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JP7440334B2 |
To provide a method for producing vinyl sulfonyl fluoride having a repeatable reaction cycle.The present invention relates to a method for producing vinyl sulfonyl fluoride represented by general formula (1), including a cyclization step...
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JP7439361B2 |
To provide a novel lithium salt complex compound.There is provided a lithium salt complex compound (provided that a combination of the same compounds are excluded) which comprises: when a substituent such as a halogen atom is defined as ...
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JP7438716B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator containing the salt, and a resist composition containing the acid generator.The salt is represented by formula (I) [where Qand Qea...
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JP2024023188A |
An object of the present invention is to provide a radiation-sensitive resin composition that has excellent performance in terms of sensitivity, LWR performance, etc. in the exposure process even when next-generation exposure technology ...
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JP7433673B2 |
A series of new macrocycles and cage-like molecules are obtained in a high yield from a bis-(2,4-dialkoxyphenyl)arene (naphthalene, anthracene, pyrene, porphyrin, etc.) or a tris-(2,4-dialkoxyphenyl)arene (benzene, sym-tribenzobenzene) a...
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JP2024022555A |
An object of the present invention is to provide a resist composition etc. that can produce a resist pattern having good CD uniformity. The present invention provides an acid generator, etc., and a resist composition using a salt having ...
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JP2024022553A |
An object of the present invention is to provide a resist composition etc. that can produce a resist pattern having good line edge roughness. The present invention provides an acid generator, etc., and a resist composition using a salt h...
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JP2024021235A |
[Object] To provide a fluorene compound having a sulfonic acid ester structure and an allyl group, which can be used as a raw material for the synthesis of a fluorene skeleton-containing organosilicon compound having excellent light resi...
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JP7431815B2 |
A crystalline form of treosulfan and methods to prepare it are described. This crystalline form of treosulfan is useful in pharmaceutical compositions for the treatment of cancer and for conditioning therapy before transplantation of bon...
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JP2024020170A |
An object of the present invention is to provide a salt, a resist composition, etc. that can produce a resist pattern having good line edge roughness. A salt represented by formula (I), an acid generator, and a resist composition. [In th...
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JP2024017219A |
The present invention provides a resist composition, a method for forming a resist pattern, and a compound capable of forming a resist pattern that has excellent stability over time and has both high exposure latitude and high sensitivit...
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JP7427793B2 |
The present disclosure provides a system for efficiently preparing taurine, including: a solution storage unit configured to store a solution containing alkali metal taurinate, the solution being prepared by an ethylene oxide process; an...
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JP7426976B2 |
A method, comprising i) contacting an aqueous solution of an organic ligand salt of the formula AX(L−X) with a mesoporous material (MPM) to form an impregnated mesoporous salt material of the formula AX(L−X)/MPM, ii) treating the imp...
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JP7425593B2 |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the acid generator.The salt represented by formula (I), the acid generator, and the res...
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JP7421901B2 |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The salt represented by formula (I), the acid generator, and the resist composition are provided. [In th...
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JP7420718B2 |
The application relates to a process for the synthesis of organic sulfonic acid salts of amino acid esters comprising the steps of (i) reacting at least one lactam with at least 3 carbon atoms in the lactam ring with at least one organic...
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JP7420776B2 |
The invention relates to a method for the purification of acrylamido-2-methyl-2-propanesulphonic acid comprising the following successive steps:1) preparation of a suspension of acrylamido-2-methyl-2-propanesulphonic acid crystals by dis...
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JP2024009780A |
An object of the present invention is to provide a salt, etc., which can produce a resist pattern having good CD uniformity, and a resist composition containing the same. A salt represented by formula (I), an acid generator, and a resist...
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JP2024009781A |
An object of the present invention is to provide a salt, etc. and a resist composition that can produce a resist pattern having good line edge roughness. A sulfonium salt or iodonium salt having a specific structure and a resist composit...
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JP2024009779A |
An object of the present invention is to provide a salt, etc., which can produce a resist pattern having good CD uniformity, and a resist composition containing the same. A salt represented by formula (I), an acid generator, and a resist...
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JP7419049B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the acid generator.The salt represented by formula (I), the acid generator, and the resist co...
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JP2024007481A |
The present invention provides a resist composition and the like that can produce a resist pattern with good resolution. The present invention provides an acid generator, etc., and a resist composition using a salt having a specific stru...
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JP2024007480A |
The present invention provides a resist composition and the like that can produce a resist pattern having good line edge roughness. An acid generator, etc. and a resist composition using a salt represented by formula (I) or a resin conta...
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JP2024007478A |
The present invention provides a resist composition and the like that can produce a resist pattern with good CD uniformity. The present invention provides an acid generator, etc., and a resist composition using a salt having a specific s...
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JP2024004505A |
[Problem] Novel (1R,2R,3R,5R,6R)-2-amino-6-fluoro-3-[(4-fluorophenyl)methoxy
]bicyclo[3.1.0]hexane-2,6-dicarboxylic acid Providing a manufacturing method. [Solution] (1R,2R,3R,5R,6R) represented by formula (1) by conversion from [(1R,4S)...
