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JP2023169814A |
To provide a resist composition that has excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as LWR, as well as exhibits resistance to pattern collapse even in fine pattern format...
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JP2023169812A |
To provide a sulfonium salt used for a resist composition having excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as exposure latitude and LWR; a resist composition containing ...
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JP7388647B2 |
The present disclosure relates to an additive used in a methionine preparation process, and a methionine preparation method. The additive provided by the present disclosure is a mixture containing components A, B, and C; component A has ...
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JP7387197B2 |
To provide a compound suitable as a developer for a thermal recording material.The invention relates to a compound represented by the general formula (1) in the figure, where definition of each symbol is as described in the specification...
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JP2023168293A |
To provide a resist composition from which a resist pattern having good CD uniformity can be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula, R3, R4, and R5 each...
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JP7385453B2 |
To provide a salt capable of producing a resist pattern having good line edge roughness, an acid generator, and a resist composition containing the acid generator.The salt represented by formula (I), the acid generator, and the resist co...
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JP2023166339A |
To provide a salt which allows a resist pattern having a good pattern collapse margin to be produced, an acid generator, a resin, and a resist composition containing the same.There are provided: a salt represented by a specific formula a...
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JP2023165660A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, a resin, and a resist composition containing the same.There are provided: a salt represented by a specific formula and the like;...
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JP2023165665A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, a resin, and a resist composition containing the same.There are provided a salt having a specific structure, an acid gener...
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JP7382503B2 |
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be obtained, a resist film, a pattern forming method, a method for manufacturing a...
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JP2023548148A |
The present disclosure describes the solid forms of a) compounds of formula (I), compounds of formula (II), and compounds of formula (III); b) compounds of formula (I), compounds of formula (II), and compounds of formula (III); a pharmac...
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JP7379565B2 |
To provide a resist composition capable of producing a resist pattern with excellent resolution, and a method for producing a resist pattern.The resist composition contains a salt represented by formula (I0) and a compound having a parti...
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JP2023162264A |
To provide novel methods for preparing indolinobenzodiazepine dimer compounds and their synthetic precursors.A method for preparing a compound of formula (2d) or a salt thereof includes reacting a compound of formula (1d) with an alcohol...
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JP2023160800A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resi...
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JP7373354B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the salt.The salt represented by formula (I) and the resist composition containing the same are provided. [In th...
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JP2023160798A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023160796A |
To provide a salt which allows a resist pattern having a good focus margin to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a res...
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JP2023160883A |
To provide a bisphenol composition including a specific amount of aromatic alcohol sulfonate, and a simple method of producing the same; and provide a method of producing a polycarbonate resin in which, by using the bisphenol composition...
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JP7372756B2 |
A salt represented by formula (I):In formula (I), R1, R2, R3 and R4 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R5, R6 and R7 each independently represent a halogen atom, a hydroxy gr...
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JP7371574B2 |
An onium salt having a partial structure of formula (A) is provided wherein Ra1 and Ra2 are hydrogen or a C1-C10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH2— may be replaced by —O— or —C(═O)—,...
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JP7369708B2 |
Described herein are compounds that are able to generate oct-2-en-4-one and thus to provide a long-lasting or substantive strawberry odor to an environment. Also described herein is a method of imparting a long-lasting strawberry odor to...
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JP2023157902A |
To provide a topical dermatological composition containing taurine in crystalline form, which have a smooth feel without skin irritation.Provided is a topical dermatological composition comprising fine acicular or columnar crystals of ta...
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JP2023156261A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resi...
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JP2023156259A |
To provide a salt and the like which allow a resist pattern having good CD uniformity to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition containing the same. [In the formula, ...
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JP2023156258A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP7367817B2 |
A fluorosulfonyl group-containing polymer having units represented by the following formula u1, a sulfonic acid group-containing polymer having fluorosulfonyl groups in the fluorosulfonyl group-containing polymer converted into sulfonic ...
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JP2023154646A |
To provide a non-aqueous electrolyte that reduces the initial input resistance of a non-aqueous electrolyte secondary battery and inhibits gas generation in the battery.A non-aqueous electrolyte contains an electrolyte, a non-aqueous sol...
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JP7366202B2 |
To provide a novel compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition containing the acid generator, and a resist pattern forming method using the resist composition....
