| Document |
Document Title |
|
JP4197124B2 |
An apparatus and method for measuring wavefront aberrations. A beam splitter separates the aberrated wavefront into two components, mirror arrays focus each of the components to a plurality of discrete lines with the discrete lines of on...
|
|
JP4199000B2 |
A tomographic wavefront analysis system (900) comprises a system (910) adapted to produce a light beam and a fixation target system (940) adapted to focus the eye in a plurality of different directions. The analysis system further compri...
|
|
JP4190749B2 |
To provide a laser module which enables wavelength locking at narrow wavelength intervals and enables the easy assembling of optical components. The laser module 200 comprises a semiconductor laser element 20, a wavelength monitoring sec...
|
|
JP4188370B2 |
A grating includes an absorptive substrate and a plurality of reflective lines on the absorptive substrate. Each reflective line is formed by a plurality of reflective areas. The reflective areas can be arranged in a regular pattern. The...
|
|
JP2008268237A |
To provide an interferometric apparatus and a method for reducing the effects of coherent artifacts in interferometers.While fringe contrast in interferograms is preserved with respect to the fringe contrast in the interferometer, cohere...
|
|
JP4171785B2 |
An interferometric arrangement for scanning an object with an illumination beam path comprises a diffractive optical element (DOE) for generating differently directed beam components of the illuminating light. The DOE is arranged in the ...
|
|
JP4167778B2 |
|
|
JP2008249691A |
To provide an aberration measuring device capable of measuring the aberration of an imaging optics in a light incidence state close to an actual use condition, for example.This aberration measuring device for measuring the aberration of ...
|
|
JP4164599B2 |
To provide a light frequency measuring instrument and a measuring method having a wide range of measurable wavelengths and used for finding a carrier envelope offset frequency fceowith a high S/N. The range of measurable wavelengths can ...
|
|
JP4163116B2 |
On a plate of birefringent crystal made of an LiNbO3 crystal or an LiTaO3 crystal, a conductive substance is adhered to the whole periphery of side surfaces of the plate that intersect an incident surface of a laser beam, thereby to form...
|
|
JP4157839B2 |
A scanning laser ophthalmoscope incorporates adaptive optics to compensate for wavefront aberrations in the eye. Light from a light source is scanned onto the retina. Light reflected from the retina is detected for imaging and is also us...
|
|
JP2008224313A |
To provide an interferometer reducing a polarization dependent frequency shift (PDFS) arising due to an incompleteness of a branch element, and also to provide a demodulator equipped with the interferometer.The interferometer 1 has a hal...
|
|
JP2008224364A |
To provide a phase information detection method and a phase information detector, capable of acquiring easily phase information of a phase object in real time, without using an expensive phase-contrast microscope.Light from an image of t...
|
|
JP4154375B2 |
To provide a speckle reduction method and a system for EUV interferometry by which a wavefront quality measurement in an optical lithography tool is improved to be made even during wafer fabrication and exposure, without forcing the tool...
|
|
JP4151159B2 |
|
|
JP2008197621A |
To provide an optical phase-modulation evaluating device capable of evaluating the modulated state of an optical phase-modulated signal more precisely than the prior art.An optical phase-modulation evaluating module 10 comprises a bit de...
|
|
JP4141223B2 |
|
|
JP2008185582A |
To achieve a phase shift amount measuring apparatus capable of further correctly measuring the phase shift amount of a phase shifter.A laterally offset interference image of a phase shift mask (3) is formed by a shearing interferometer (...
|
|
JP4131670B2 |
The present invention provides a method and system for determining three-dimensional refractive gradient index distribution. The method and system of the present invention determine inhomogeneity data and calculate index of refraction ch...
|
|
JP4130222B2 |
An interferometer which has the capability of measuring optical elements and systems with an accuracy of lambda /1000 where lambda is the wavelength of visible light. Whereas current interferometers employ a reference surface, which inhe...
|
|
JP4125113B2 |
To provide an interference device which measures the surface profile of a surface to be examined and the homogeneity of an object or the like, with high precision. The interference measuring device comprises an optical means, which cause...
