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JP5415735B2 |
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JP2014024135A |
To provide a dressing board which can be used for dressing of a cutting blade according to the shape and the size of a workpiece.A dressing board on which a plurality of lattice-like division scheduled lines 10 are formed is used as divi...
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JP5410917B2 |
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JP5405887B2 |
A polishing apparatus includes a polishing table with a polishing pad at an upper surface, and a conditioning disc carrying out conditioning of the polishing pad, and a moving mechanism (constructed, for example, from a swing arm) capabl...
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JP5406890B2 |
A trimming apparatus for trimming two working layers, including bonded abrasive applied on mutually facing sides of an upper and a lower working disk of a grinding apparatus configured for simultaneous double-side processing of flat work...
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JP2014018930A |
To provide a dressing tool and a dressing method, with which fallen powder from the dressing tool can be removed by a magnet separator.A grinding wheel 7 is dressed with a dressing tool 8 including a coupling member 83 for coupling betwe...
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JP5399829B2 |
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JP5399672B2 |
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JP5404500B2 |
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JP5402104B2 |
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JP2014012320A |
To provide a grinding machine capable of forming a grinding wheel using an index different from a circumferential speed ratio, highly accurately relative to that when a circumferential speed ratio is maintained constant, even when a diam...
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JP5394962B2 |
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JP5395572B2 |
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JP5396616B2 |
A seasoning plate is placed on a polishing pad and performs seasoning of the polishing pad by abrading the polishing pad through the friction caused by rotation of the polishing pad. The seasoning plate includes: conditioners that abrade...
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JP5390750B2 |
This polishing apparatus includes a head that holds a semiconductor wafer, a polishing pad that polishes a surface to be polished of the semiconductor wafer held by the head, and a dresser that reconditions the polishing pad by cutting t...
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JP2014000653A |
To provide a dressing gear which facilitates truing of an abrasive grain layer and measurement of tooth profile accuracy even when a module is small, and which enables dressing by a usual gear honing machine without requiring a synchroni...
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JP5383556B2 |
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JP5384193B2 |
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JP5384174B2 |
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JP5381123B2 |
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JP5376647B2 |
To provide recessed spherical surface grinding device and method capable of machining a deep recessed spherical surface closer to a semi-spherical surface, for instance, into a highly smooth and highly accurate recessed spherical surface...
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JP2013544664A |
A method of forming a chemical mechanical planarization (CMP) pad conditioner includes placing abrasive grains on a major surface of a substrate, forming a binding composition at an exterior surface of the abrasive grains, and depositing...
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JP5372117B2 |
To provide an electrodeposition superabrasive tool that can securely measure a plating thickness. A CMP conditioner 1 includes a base metal 10 and a superabrasive layer 20 formed on a surface of the base metal 10 while the superabrasive ...
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JP5363091B2 |
The machine has a conditioning device (11) for profiling, sharpening and cleaning abrasive surfaces (7, 8) of a grinding wheel (2), where the conditioning device consists of a single tool that is designed as a cup-shaped electrode (12). ...
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JP5367085B2 |
A device for measuring tooth surface deviation includes a contact detector that measures the deviation at the tooth surface of a dresser with respect to a grinding tooth surface formed on a helical grinding tooth of a grinding tool when ...
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JP2013240871A |
To provide a method of dressing a rotary grinding wheel by which stable grinding can be attained, and a desired surface property formation of a workpiece is performed by using the rotary grinding wheel, to provide the rotary grinding whe...
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JP5359083B2 |
To provide grinder capable of accurately indexing a relative axial position of a grinding wheel and a formed truer without being influenced by thermal displacement or the like and a positioning method of the grinding wheel and the formed...
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JP5356149B2 |
To provide a surface-machining method for a polishing pad that achieves stable manufacturing of a specific napped layer, and a polishing pad, achieved by the method, that prevents the occurrence of scratches, has a high polishing rate, a...
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JP5356837B2 |
To provide a treatment method of a polishing pad capable of using the polishing pad for a long period. In the treatment method of the polishing pad, a turn-cutting tool including a turn-cutting bite to turn-cut the polishing surface of t...
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JP5357672B2 |
To provide a grinding method free from damage of an object to be ground made of a hard-to-grind material. The grinding method for grinding an object to be ground includes a groove forming step of forming a plurality of grooves with a dep...
