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Matches 1 - 50 out of 15,757

Document Document Title
WO/2021/078474A1
An apparatus for and method of sensing alignment marks in which a self-referencing interferometer based sensor outputs standing images of the alignment marks and camera device is used to capture the images as output by the sensor and a d...  
WO/2021/075355A1
An exposure device 1 divides a region to be exposed 14 into a first region to be exposed 14A and a second region to be exposed 14B, and transfers mask patterns 17A, 17B to a substrate 10 by a first photomask 11A corresponding to the firs...  
WO/2021/073854A1
Described herein is a structure of the semiconductor device with a sub-segmented grating structure as a metrology mark and a method for configuring the metrology mark. A method for configuring a metrology mark may be used in a lithograph...  
WO/2021/063663A1
An apparatus for and a method of determining alignment of a substrate in which the intensity of a radiation source illuminating an alignment mark is varied in accordance with whether an element in the system for converting an analog sign...  
WO/2021/058571A1
A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radia...  
WO/2021/058313A1
A system (500) includes an illumination system (502), a lens element (506), and a detector (504). The illumination system generates a beam of radiation (510) having a first spatial intensity distribution (800) at a pupil plane (528) and ...  
WO/2021/052695A1
A method of configuring a mark comprising a trench etched into a substrate, the method comprising: a) obtaining a relation between an extent of height variation across a surface of a probationary layer deposited on a probationary trench ...  
WO/2021/052790A1
An improved light laser module is disclosed. The laser module can include a laser source (310) configured to generate laser light, and an infinite impulse response filter configured to reduce coherence effect of the laser light by decorr...  
WO/2021/053932A1
The present invention provides a semiconductor device such that the quality of a pixel region can be improved, an electronic device equipped with the semiconductor device, and a method for manufacturing the semiconductor device. The se...  
WO/2021/047903A1
A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pr...  
WO/2021/037453A1
The invention provides a method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus, the method comprising: a. generating a measurement signal re...  
WO/2021/037475A1
The invention relates to a method for exposing a light-sensitive recording medium (14) by means of: an exposure device (11), which comprises at least one exposure head (16) in a process chamber (35) for exposing the recording medium (14)...  
WO/2021/037695A1
A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from ...  
WO/2021/027388A1
An alignment method for a photolithographic process, comprising: providing a base comprising a substrate, as well as a first functional pattern (2), an alignment mark (1) and a filling medium (3) formed on the substrate, the first functi...  
WO/2021/028174A1
The disclosure relates to determining information about a target structure formed on a substrate using a lithographic process. In one arrangement, a cantilever probe is provided having a cantilever arm and a probe element. The probe elem...  
WO/2021/028292A1
An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a se...  
WO/2021/023792A1
A metrology system includes a radiation source configured to generate a plurality of light beams, each centered at different wavelength, a dynamic polarization controller configured to dynamically alternate polarization orientation of ea...  
WO/2021/018627A1
The invention provides a method of determining a mark measurement sequence for an object comprising a plurality of marks, the method comprising: • receiving location data for the plurality of marks that are to be measured; • obtainin...  
WO/2021/018676A1
An alignment method includes directing an illumination beam with a varying wavelength or frequency towards an alignment target, collecting diffraction beams from the alignment target and directing towards an interferometer. The alignment...  
WO/2021/015508A1
The present invention relates to a leveling unit for imprinting and an imprint apparatus comprising same, the leveling unit for imprinting comprises a baseplate, a moving plate, and a plurality of link parts. The moving plate is disposed...  
WO/2021/013483A1
A sensor apparatus includes an illumination system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path and includes an adjustable optic. The adjustable op...  
WO/2021/014816A1
According to the present invention, an exposure device 1 comprises an optical unit 30 and a movement unit 20 that moves a substrate 50 relative to the optical unit 30, wherein: the optical unit 30 includes a light source 31 that emits in...  
WO/2021/015099A1
The present invention can accommodate variations in a height direction due to various kinds of substrates with different thicknesses, assembly error, and the like without using a complicated mechanism. On the upper surface of a stage o...  
WO/2021/008794A1
A resonant amplitude grating mark has a periodic structure configured to scatter radiation (602) of wavelength λ incident (600) on the alignment mark. The scattering is mainly by coupling of the incident radiation to a waveguiding mode ...  
WO/2021/007940A1
Provided are a display panel and a method for monitoring the precision of a printed circuit of the display panel. The display panel comprises a color filter substrate (101, 201, 301), a thin-film transistor substrate (100, 200, 300), a m...  
WO/2021/004720A1
A method for determining a center of a radiation spot irradiated on a surface by a sensor, said sensor comprising a radiation source and a detector. The method comprises the following steps: emitting, with the radiation source, a first e...  
