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JP2023131576A |
To provide a resist composition achieving higher sensitivity and having good lithographic characteristics, a resist pattern forming method using the resist composition, a polymer compound usable for producing the resist composition, and ...
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JP7348649B2 |
A gastric tract acid (GTA) compound having the structure of formula I, as well as salts, esters, prodrugs, or labelled derivatives thereof, are provided. Such GTA compounds may be used for determining GTA levels of a sample, for diagnosi...
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JP7344727B2 |
Disclosed is a salt represented by formula (I): wherein, in formula (I), Q1 and Q2 each independently represent a fluorine atom or the like, R1 and R2 each independently represent a hydrogen atom of the like, zi represents an integer of ...
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JP7339573B2 |
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JP2023123183A |
To provide a resist composition capable of forming a resist pattern which achieves higher sensitivity and exhibits good roughness reduction.The resist composition contains a base component (A) and a compound (B0) represented by general f...
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JP7337790B2 |
Provided herein are compounds, compositions, and methods useful for modulating the integrated stress response (ISR) and for treating related diseases; disorders and conditions.
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JP2023536598A |
Described herein are methods of preparing pharmaceutical compositions comprising suramin and synthetic intermediates useful in the preparation of suramin. The present disclosure provides a method of treating an autism spectrum disorder i...
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JP7334075B2 |
To provide an agent that quickly and persistently scavenges aldehydes.An aldehyde scavenger is used which comprises one or more selected from aminooxy group-substituted alkylsulfonic acid derivatives represented by the general formula (1...
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JP7334228B2 |
The invention relates to novel methods for preparing indolinobenzodiazepine dimer compounds and their synthetic precursors.
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JP2023117394A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided: a salt represented by formula (I); an acid generator comprising the salt; and ...
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JP2023117397A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided: a salt represented by formula (I); an acid generator containing the salt; and ...
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JP2023117395A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided: a salt represented by formula (I); an acid generator containing the salt; and ...
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JP7332372B2 |
To provide a salt capable of manufacturing a resist pattern having good CD uniformity (CDU) and a resist composition containing the salt.There are provided a salt represented by the formula (I), an acid generator, and a resist compositio...
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JP7331333B2 |
To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), and a resist composition containing the salt.The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or the l...
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JP2023534940A |
A branched surfactant for use in formulations and processes suitable for hydrocarbon recovery. These formulations include formulations suitable for fracking, oil and/or gas recovery enhancement, and bio-based oil recovery and/or producti...
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JP2023534943A |
Agricultural products such as pesticides, plant growth regulators, fungicides, herbicides and insecticides may contain one or more branched surfactants, such as surface active properties, from one or more surfactant classes. can be formu...
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JP2023534939A |
Inks, paints, adhesives and paint strippers are formulated to contain one or more branched chain surfactants from one or more surfactant classes such as derivatives of amino acids with surface active properties. obtain. [Selection drawin...
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JP2023534641A |
The present disclosure provides derivatives of amino acids having branched alkyl structures and surface active properties. Amino acids may be natural or synthetic amino acids, or may be obtained via ring-opening reactions of lactams such...
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JP2023534640A |
The present disclosure provides derivatives of amino acids having branched alkyl structures and surface active properties. Amino acids may be natural or synthetic amino acids, or may be obtained via ring-opening reactions of lactams such...
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JP2023110696A |
To provide an aromatic sulfonium salt compound that has high solubility in resin and can be used as an acid generator.The invention provides a compound represented by the general formula (I) in the figure, where X1- represents a monovale...
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JP2023109733A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023109728A |
To provide a salt which allows a resist pattern having a good mask error factor to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023533985A |
The present disclosure relates to solvent drying solutions and processes therefor. The present disclosure more specifically relates to solvent drying solutions that liberate water from solvent mixtures during use. The present disclosure ...
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JP7321600B2 |
To provide a thermal recording material with a printed part having a high storage property.The present invention relates to a novel substituted hydroxybenzoate ester derivative represented by general formula (1) (each symbol in the formu...
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JP7322073B2 |
This invention relates to radiopaque polymers and to their use, particularly in the manufacture of medical devices and in methods of medical treatment, including therapeutic embolization. In particular embodiments the present disclosure ...
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JP7317101B2 |
An integrated, co-product capable process is provided for producing taurine in particular with optionally one or both of monoethanolamine and diethanolamine from one or more sugars, comprising pyrolyzing one or more sugars to produce a c...
