| Document |
Document Title |
|
JP6715241B2 |
An optical system of a microlithographic projection exposure apparatus designed for an operating wavelength of at least 150 nm. In one disclosed aspect, the optical system includes an element (11, 21) producing an angular distribution fo...
|
|
JP6716923B2 |
To provide a position adjustment device capable of re-adjusting a position of a rotating wheel, and a wavelength converter, a diffuse reflection device, a light source device and a projector.A position adjustment device includes: a coupl...
|
|
JP6703944B2 |
An illumination optical unit for EUV projection lithography serves for illuminating an illumination field in which an object field of a downstream imaging optical unit is arranged. An object displaceable in an object displacement directi...
|
|
JP6701204B2 |
Projection systems and/or methods for efficient use of light by recycling a portion of the light energy for future use are disclosed. In one embodiment, a projection display system is disclosed comprising a light source; an integrating r...
|
|
JP6698063B2 |
A lithography apparatus using EUV radiation has an illuminator configured to provide Kohler illumination. The illuminator comprises a field mirror (422) having a plurality of individually directable reflectors and a pupil mirror (424) ha...
|
|
JP6701136B2 |
The present invention relates to an illumination optical system, an exposure apparatus, and a method of manufacturing an article. The illumination optical system comprises: a first optical system and a second optical system for shaping a...
|
|
JP6700982B2 |
To provide such technology advantageous for efficiently guiding light from a plurality of solid light-emitting elements to an illumination target region.An optical system includes: a light source part having a plurality of solid light-em...
|
|
JP2020514810A |
For use in head-mounted light field displays using free-form surface waveguide prisms with composite surfaces and integral imaging and relays. [Selection diagram] Fig. 6C
|
|
JP2020074031A |
To provide an illumination optical system capable of giving a high illuminance while achieving illuminance uniformity in an illumination area and uniformity of illumination angle characteristics.The illumination optical system illuminati...
|
|
JP2020074025A |
To provide an image display device that can improve visibility of a virtual image.An image display device 1000 forms an image with light from a semiconductor laser, and makes image light after forming the image incident on a transmission...
|
|
JP2020067516A |
To realize a zoom lens for projecting an image and an image projection device that can cope with both of the size of a variable magnification ratio and brightness and has less aberration.Zoom lenses for projecting images comprise a first...
|
|
JP6690217B2 |
A light source device includes: a light emission element; a condensing optical system on which a first component of light emitted from the light emission element is incident; an optical element on which the first component transmitted th...
|
|
JP6683688B2 |
An illumination optical assembly for projection lithography serves for illuminating an object field, in which an object to be imaged is arrangeable. The object field has a scan length along an object displacement direction. The illuminat...
|
|
JP2020057571A |
To provide an optical system device and a biconvex lens that save the space, parallelize irradiation light, and make uniform the illuminance on a surface irradiated with the irradiation light.An optical system device comprises: a biconve...
|
|
JP2020052148A |
To provide an illumination device capable of reducing the size while ensuring the efficiency of light use.The illumination device includes: a lens unit 400 constituted of one or more lenses, which is disposed on the optical axis of the i...
|
|
JP2020052420A |
To appropriately project a projected image on a substrate by reducing an influence of leaked light on the projected image formed on the substrate.An exposure apparatus includes an illumination optical system, a catadioptric optical syste...
|
|
JPWO2018221579A1 |
An optical integrator holder having an optical integrator accommodating space, wherein the optical integrator accommodating space has a reflecting surface that specularly or diffusely reflects the light leaked from the optical integrator.
|
|
JP6674306B2 |
The present invention provides an illumination apparatus which performs oblique illumination, the apparatus including a first optical element formed with an array of a plurality of optical components each configured to generate a point l...
|
|
JP6671377B2 |
An optical device (100) is disclosed, comprising a collimator (110) and a first lenslet array (130, 430) and a second lenslet array (140, 440). The first lenslet array and the second lenslet array are provided with the same tessellation ...
|
|
JP6663914B2 |
A lighting device for exposure is provided with: a lamp unit (60); a fly eye lens (65) that has a plurality of lens elements (65a) arranged in a matrix with p rows and q columns; a plane mirror (68) that is provided with a mirror transfo...
|
|
JP6662893B2 |
The invention provides an optical beam shaping arrangement for example for use as part of a spot light. A collimator is for receiving light from an optical source, and providing a more collimated output. An optical plate is provided at t...
|
|
JP6660753B2 |
To provide a parallel light controlling device and parallel light irradiation device, capable of suppressing uneven irradiation in a parallel light irradiation area even when using parallel light having uneven luminance, and a method for...
