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JP2023523683A |
The present invention relates to a method for producing fatty acid alkyl ester sulfonate using coffee-derived oil. The fatty acid alkyl ester sulfonate produced using the coffee-derived oil of the present invention had superior detergenc...
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JP2023079200A |
To provide a salt, a resin, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided a salt represented by formula (I), an acid generator containing the salt, a resin derived...
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JP2023078096A |
To provide a salt, a resin and the like, and a resist composition which allow a resist pattern having good CD uniformity to be produced.There are provided: a salt comprising a cation having an ethylenically polymerizable group and an ani...
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JP7285695B2 |
To provide a novel compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition containing the acid generator, and a resist pattern forming method using the resist composition....
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JP2023076402A |
To provide a salt, a resin, and a resist composition which allow a resist pattern having a good focus margin (DOF) to be produced.There are provided: a salt having an ethylenically polymerizable group represented by a specific formula, a...
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JP7285144B2 |
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF).The salt is represented by formula (I) [where Rrepresents a fluorine atom or the like; nn1 represents an integer of 1-5; Rrepresents a C1-8 alk...
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JP7285126B2 |
To provide a salt, an acid generator and a resist composition that make it possible to produce a resist pattern having excellent CD uniformity (CDU).The present invention provides a salt, an acid generator and a resist composition, repre...
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JP7285141B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity.The salt is represented by the following formula. [Qand Qeach independently represent a fluorine atom or the like; Rand Reach independently represent a hyd...
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JP7284565B2 |
To provide a salt capable of producing a resist pattern with good line edge roughness (LER), and a resist composition containing the salt.The salt is represented by formula (I) [where Qand Qeach represent a fluorine atom or a perfluoroal...
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JP7284622B2 |
To provide a salt capable of manufacturing a resist pattern having good CD uniformity (CDU), an acid generator containing the salt, and a resist composition.There are provided a salt represented by the formula (I), an acid generator cont...
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JP7283372B2 |
A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of wheth...
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JP7283883B2 |
wherein R1 and R2 each represent a chain hydrocarbon group which may have a substituent, an alicyclic hydrocarbon group which may have a substituent or an aromatic hydrocarbon group which may have a substituent, or R1 and R2 are bonded e...
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JP2023075089A |
To provide a compound related to sulfonyl fluoride exchange.A compound is represented by Formula (I). [In the formula, Y is a biologically active organic core group comprising one or more of an aryl group, a heteroaryl aryl group, a nona...
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JP7283374B2 |
A resist composition comprising a base polymer and a quencher in the form of an ammonium salt compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent ...
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JP7282977B2 |
A phenyl-containing compound, an intermediate thereof, a preparation method therefor and an application thereof. Provided is a compound represented by formula I or a pharmaceutically acceptable salt thereof, where R1, R2, R3, R4 and R5 a...
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JP2023521554A |
The present specification relates to the use of miramistin, derivatives and forms thereof, and methods of preparing this compound and pharmaceutical compositions containing such compounds, to treat or ameliorate infections caused by enve...
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JP2023071169A |
To provide a salt, a resin, and a resist composition which allow a resist pattern having a good pattern collapse margin to be produced.An acid generator contains a salt represented by a formula (I) or a structural unit derived from the s...
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JP2023070657A |
To provide a salt and the like and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided: a salt having a specific structure; and an acid generator, a resin, and a resist comp...
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JP2023070655A |
To provide a salt and the like and a resist composition which allow a resist pattern having good CD uniformity to be produced.An acid generator contains: (I) a specific sulfonate having an unsaturated group of a specific triphenylsulfoni...
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JP7274937B2 |
To provide a resist composition which further reduces roughness and is capable of improving rectangularity of a cross-sectional shape of a resist pattern, and a resist pattern forming method using the resist composition.The resist compos...
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JP2023067890A |
An object of the present invention is to provide a salt capable of producing a resist pattern with good line edge roughness (LER), and a resist composition containing the salt. A salt represented by formula (I). [In the formula, Q1and Q2...
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JP2023065448A |
A method for producing functionalized fluorinated monomers for use in the production of oligomers and polymers that can be used to improve the surface properties of polymer-derived systems such as coatings. A method of making a functiona...
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JP7270347B2 |
To provide a resist pattern forming method by which generation of a defect in an unexposed portion of a resist film can be reduced and a resist pattern having a good profile can be formed. The resist pattern forming method includes: a st...
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JP2023063361A |
To provide lipid-therapeutic nucleic acid compositions that are suitable for general therapeutic use.The invention provides a lipid having a structure represented by formula XXXIII or XXXVIII, or a salt or isomer thereof.SELECTED DRAWING...
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JP7269093B2 |
A salt represented by formula (I) and a resist composition including the salt are described.wherein, in formula (I),Q1 and Q2 each independently represent a fluorine atom or the like,R1 and R2 each independently represent a hydrogen atom...
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JP2023059597A |
To provide a chemically amplified resist composition which is excellent in balance of sensitivity, CDU, LWR, MEF and DOF in photolithography using high-energy rays as a light source and can form a rectangular pattern, a photoacid generat...
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JP2023517693A |
The present invention provides novel hydroquinone derivatives of formula (I), processes for their preparation, and methods for producing, for example, autoimmune, immune, rheumatic, vascular, ophthalmic, fibrotic, metabolic and gastroint...
