Title:
ELECTROSTATIC CHUCK DEVICE AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
Japanese Patent JP2020150169
Kind Code:
A
Abstract:
To provide an electrostatic chuck device and manufacturing method therefor, which have a loading surface of a base excellent in plasma resistance.SOLUTION: An electrostatic chuck device 10 electrostatically attracts a plate-like sample W onto one main surface 11a of an electrostatic chuck member 11 and one main surface 11a of the electrostatic chuck member 11 is constituted of insulative particles and conductive particles. In one main surface 11a of the electrostatic chuck member 11, the size of a region different in composition from any other region is less than 5 μm in Heywood diameter distribution of volume reference.SELECTED DRAWING: Figure 1
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Inventors:
OTOMO MEGUMI
HIDAKA NOBUHIRO
HIDAKA NOBUHIRO
Application Number:
JP2019047455A
Publication Date:
September 17, 2020
Filing Date:
March 14, 2019
Export Citation:
Assignee:
SUMITOMO OSAKA CEMENT CO LTD
International Classes:
H01L21/683; C04B35/117; H02N13/00
Domestic Patent References:
| JP2016086081A | 2016-05-19 | |||
| JP2016086080A | 2016-05-19 | |||
| JP2001316183A | 2001-11-13 | |||
| JP2015019027A | 2015-01-29 |
Foreign References:
| WO2019004402A1 | 2019-01-03 |
Attorney, Agent or Firm:
Nishizawa Kazumi
Akio Sato
Hagiwara Ayatsu
Akio Sato
Hagiwara Ayatsu