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JP2024068697A |
The present invention provides an organometallic compound suitable for a resist material that forms a resist film having a high-resolution pattern and excellent etching resistance by exposure to ultra-short wavelength light. The organome...
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JP7486615B2 |
A series of novel analogs of water soluble pterostilbene amino acid bearing carbonates were synthesized, which show activities in treating a non-alcoholic fatty liver disease and a nonalcoholic steatohepatitis (NASH).
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JP2024068156A |
An object of the present invention is to provide a resist composition etc. that can produce a resist pattern having good line edge roughness. A salt represented by formula (I), an acid generator, and a resist composition. [In the formula...
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JP2024068157A |
The present invention provides a resist composition and the like that can produce a resist pattern having good pattern collapse resistance. A salt represented by formula (I), an acid generator, and a resist composition. [In the formula, ...
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JP7484901B2 |
Provided is a method for producing an arylsulfonic acid ester compound which comprises: a first step, in which an arylsulfonic acid of formula (1)(wherein A is an aromatic group, B is an aromatic group substituted by a halogen atom, n is...
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JP2024065916A |
The present invention provides a compound having latent heat storage properties, a latent heat storage material, a latent heat storage body, an electronic device, and an electricity storage device. [Solution] A compound represented by th...
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JP7483890B2 |
The present disclosure is directed synthetic methods for the preparation of 4-valyloxybutyric acid. The synthetic methods described herein employ a diverse array of protecting group strategies and reaction conditions. Additionally, the p...
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JP7482099B2 |
Provided herein are examples of metal chelating ligands that have high affinity for manganese. The resultant metal complexes can be used as MRI contrast agents, and can be functionalized with moieties that bind to or cause relaxivity cha...
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JP2024062406A |
The present invention provides a salt, a resist composition, and the like that can produce a resist pattern with good line edge roughness. A salt represented by formula (I), an acid generator, and a resist composition. [In the formula, R...
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JP2024062408A |
An object of the present invention is to provide a salt, a resist composition, etc. that can produce a resist pattern having good CD uniformity (CDU). A salt represented by formula (I), an acid generator, and a resist composition. [In th...
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JP7479997B2 |
The invention discloses a monosubstituted or polysubstituted amphiphilic hypocrellin derivative, and a preparation method and application thereof. The amphiphilic hypocrellin derivative substituted by a group containing PEG, a quaternary...
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JP2024062407A |
An object of the present invention is to provide a salt, a resist composition, etc. that can produce a resist pattern having good CD uniformity (CDU). A salt represented by formula (I), an acid generator, and a resist composition. [In th...
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JP2024519012A |
The present invention provides a method for synthesizing phentolamine mesylate from phentolamine and methanesulfonic acid in the presence of acetone and water. The method of the invention provides highly purified phentolamine mesylate. T...
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JP7478571B2 |
To provide a salt and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The resist composition contains: a resin containing a structural unit represented by formula (a2-A) and a structural unit ha...
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JP7478573B2 |
To provide a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The resist composition contains: a resin containing a structural unit represented by formula (a2-A) and a structural unit having an aci...
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JP2024059418A |
[Problem] In lithography, whether positive or negative type, a resist composition has high sensitivity and excellent resolution, improves LWR and CDU, and can suppress collapse of resist patterns. Provides a novel onium salt for use in [...
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JP2024058075A |
[Problem] An onium salt used in a chemically amplified resist composition that has excellent solvent solubility, high sensitivity, high contrast, and excellent lithography performance such as EL and LWR in photolithography using high ene...
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JP7472606B2 |
To provide a liquid crystal display device that can achieve rapid response and a high voltage holding ratio (VHR), a polymerizable compound-containing liquid crystal composition that can achieve a high polymerization rate, proper tilt fo...
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JP2024517326A |
The present invention relates to a group of resorcinol derivatives as pharmaceutically active compounds and a process for their preparation. Resorcinol derivatives have been used to treat a variety of diseases and disorders. Although suc...
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JP7470249B2 |
Pre-texturing agents, etchants, and photoresist stripping agents may be formulated to include one or more branched surfactants, from one or more surfactant classes, such as derivatives of amino acids that have surface-active properties.
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JP7466782B2 |
This resist composition contains a base material component (A), and a compound (B0) represented by general formula (b0). In the formula, Rb0 is a fused ring group in which an aromatic ring and an alicyclic ring are fused. The alicyclic r...
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JP7466597B2 |
The present invention employs a resist composition including: a base material component, the solubility of said base material component in a developing fluid changing due to the action of an acid; and a compound represented by general fo...
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JP2024515177A |
The present invention relates to pharmaceutically acceptable salts of sphingosine-1-phosphate receptor agonists and crystalline forms thereof, and more specifically to 1-[1-chloro-6-(3- Concerning the potassium salt or methanesulfonate o...
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JP2024043941A |
[Problem] A chemically amplified resist composition using an acid as a catalyst, which has higher sensitivity, can improve line LWR and hole CDU, and has excellent etching resistance after pattern formation. Provides an onium salt type m...