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JP7314936B2 |
The invention provides a fullerene compound; a lubricant that is for a magnetic recording medium and that contains the fullerene compound; and a magnetic recording medium. The fullerene compound is an ionic liquid that is represented by ...
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JP2023101395A |
To provide a salt, a resin, and a resist composition which allow a resist pattern having good line edge roughness to be produced.The resist composition contains: an acid generator containing a salt represented by formula (I); and a resin...
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JP7310350B2 |
To provide a method for purifying methanesulfonic acid, which can increase purity of even methanesulfonic acid used once in synthesis of a PAEK resin to such a degree that it can be used again for synthesis of the PAEK resin.Provided is ...
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JP7310724B2 |
An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of goo...
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JP2023530531A |
Amino acid-based polymerizable compounds and their use in ophthalmic devices are provided. The amino acid-based polymerizable compound is of Formula I: [Chemical 1] In the formula, R, R1, and R2is as described herein.
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JP7309888B2 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition having a solid material concentration of 10% by mass or more, the active-ray-sensitive or radiation-sensitive resin composition comprising a...
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JP2023100005A |
To provide a resin and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided: a resin containing a structural unit represented by formula (I1) and a structural unit represente...
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JP2023100006A |
To provide a resist composition from which a resist pattern having good CD uniformity can be produced.The resist composition contains a resin (A1) containing a structural unit represented by formula (I1) and a resin (A2) containing a str...
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JP2023100003A |
To provide a resin and a resist composition which allow a resist pattern having good resolution to be produced.There are provided: a resin containing structural units of formula (I1) and formula (I2); and a resist composition.SELECTED DR...
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JP2023100004A |
To provide a resist composition from which a resist pattern having good pattern collapse resistance can be produced.The resist composition contains a resin (A1) containing a structural unit represented by formula (I1) and a resin (A2) co...
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JP2023095750A |
To provide a method for recycling a taurine mother liquor for solving the problem of poor efficiency of recycling the taurine mother liquor in the prior art.The present invention relates to a method for recycling a taurine mother liquor,...
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JP2023094173A |
To provide an additive agent for a lithium secondary battery, which can suppress decrease in discharge capacity and increase in DC resistance even in the case of a lithium secondary battery being stored for a long time under a high-tempe...
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JP2023094174A |
To provide an additive agent for a lithium secondary battery, which can suppress increase DC resistance even in the case of a lithium secondary battery being stored for a long time under a high-temperature environment.An additive agent f...
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JP2023093372A |
To provide a salt, an acid generator, a resin, and a resist composition which allow a resist pattern having good CD uniformity to be produced.There are provided a salt represented by formula (I), an acid generator, a resin, and a resist ...
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JP2023093369A |
To provide a salt, a resin, and a resist composition which allow a resist pattern having good CD uniformity to be produced.There are provided a salt represented by formula (I), an acid generator, a resin, and a resist composition. [In th...
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JP2023093373A |
To provide a salt, an acid generator, a resin, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided a salt represented by formula (I), an acid generator, a resin, and a r...
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JP2023528450A |
The present disclosure relates generally to various forms and compositions useful as beta-adrenergic agonists and their use in treating diseases associated with adrenergic receptors. In one aspect, the present disclosure provides crystal...
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JP2023088869A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, and a resist composition containing the same.There are provided: a salt represented by formula (I); and an acid generator and a resist compos...
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JP2023527155A |
The present invention relates to compounds suitable for use in mass spectrometry, as well as methods of mass spectrometric determination of analyte molecules using said compounds.
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JP2023086690A |
To provide a salt allowing a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.A salt is represented by a formula (I), and an acid generator and a resist composition ...
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JP2023081849A |
To provide salt, an acid generator, and a resist composition including the same, with which it is possible to manufacture a resist pattern having good CD uniformity (CDU).Salt has a specific structure that triphenylsulfonium cation has, ...
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JP2023081337A |
To provide a salt that enables production of a resist pattern having good resistance to pattern collapse, an acid generator, and a resist composition including the same.Salt represented by formula (I), an acid generator including the sal...
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JP2023524157A |
Formula (I) Ar1-NH-CO-NH-C6H.4-SO2-OC6H.4-NH-CO-NH-Ar2 (I) and a heat-sensitive color forming layer containing a carrier base and at least one color former and at least one phenol-free color developer which is a compound of formula (I), ...
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JP7288665B2 |
To provide a method for producing an ethyl anilino toluene sulfonic acid derivative or a salt thereof, which is an intermediate for obtaining BBG or the like.The present invention relates to a production method based on the following sch...
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