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JP4569276B2 |
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JP4566401B2 |
A two-beam interferometer (1) splits an incident light in two optical paths, combines and outputs split lights together again. The two-beam interferometer (1) generates at least one or more combined light made from two beams each having ...
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JP2010230653A |
To provide an inexpensive and accurate optical interference measuring apparatus.This optical interference measuring apparatus includes a first multiple-wavelength light source 200a emitting a light beam having a plurality of spectra, a s...
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JP4557907B2 |
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JP4559291B2 |
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JP4550423B2 |
The methods of the present invention are directed at an accurate phase-based technique for measuring arbitrarily long optical distances with sub-nanometer precision. A preferred embodiment of the present invention method employs a interf...
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JP4547497B2 |
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JP4549468B2 |
A wavefront sensor includes a plurality of lenses disposed in the same plane, and an area sensor that receives a bundle of rays of light collected through each of the lenses as a luminous point. Each of the lenses comprises a plurality o...
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JP4538388B2 |
A phase shift interferometer (100) has an illuminating optical system (200) that emits a P-wave and an S-wave, a collimator lens (110), a reference half mirror (120), a pinhole plate (130) having a pinhole (131), and a phase shift interf...
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JP4522724B2 |
An optical image measuring apparatus capable of effectively obtaining a direct current component of a heterodyne signal which is composed of background light of interference light is provided. The optical image measuring apparatus includ...
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JP4500809B2 |
An optical frequency measurement apparatus of the present invention includes: a coarse light frequency measurer that computes coarse light frequency (Fw) of measured input light based on a reference wavelength that is a wavelength of ref...
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JP4505090B2 |
A method serves the direct phase-angle measurement of radiation, in particular of light radiation which is reflected from a body. The body is exposed to coherent radiation. The radiation reflected from the body is imaged by an imaging op...
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JP4500908B2 |
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JP2010151591A |
To correctly evaluate the state of the wave front of light having passed through a test optical system, even when the wave front is divided into a plurality of areas. In a wave front evaluation method for evaluating the wave front of obj...
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JP2010152388A |
To provide a method of designing a multifocal ophthalmic lens with one base focus and at least one additional focus, capable of reducing aberrations of the eye for at least one of the foci after its implantation. The method includes the ...
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JP2010151590A |
To efficiently and accurately reduce information on an image of the wave front of object light having passed through a test optical system. This method for reducing the image 23 of the wave front of the object light on the basis of the i...
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JP4499265B2 |
To provide an optical balanced receiver which is easily manufactured. The optical balanced receiver is provided which is easily manufactured and comprises an optical coupler 10 where two coherent lights are superimposed together to outpu...
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JP4499331B2 |
A system and method for recovery of phase information from recorded intensity values is disclosed. A phase filter, such as one or more dioptric lenses, is placed in the back focal plane (BFP) of a lens used for observing an object. The p...
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JP4498672B2 |
A method for accurately synthesizing a full-aperture data map from a series of overlapped sub-aperture data maps. In addition to conventional alignment uncertainties, a generalized compensation framework corrects a variety of errors, inc...
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JP4489801B2 |
An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pa...
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JP4482487B2 |
A wavefront measurement system includes a source of electromagnetic radiation. An illumination system delivers the electromagnetic radiation to an object plane. A source of a diffraction pattern is in the object plane. A projection optic...
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JP2010520474A |
The invention relates to a self-referenced device (1) for measuring the spectral phase of a periodic signal having a frequency fp, the periodic signal being carried by an optical signal, comprising: a phase shifting means (4); a transmis...
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JP4478302B2 |
An exposure apparatus for exposing a substrate with a pattern of an original includes a projection optical system for projecting the pattern of the original onto the substrate with light from a light source, and an interferometer for mea...
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JP4477282B2 |
A real-time wavelength calibration scheme for a swept laser generates an electrical signal from a swept optical output of the swept laser that is cyclical with respect to the wavelength of the swept optical output over a defined range of...