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JP2023517665A |
Personal care products such as shampoos, conditioners, hair dyes, depilatory products, cleansers, cosmetics, mascaras, and toothpastes may contain one or more from one or more surfactant classes such as derivatives of amino acids with su...
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JP2023517667A |
Inks, paints, adhesives, and paint strippers may be formulated to contain one or more surfactants from one or more surfactant classes, such as derivatives of amino acids with surface active properties. good. [Selection drawing] Fig. 1
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JP2023516187A |
Kind Code: A1 The present disclosure is directed, at least in part, to GPR40 agonists useful for treating diseases or disorders involving the gut-brain axis. In some embodiments, the GPR40 agonist is a gut-restricted compound. In some em...
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JP7260643B2 |
The present invention provides a method for purifying a compound that generates an acid when irradiated with active light or radiation, said method being capable of reducing the content of metal impurities, while having excellent recover...
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JP7258694B2 |
To provide a method that can produce, at good yields, a sulfonic acid group-containing monomer which can be raw materials for fluorine-based polymer electrolytes such as diaphragms for fuel cells, catalyst binder polymers for fuel cells,...
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JP7259097B2 |
To provide a resist composition capable of producing a resist pattern with good resolution, and a method for producing a resist pattern.The resist composition contains a compound represented by formula (IA) or formula (IB), a compound ha...
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JP7257884B2 |
To provide a resist composition which achieves higher sensitivity and is capable of forming a resist pattern having a good shape with further reduced roughness, and a resist pattern forming method.The resist composition contains: a resin...
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JP7257149B2 |
To provide a salt and an acid generator with which a resist composition can be obtained, the resist composition being able to produce a resist pattern with good CD uniformity (CDU).Provided are: a salt represented by formula (I0); an aci...
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JP2023052412A |
To provide: a novel class of multiply charged cationic or anionic compounds that are derived from an aza-Michael addition reaction between a polyamine (Michael donor) and an activated olefin (Michael acceptor), methods of making the same...
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JP2023514506A |
The present disclosure relates to neutral amino acid salts of polyunsaturated fatty acids (PUFAs), and processes for producing the same, comprising combining one or more PUFAs in acid form, alkaline bases, and neutral amino acids with a ...
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JP7248985B2 |
The present invention relates to a hydrated crystalline form of 2-acrylamido-2-methylpropane sulfonic acid having a 2-theta powder X-ray diffraction diagram comprising peaks at 10.58°, 11.2°, 12.65°, 13.66°, 16.28°, 18.45°, 20°, 2...
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JP2023043678A |
To provide 5-sulfoisophthalic acid and a method for producing the same in which the content of sulfuric acid as an impurity is reduced and there is no problem that substance used to reduce a sulfuric acid content remains as an impurity.T...
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JP7247056B2 |
To provide a method that can produce, at good yields, a fluorine-containing vinyl ether which can be raw materials for fluorine-based polymer electrolytes such diaphragms for brine electrolysis.A method for producing a fluorine-containin...
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JP2023512578A |
The present disclosure relates to cannabinoid sulfate esters, soluble salts thereof and stable formulations thereof and food, beverage and pharmaceutical formulations thereof. Cannabinoid sulfates are associated with pain and inflammatio...
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JP2023512254A |
The present disclosure provides derivatives of amino acids that have surface active properties. Amino acids may be natural or synthetic amino acids, or may be obtained via ring-opening reactions of lactams such as caprolactam. Amino acid...
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JP7245580B2 |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern with good line edge roughness (LER).A salt represented by formula (I) and a resist composition containing the salt are provided. [In the...
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JP2023040040A |
To provide an amine compound which realizes the ability to remove grease at low temperature from a soiled material of cloth and others, and simultaneously has clay cleaning ability, or does not negatively impact whiteness.Alkoxylated est...
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JP2023030786A |
To provide an ion liquid composition for a carbon dioxide separation membrane usable for the carbon dioxide separation at high partial pressure to low partial pressure, especially 1 kPa or lower, the carbon dioxide separation membrane ho...
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JP7234937B2 |
Provided is a sulfonic acid ester compound which is represented by formula (1).(In the formula, each of R1s-R5sindependently represents a hydrogen atom, a nitro group, a cyano group, a halogen atom, an alkyl group, a halogenated alkyl gr...
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JP2023030076A |
To provide solid forms of compounds that bind to the NR1H4 receptor (FXR) and act as agonists or modulators of FXR, and the usage of such solid forms of compounds for treatment and/or prophylaxis of diseases and/or conditions.The inventi...
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JP7234018B2 |
To provide a resist composition with which a resist pattern having good line edge roughness (LER) can be produced.The resist composition comprises: a sulfonium salt-based acid generator having a cationic moiety in which an aromatic carbo...
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JP7233948B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).The salt has a group represented by formula (I), and the resist composition contains the salt. [In the formula, Rrepresents an...
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JP7233958B2 |
To provide a salt capable of producing a resist pattern with good CD uniformity.The salt is represented by formula (I) [Q, Q, Qand Qeach represent F or the like; R, R, Rand Reach represent H, F, or the like; z and zeach represent an inte...
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