WO/2021/004826A1
A device for measuring reference points in real time during lithographic printing comprises a light source providing an exposure beam, a light modulator modulating the exposure beam according to an exposure pattern, a measurement system ...  
WO/2021/004724A1
An apparatus for measuring a height of a substrate for processing in a lithographic apparatus is disclosed. The apparatus comprises a first sensor for sensing a height of the substrate over a first area. The apparatus also comprises a se...  
WO/2021/001119A1
Apparatus and methods for determining a focus error for a lithographic apparatus and/or a difference between first and second metrology data. The first and/or second metrology data comprising a plurality of values of a parameter relating...  
WO/2020/262674A1
This mirror-mounting member is composed of a square column-like or square tubular ceramic structure, and is provided with, as external lateral faces, a bonding face for bonding to a to-be-bonded surface and a slant face inclined with res...  
WO/2020/263871A1
A method of aligning a stencil to an eyepiece wafer includes providing the stencil, positioning the stencil with respect to a first light source, and determining locations of at least two stencil apertures. The method also includes provi...  
WO/2020/249394A1
A patterning device alignment system including a multipath sensory array including a first collimating light path and one or more other light paths, a first detector positioned at a first end of the first collimating light path, and a se...  
WO/2020/249339A1
The invention provides an interferometer system to determine a position of a movable object, comprising: a laser source to provide a radiation beam, an optical system arranged to split the radiation beam into a first beam along a first o...  
WO/2020/244854A1
An image formation apparatus comprising: an illumination system operable to direct a radiation beam onto a first plane; a first support structure operable to support a first marker in the first plane and a second support structure operab...  
WO/2020/239516A1
A self-referencing interferometer (SRI) system for an alignment sensor apparatus includes a first prism and a second prism. The first prism has an input surface for an incident beam. The second prism is coupled to the first prism and has...  
WO/2020/242702A1
In one embodiment, a method for creating a forecasting model for a multiple-imaging unit DLT is disclosed. A stage of the DLT is positioned so that a set of alignment marks provided on a substrate are placed under a set of the DLT's eyes...  
WO/2020/224879A1
Described herein are methods of determining an alignment model associated with a mark layout. A method includes obtaining (a) first measurement data a relatively dense mark layout (e.g., more than 200 marks) in comparison with a relative...  
WO/2020/224808A1
The invention relates to an autofocusing method for an imaging device (2) (for semiconductor lithography) comprising an imaging optical unit (9), an object (3) to be measured and an autofocusing device (1 ) having a reflective illuminati...  
WO/2020/224882A1
Disclosed is a dark field metrology device comprising an objective lens arrangement and a zeroth order block to block said zeroth order radiation. The objective lens (OL) arrangement directs illumination onto a specimen (W) to be measure...  
WO/2020/173892A3
The invention relates to an object handling apparatus for handling a generally planar object, the object handling apparatus comprising: two support arms, at least one of the two support arms movable relative to other support arm generall...  
WO/2020/212000A1
The present invention provides a method of providing a pulsed radiation beam for exposing a first object and a second object in a lithographic apparatus. The method comprising providing the pulsed radiation beam at a first frequency for ...  
WO/2020/207794A1
Apparatus for and method of measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pu...  
WO/2020/200664A1
An apparatus comprising: a position monitoring system configured to determine the position of the substrate with respect to a projection system configured to project a radiation beam through an opening in the projection system and onto a...  
WO/2020/193039A1
The invention provides a method of measuring an alignment mark or an alignment mark assembly, wherein the alignment mark comprises grid features extending in at least two directions, the method comprising: measuring the alignment mark or...  
WO/2020/182379A1
Methods and apparatus for estimating at least part of a shape of a surface of a substrate usable in fabrication of semiconductor devices. Methods comprise: obtaining at least one focal position of the surface of the substrate measured by...  
WO/2020/182488A1
A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element an...  
WO/2020/178003A1
Disclosed is method of aligning a substrate within an apparatus. The method comprises determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining step comprise...  
WO/2020/178008A1
Disclosed is an optical component, being configured to function as an optical frequency converter in a broadband radiation source device. The optical component comprises a gas cell, and a hollow-core photonic crystal fiber at least parti...  
WO/2020/173892A2
The invention relates to an object handling apparatus for handling a generally planar object, the object handling apparatus comprising: two support arms, at least one of the two support arms movable relative to other support arm generall...  
WO/2020/173654A1
Described herein is a method for determining measurement data of a printed pattern on a substrate. The method involves obtaining (i) raw images (402) of the substrate comprising a printed pattern corresponding to a reference pattern (401...  

Matches 1 - 50 out of 15,757