|
|
JP4127952B2 |
To provide an aberration measuring method in which a higher-order astigmatism and a higher-order aberration can be measured at high speed in an optical-system objective lens for an information storage medium of an optical disk system and...
|
|
JP2008172258A |
To provide a photodetector provided with a function for measuring the intensity distribution of light and provided with the selectivity of a measurement wavelength band, using a simple and low-cost constitution.This transmission type pho...
|
|
JP4124942B2 |
|
|
JP4117585B2 |
|
|
JP2008153675A |
To provide an optical performance measuring method of a projection optical system, by which the optical performance of the projection optical system can be measured on its main body.The method for measuring the optical performance of the...
|
|
JP4112858B2 |
A method and a system for measuring the relief of an object are described herein. The system includes a grid projecting for projecting a grid, an image acquisition apparatus that includes a camera, and a computer. Providing a reference o...
|
|
JP4112072B2 |
|
|
JP4111614B2 |
|
|
JPWO2006085650A1 |
By simplifying the optical system, a wavelength monitoring device capable of preventing large size and reducing cost is provided. A wavelength monitoring device is composed of a collimating lens, a compound refraction element, a Faraday ...
|
|
JP4105237B2 |
A method of and apparatus for improving vision and the resolution of retinal images is described in which a point source produced on the retina of a living eye by a laser beam is reflected from the retina and received at a lenslet array ...
|
|
JP2008141175A |
To provide an injection-locked laser device with good wavelength stability, and to provide an interferometer that uses the same.The injection-locked laser device includes a seed laser 1; an oscillator O into which a certain component of ...
|
|
JP4104802B2 |
An airgap type etalon has a higher degree of design freedom of a wavelength-temperature characteristic so that such a wavelength-temperature characteristic can be freely adjusted. The airgap type etalon includes a fixing block having one...
|
|
JP4065963B6 |
|
|
JP3141933U |
To provide an optical measuring instrument for optical wavelength division multiplexing in which laser light having a plurality of wavelengths is transmitted by an optical fiber, and to measure the wavelength of the laser light transmitt...
|
|
JP2008111771A |
To provide a characteristic measuring method and apparatus for an optical element capable of easily judging whether required specification conditions are satisfied, and moreover capable of measuring a phase difference and diffraction eff...
|
|
JP4086290B2 |
To securely hold a ferrule at a prescribed position with a prescribed posture by providing a support portion to position and hold a posture of the ferrule and a displacement portion to hold the ferrule inserted into a ferrule insertion h...
|
|
JP4083751B2 |
A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial li...
|
|
JP4080763B2 |
|
|
JP4081317B2 |
At least one additional reflection device (8) is provided in the beam path of a measuring beam (5) and reflects the measuring beam in substantially the opposite direction. The device includes an interferometer (3) which separates lig...
|
|
JP4081292B2 |
|
|
JP4074033B2 |
|
|
JP4062606B2 |
A Fizeau interferometer apparatus is used for both low and high interference measurement. When irradiating a reference surface and a sample with a low coherent luminous flux, a path-matching passage divides the low coherent luminous flux...
|
|
JP4062581B2 |
|
|
JP4060365B2 |
The method includes using the radiation of an electromagnetic wave on the surface of at least one photonic mixing element having at least one pixel. The pixel has at least two light sensitive modulation photogates (Gam,Gbm) and allocated...
|
|
JP2008039759A |
To provide a device and a method for light measurement which can measure variations in amplitude and phase of optical signal without using local light emission.This light measuring device 100 is equipped with a light branching element 3 ...
|
|
JP4047901B1 |
To accurately measure an emission wavelength of a semiconductor element in a wide wavelength band by an inexpensive configuration. In a wavelength measuring device for a semiconductor element for measuring an emission wavelength λ of th...
|
|
JP4042068B2 |
To obtain a strong coherent divergence light, excellent in coherency by varying the refractive index of a transparent body locally and irradiating the transparent body with a laser light. When a transparent body (transparent plate) of gl...
|
|
JP2008020340A |
To provide an interference light measuring device with wide measurement wavelength range and measurement dynamic range capable of measuring coherent light efficiently with high accuracy.This interference light measuring device 10 compris...
|
|
JP4038576B2 |
|