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JP7414926B2 |
A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rbd1 to Rbd3 each independently re...
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JP7414500B2 |
To provide a salt capable of producing a resist pattern with a good mask error factor (MEF), and a resist composition containing the salt.The salt represented by formula (I), an acid generator, and the resist composition containing the s...
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JP7413363B2 |
Herein are provided novel salts of methyl 6-(2,4-dichlorophenyl)-5-[4-[(3S)-1-(3-fluoropropyl)pyrrolid
in-3-yl]oxyphenyl]-8,9-dihydro-7H-benzo[7]annulene-2-carboxy
late namely the oxalate saltand the dibenzoyltartrate salt
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JP2024002968A |
The present invention provides a salt, a resist composition, and the like that can produce a resist pattern having good line edge roughness. The present invention provides an acid generator and a resist composition using a salt having a ...
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JP2024002971A |
The present invention provides a salt, a resist composition, and the like that can produce a resist pattern having good resistance to pattern collapse. An acid generator, a resin, and a resist composition containing a salt represented by...
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JP2024002973A |
The present invention provides salts, resist compositions, etc. that can produce resist patterns with good CD uniformity. The present invention provides an acid generator and a resist composition using a salt having a specific structure ...
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JP2024001848A |
The present invention provides a method for the circular production of columnar taurine, which is a novel process, has high efficiency, and reduces both production cost and energy consumption through recycling. [Solution] A taurine aqueo...
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JP2024001105A |
The present invention provides a method for synthesizing an organic sulfonate of an amino acid ester. The following steps: (i) reacting at least one lactam having at least 3 carbon atoms in the lactam ring with at least one organic sulfo...
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JP2023184479A |
To provide a salt, a resist composition, and the like which allow a resist pattern having a good focus margin to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formu...
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JP2023184477A |
To provide a salt, a resist composition, and the like which allow a resist pattern having good CD uniformity to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formul...
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JP2023184478A |
To provide a salt, a resist composition, and the like which allow a resist pattern having good line edge roughness to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the ...
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JP7406319B2 |
To provide a salt, an acid generator and a resist composition from which a resist pattern having good CD uniformity (CDU) can be produced.The salt is represented by formula (I), and the acid generator and the resist composition contain t...
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JP7403902B1 |
[assignment] To provide a method for producing an organic sulfonic acid compound in which chlorine ions are efficiently reduced without causing precipitation during purification. [Solution] Reaction step 1: Synthesizing an organic sulfon...
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JP2023179519A |
To provide a dopamine D1 receptor positive allosteric modulator and an improved manufacturing method thereof.There is provided a method of starting with bromophenylalanine, forming an oxazolidine ring, then a tetrahydroisoquinoline ring,...
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JP2023552672A |
The present invention is in the field of pharmaceutical technology and relates to salts of nucleoside analogues and their crystalline forms, pharmaceutical compositions and uses. Specifically, the salts of the nucleoside analogs are of t...
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JP7398551B2 |
According to the present invention, it is possible to provide an actinic ray-sensitive or radiation-sensitive resin composition containing a resin of which a solubility in a developer changes by the action of an acid, a photoacid generat...
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JP7397256B2 |
To provide a novel sulfonium compound that can be used for an acid generator to generate an acid in response to heating or irradiation with an energy ray.There is provided a sulfonium compound represented by the general formula (I) in th...
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JP2023177294A |
To provide a salt, a resist composition and the like which allow a resist pattern having good line edge roughness to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the f...
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JP2023177296A |
To provide a salt, a resist composition and the like which allow a resist pattern having good CD uniformity to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula...
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JP2023177048A |
To obtain a resist pattern with improved resolution and good LER and fidelity.A chemically amplified negative resist composition contains: (A) an acid generator containing at least one selected from a sulfonium salt represented by the fo...
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JP7396360B2 |
Provided are a radiation-sensitive resin composition with which it is possible to form a resist pattern having excellent sensitivity to exposure light and having exceptional LWR performance and resolution, a resist pattern formation meth...
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JP2023551653A |
The present invention relates to compounds of formula I or salts or solvates thereof, combinations containing the same, uses and methods thereof, and kits containing the same. [Formula 1] [Selection diagram] None
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JP2023551152A |
The surfactant composition comprises greater than 70% by weight of an intimate mixture of an N-acylalaninate surfactant of formula (I) and an N-acylamino acid surfactant of formula (II). A method for preparing a blend of an N-acylalanina...
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JP2023171386A |
To provide a salt, a resist composition, and the like which allow a resist pattern having good line edge roughness to be produced.The salt is represented by formula (I) [where Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl ...
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JP7389562B2 |
Described are a salt and a resist composition capable of producing a resist pattern with satisfactory line edge roughness (LER). The salt is represented by formula (I):In formula (I), R1, R2, R3, R4 and R5 each independently represent a ...
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