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JP7365444B2 |
Provided are high-purity styrenesulfonic acids having markedly decreased bound bromine and polymers thereof that are useful as modifiers for secondary batteries, dopants for conductive polymers, additives for semiconductor abrasives and ...
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JP2023153089A |
To provide a resist composition that produces a resist pattern with excellent CD uniformity.A resist composition contains an acid generator containing a salt represented by formula (I), and an acid-stable resin containing one or more str...
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JP7362131B2 |
Compositions and methods of making and using thereof are provided with a specific antimicrobial activity and efficacy toward Gram-positive and Gram-negative bacteria and low levels of toxicity toward mammalian cells. The compositions inc...
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JP2023153362A |
To provide a method for treating diseases.A lyophilized product of treosulfan is described which possesses favourable characteristics in terms of a short reconstitution time and a high purity and stability, and is particularly useful in ...
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JP7361820B2 |
Iodine-containing photoacid generators and compositions including the same. A photoacid generator compound is provided having formula (I) wherein, in formula (I), the groups and variables are the same as those described in the specificat...
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JP7361822B2 |
A resist composition containing a compound (B1) represented by Formula (b1) in which Rb1 represents a monovalent hydrocarbon group which has a steroid skeleton and 17 to 50 carbon atoms, Yb1 and Yb2 each independently represent a divalen...
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JP7360577B2 |
Provided is a novel nanoparticle, a contrast agent for magnetic resonance imaging containing the same, and a zwitterionic ligand compound used in production of the nanoparticle. The contrast agent for MRI of the present invention can be ...
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JP2023148520A |
To provide an organic compound that displays EC behavior at a lower voltage.An organic compound is represented by the general formula (1). In the general formula (1), X1 and X2 are independently selected from an alkyl group, an aryl grou...
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JP2023145463A |
To provide a radiation-sensitive resin composition that, when applied to the next-generation exposure techniques, can exhibit sufficient levels of sensitivity, depth of focus, and process margins, and a method for forming a resist patter...
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JP7359460B2 |
This disclosure concerns compounds and a method for modulating the activity of calcium ion channels, including Ca2+-induced (or Ca2+-activated) calcium release channels and conformationally coupled calcium release channels such as ryanod...
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JP2023145501A |
To provide an acid generator and a resist composition which contain a salt allowing a resist pattern to be produced with good line edge roughness (LER).There are provided: a salt represented by formula (I) and the like; and a resist comp...
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JP7358379B2 |
The invention relates to method of enhancing yield of alkyl taurate amides using enhancing specifically phosphoric acid catalysts. It further relates to the use of phosphoric acid to enhance yield while avoiding and/or reducing undesirab...
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JP2023143838A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, a resin, and a resist composition containing the same.There are provided: a salt represented by formula (I); an acid gener...
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JP2023143845A |
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, an acid generator, a resin, and a resist composition containing the same.There are provided: an acid generator containing a salt represented ...
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JP2023143844A |
To provide a salt which allows a resist pattern having good resolution to be produced, an acid generator, a resin, and a resist composition containing the same.There are provided: a salt represented by formula (I); an acid generator; a r...
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JP7356315B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator containing the salt, and a resist composition containing the acid generator.The salt is represented by formula (I) [where Qand Qea...
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JP7356316B2 |
To provide a salt capable of producing a resist pattern having good line edge roughness, an acid generator containing the salt, and a resist composition containing the acid generator.The salt is represented by formula (I) [where Qand Qea...
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JP2023138467A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resist composition cont...
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JP7353295B2 |
The invention relates to a multi-stage process for preparing 2,6-dialkylphenylacetic acids of the general formula (I) by reacting 2,6-dialkylbromobenzenes with (1) magnesium, (2) a formamide, (3) an acid, (4) hydrogenation of the benzald...
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JP2023135271A |
To provide an ionic liquid that includes tosylic acid anions and can be handled as a liquid at room temperature.The present invention provides a tosylic acid anionic ionic liquid represented by the formula (1) (where R1 represents a C1-4...
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JP7349757B2 |
To provide a method for acidifying terephthalylidene dicamphor sulfonate using cation exchange fibers and, more specifically, to provide a method for converting terephthalylidene dicamphor sulfonate into terephthalylidene dicamphor sulfo...
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JP2023133284A |
To provide high-purity styrenesulfonic acids having markedly decreased bound bromine and polymers thereof that are useful as modifiers for secondary batteries, dopants for conductive polymers, and additives for semiconductor abrasives an...
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