1 |
Disclosed herein are examples of a photolithography machine with fast alignment. The machine may include a stage to hold and move a substrate and a projection system to project images on a plurality of exposure regions of the substrate. ...
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WO/2023/189283A1 |
This semiconductor substrate comprises a main surface, a reference mark, and an epitaxial growth-inhibiting film. The reference mark is composed of a recess formed on the main surface, and serves as a reference for in-plane coordinates. ...
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