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JP5356723B2 |
To easily form a satisfactory grinding surface by dressing. A dressing device for a grinding wheel is provided with a pair of electrodes 11, 12 provided opposite each other, and a power supply device 13. This grinding wheel 14 having a c...
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JP2013237132A |
To provide a grinding method that processes the surface of a workpiece which has been once smoothly finished to coarse roughness while the geometry of the workpiece is maintained at high accuracy, and exhibits preferable manufacturing ef...
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JP5352892B2 |
To suppress chattering vibration of a grinding tool and to process the surface of a workpiece into a high quality mirror surface. Using a grinding tool 5 having a body 51 with a plurality of abrasive particles 52 fixed thereon, the respe...
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JP5351700B2 |
Provided is a method of making a barrel-shaped worm-like tool whereby a barrel-shaped worm-like tool capable of efficiently performing grinding without unequal wear can easily be made. The aforementioned method comprises making the barre...
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JP5351967B2 |
A structured abrasive article comprises an at least translucent film backing and an abrasive layer disposed on the backing. The abrasive layer comprises a plurality of shaped abrasive composites. The shaped abrasive composites comprise a...
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JP5350908B2 |
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JP2013233613A |
To provide a method of mounting an annular blade by which a grinding amount by a perfect circle dressing after re-mounting the annular blade to a rotary spindle can be reduced.A method of mounting an annular blade is provided for mountin...
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JP5348450B2 |
To provide a grinding machine dressing a grinding wheel 43 for enabling highly accurate grinding, in the grinding machine performing grinding to change the shape of an outer peripheral surface of the grinding wheel 43 according to an out...
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JP5332249B2 |
An object of the present invention is to provide a polishing method for diminishing concave defects of a glass substrate used in a reflective mask for EUVL and the like. The invention relates to a method of polishing a glass substrate wh...
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JP5335350B2 |
To provide a conditioner for a polishing pad capable of obtaining a desired surface shape of the polishing pad by pressurizing a large number of conditioning parts arranged on the conditioner at an optional pressure under an environment ...
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JP5333428B2 |
To suppress the surface wave of a plane of an object to be polished. A polishing machine is used to smoothen the upper and lower planes 14 and 15 of a pedestal 10. Fine diamond abrasive grains are electrodeposited on the upper plane 14 o...
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JP5326661B2 |
To provide a grindstone forming method reducing a time required for forming by employing an adequate tool and an adequate forming order. A tool rotating axis TRZ is relatively movable to a grindstone T having a straight line part CM havi...
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JP5326662B2 |
To provide a grindstone forming device suitably forming in a short period of time a grinding end face formed at an end face of a grindstone with an adequate tool and in an adequate way and parallel to the radial direction of the grindsto...
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JP5325831B2 |
The present invention provides a dressing apparatus for dressing a polishing pad on a polishing table. The apparatus includes: a dresser configured to dress the polishing pad by pressing an upper surface of the polishing pad, the dresser...
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JP5322549B2 |
To perform grinding with excellent quality, regarding a method for grinding a surface to be ground of a workpiece using a rotary grinding stone. This grinding method includes: a process (a) in which this grinding stone has a first direct...
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JP5311178B2 |
To provide a means for improving the start of a polishing rate after wet idling. A polishing apparatus 1 comprises: a substrate polishing mechanism 2 for polishing the substrate surface by relatively rotating a substrate W and a polishin...
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JP5308526B2 |
A truing and dressing machine for profiling an abrasive wheel. The truing and dressing machine includes a truing wheel assembly for positioning the truing wheel relative to an abrasive wheel mounted on an abrasive wheel spindle. The trui...
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JP5308362B2 |
The disclosed system includes a personal computer (10) having correction coefficients (±) for the correction of errors in the tooth profile and correction coefficients (²) for the correction of meshing positions, the correction coeffic...
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JP5306065B2 |
A dressing apparatus is used in a polishing apparatus for polishing a substrate to planarize a surface of the substrate. The dressing apparatus includes a dresser disk, a dresser drive shaft coupled to the dresser disk, a pneumatic cylin...
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JP5305698B2 |
To manufacture a glass substrate for a magnetic disk superior in flatness by effectively and appropriately correcting waviness of a surface plate stuck with fixed abrasive grain, and to manufacture a magnetic disk from such glass substra...
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