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JP4464166B2 |
An exposure apparatus (100E) for exposing a pattern of a mask (142) onto an object comprises a projection optical system (160) configured to project the pattern of the mask onto the object; and a measuring apparatus (101H) configured to ...
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JP4459961B2 |
A laser phase difference detecting device includes an optical path splitting unit for splitting individual laser beams which construct a laser beam group into a first laser beam group which will travel along a first optical path and a se...
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JP4445464B2 |
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JP2010510485A |
A detector (210, 310) that is configured to detect ghost-coherent reflections (260) produced by a superluminescent diode (SLD). The ghost reflections (260) are detected based on the optical coherence produced by reflections from surfaces...
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JP4439857B2 |
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JP4429481B2 |
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JP4425027B2 |
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JP2010043984A |
To provide a light wavelength measuring device for having a stable temperature characteristic in a wide outer temperature range by using a function of a phase compensator having a refractive index temperature dependency.This light wavele...
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JP4411395B2 |
A provided optical-phase-distribution measuring method, by which optical phase distribution is identified at high speed and with high accuracy from information on light-intensity distribution without using a special measuring device, com...
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JP4408040B2 |
A measuring method for measuring an interference fringe includes the steps of generating the interference fringe between light that has passed a target optical system (18), and a reference wave that is generated from part of the light th...
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JP2010015149A |
To provide a method of measuring a phase in a phase inversion mask and to provide an apparatus for the method.The method of measuring a phase in a phase inversion mask comprises: dividing initial extreme ultraviolet (EUV) rays into secon...
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JP2010008328A |
To provide an optical interferometer capable of being positioned only by moving an interference optical system, and rapidly and accurately measuring the thickness of a film, and to provide a film thickness measuring method using the same...
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JP4391269B2 |
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JP4388695B2 |
An interferometric measuring device for detecting the shape of rough surfaces includes a spatially coherent beam gun unit that emits a short time coherent and broad-band beam. The device is separated into a section containing the compone...
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JP4391698B2 |
A method of imaging an object including the steps of exposing the object to a radiation wave field from a source, producing a representative measure of the rate of change of intensity over a selected surface extending generally across th...
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JP2009294190A |
To provide an interferometer which reduces the influence of optical artifacts such as dust, flaw and hole on lens surface, bubble in lens or the like which may affect interference fringe, without generating a loss in optical quantity, an...
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JP4380634B2 |
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JP4381847B2 |
To provide an optical image measuring apparatus capable of calculating an intensity of a direct current component composed of background light based on a result obtained by detection of interference light and obtaining a signal intensity...
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JP2009277712A |
To measure a spatial coherence in short time and using a simple structure.A measuring method of measuring the spatial coherence in a surface to be illuminated which is illuminated by an illumination system 10 includes a measuring mask 20...
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JP2009270862A |
To perform accurate observation irrespective of a change in an observation environment.The observation device 1 has: a photographing part 2 which photographs an observation object; a phase difference distribution extracting part 3 which ...
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JP2009264929A |
To provide a mode hop detection system for easily detecting a mode hop having possibility generated in variable wavelength of an outside oscillator type wavelength variable light source oscillating in a single mode.The mode hop detection...
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JP2009236694A |
To provide a lens measuring device or the like for improving workability and enhancing through-put of measuring processing at low cost.The lens measuring device includes: eliminating inclination of a reference plane member PM on a measur...
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JP4343559B2 |
It is an exemplary object of the present invention to provide an aberration measuring apparatus capable of measuring wavefront aberration of an optical system to be analyzed at a high degree of accuracy for a long time. In order to attai...
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JP4344849B2 |
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JP4340625B2 |
Estimating one or more optical characteristics of a Device-Under-Test (DUT). The method, includes directing an optical wavefront, generated by a source, towards a test location and generating at least one ray from the wavefront at the te...
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JP2009210303A |
To automate and perform highly accurately in a short time, alignment adjustment of a wave front measuring optical system equipped with a reflection type wave front shaping means.Position of a pin hole mirror 15A is adjusted so that the f...
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