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JP2024039020A |
The present invention provides solid forms of sarcardin salts, excluding sulfate salts of sarcardin. A solid form containing an acid salt of sarcardin, wherein the acids are ethane-1,2-disulfonic acid, naphthalene-1,5-disulfonic acid, 1-...
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JP2024038872A |
[Problems] A resist composition that can achieve high sensitivity and have good lithography properties, a resist pattern forming method using the resist composition, a polymer compound useful for the resist composition, and a method for ...
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JP2024037706A |
The present invention provides a resist composition and the like that can produce a resist pattern with good CD uniformity. An acid generator, etc. and a resist composition containing a salt represented by formula (I) or a structural uni...
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JP2024037707A |
The present invention provides a resist composition and the like that can produce a resist pattern with good CD uniformity. An acid generator, etc. and a resist composition containing a salt represented by formula (I) or a structural uni...
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JP2024037169A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc. that can produce a resist pattern with good CD uniformity. A salt represented by formula (I), an acid generator and a resist compositi...
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JP2024511910A |
The present invention relates to a compound of general formula (III'), or one of the group of pharmaceutically acceptable salts thereof, for the treatment of hemophilia in a subject, in particular coagulation in the plasma of a subject s...
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JP2024035201A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc., which can produce a resist pattern having good resistance to pattern collapse. A salt represented by formula (I), an acid generator a...
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JP2024035193A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc., which can produce a resist pattern having good line edge roughness. A salt represented by formula (I), an acid generator and a resist...
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JP2024035177A |
The present invention provides a resist composition capable of forming a resist pattern with good line edge roughness (LER). A salt represented by formula (I), an acid generator containing the salt, and a resist composition. [In formula ...
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JP2024035176A |
An object of the present invention is to manufacture a resist pattern with good CD uniformity (CDU). [Solution] An acid generator containing a salt represented by formula (I). In formula (I), Za+and Zb+each independently represents a gro...
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JP2024035178A |
The present invention provides a resist composition capable of forming a resist pattern with good resolution. [Solution] An acid generator containing a salt represented by formula (I). Xc1and Xc2is a sulfur atom or an iodine atom, Rc1and...
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JP2024035179A |
An object of the present invention is to manufacture a resist pattern with good resolution. [Solution] An acid generator containing a salt represented by formula (I). [Selection diagram] None
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JP7447725B2 |
To provide a radiation-sensitive resin composition that can form a resist pattern having excellent sensitivity to exposure light and having excellent LWR performance and resolution, a resist pattern forming method and a compound.A radiat...
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JP7446357B2 |
This resist composition contains a resin component (A1) having: a constitutional unit (a01) derived from a compound represented by general formula (a0-1); and a constitutional unit (a02) including a lactone-containing cyclic group or the...
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JP7446352B2 |
The present invention provides a resist composition which contains a base material component (A) and a compound (B0) that is represented by general formula (b0). In the formula, Rpg represents an acid-decomposable group; Rl0 represents a...
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JP2024031926A |
The present invention provides a resist composition and the like that can produce a resist pattern having good line edge roughness. The present invention provides an acid generator, etc., and a resist composition using a salt represented...
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JP2024031893A |
An object of the present invention is to provide a resist composition etc. that can produce a resist pattern having good CD uniformity. The present invention provides an acid generator, a resin, etc., and a resist composition containing ...
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JP2024031927A |
The present invention provides a resist composition and the like that can produce a resist pattern with good CD uniformity. The present invention provides an acid generator, etc., and a resist composition using a salt represented by a sp...
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JP2024031938A |
The present invention provides a resist composition and the like that can produce a resist pattern having good pattern collapse resistance. An acid generator, etc. and a resist composition using a salt represented by formula (I) or a res...
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JP2024031896A |
An object of the present invention is to provide a resist composition etc. that can produce a resist pattern having good resistance to pattern collapse. An acid generator, a resin, etc., and a resist composition containing a salt represe...
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JP7445606B2 |
The present invention relates to a process for preparing haloalkanesulfonic acids from sulfur trioxide and a haloalkane, particularly to a process for preparing trifluoromethane sulfonic acid from sulfur trioxide and trifluoromethane.
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JP2024031931A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc., which can produce a resist pattern having good line edge roughness. A salt represented by formula (I), an acid generator, and a resis...
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JP2024028794A |
The present invention provides the use of a compound for preparing a medicament for treating pancreatic cancer. The present invention provides the use of a compound 2250 having the following structural formula, wherein said compound 2250...
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JP7441725B2 |
To provide a method that can produce fluorine-containing alkylsulfonyl chloride in high yield without using chlorine gas.A method for producing fluorine-containing alkylsulfonyl chloride includes reacting fluorine-containing alkylthioure...
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JP7441642B2 |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the acid generator.The salt represented by formula (I), the acid generator, and the res...
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JP2024026915A |
[Problem] Used in a chemically amplified resist composition that has excellent solvent solubility, high sensitivity, high contrast, and excellent lithography performance such as exposure latitude and line width roughness in photolithogra...
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