|
|
JP2020034805A |
To provide a projection display device capable of solving a problem that it is necessary to perform color separation for each wavelength to illuminate the display elements of each color after luminance modulation, and the optical path le...
|
|
JP6659240B2 |
To realize an LED lighting device showing a high input without changing LED output.This invention includes an LED 1 and a semisphere mirror 3. The LED 1 is configured in such a way that its light emitting part has a flat surface and poin...
|
|
JP6657786B2 |
To give incident light to be incident upon a light diffusion element of an illumination device an excellent shaping property.An illumination device 10 comprises: a light diffusion element 20; and an illumination device 30 that irradiates...
|
|
JP6658543B2 |
Provided is an optical unit that can be reduced in size. The optical unit (PU) is provided with a digital micromirror device (DP) for biaxially driving ON/OFF-controlled micromirrors (MR), a first prism (P1) for guiding illumination ligh...
|
|
JP2020030266A |
To provide a projector that can switch between a visible light region and a near-infrared region, and correct spherical aberration, which is the problem mainly in terms of the resolution in an infrared mode without sacrificing projection...
|
|
JP6655545B2 |
An illumination optical unit for projection lithography serves for illuminating an object field. Here, a first transmission optical unit serves to guide illumination light emanating from a light source. An illumination-predetermining fac...
|
|
JP6652948B2 |
To provide an illumination system comprising an optical integrator.An illumination system of a microlithographic projection exposure apparatus comprises an optical integrator (70), and the optical integrator (70) includes a first optical...
|
|
JP6651124B2 |
To provide an illumination optical system capable of giving a high illuminance while achieving illuminance uniformity in an illumination area and uniformity of illumination angle characteristics.The illumination optical system illuminati...
|
|
JP6646982B2 |
To increase an emission light amount by arranging more light emitting parts on a common substrate in a light emitting device for emitting light through a lens array.A light emitting device (2E) includes: a substrate (10); a plurality of ...
|
|
JP6645685B2 |
The illumination optical system illuminates an illumination surface. The illumination optical system includes a first optical system configured to cause a light flux from a light source to form a light source image, and a second optical ...
|
|
JP6643466B2 |
An illumination system of a microlithographic projection apparatus includes a spatial light modulator having a modulation surface including a plurality of micromirrors. Each micromirror includes a mirror surface having an orientation tha...
|
|
JP6643337B2 |
A reflector (2) comprising a plate (4) supported by a substrate (8), wherein the plate has a reflective surface (5) and is secured to the substrate by adhesive free bonding, and wherein a cooling channel array (10) is provided in the ref...
|
|
JP2020021047A |
To provide an optical system which is easy to manufacture and yet offers good optical performance, and to provide an illumination device having the same, and a ranging device.An optical system 20 for guiding light from a light source 11 ...
|
|
JP6635167B2 |
A substrate processing device comprises: a projection optical system (PL) which forms an intermediate image by imaging a first projection beam (EL2a) from a mask (M) and forms a projection image by reimaging onto a substrate (P) a second...
|
|
JP2020008659A |
To provide an optical element capable of controlling illuminance, and an optical system device using the same.An optical element 1 for irradiating a predetermined target surface 5 with light incident from a predetermined position O, comp...
|
|
JP6631798B2 |
|
|
JP2020003785A |
To provide an illumination system and projection device.An illumination system disclosed herein comprises an excitation light source module, beam splitting/combining module, wavelength conversion element, and light filtering element. The...
|
|
JP6625532B2 |
An optical assembly, in particular for a lithography system for imaging lithographic micro- or nanostructures, includes at least two optical elements arranged successively in a beam path of the optical assembly, an acquisition device des...
|
|
JP6624199B2 |
An illumination optical system includes a lens group, a diaphragm, and a prism unit including first to third prisms and a rotationally-asymmetrical curved reflective surface having a positive power and satisfying the conditional formula:...
|
|
JP6623847B2 |
Light source apparatus includes a light source, a LED element contains the first shot wavelength of light, the first light radiation area, and contains a plurality of LED elements with the first shot second wavelength wavelength light, s...
|
|
JP2019215400A |
To provide an optical integrator device capable of improving light utilization efficiency with light-condensing performance enhanced by suppressing diffusion of an outgoing beam.The optical integrator device comprises: an optical integra...
|
|
JP6621057B2 |
An illumination optical system can form a pupil intensity distribution with a desired beam profile. The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a spatial...
|
|
JPWO2018131257A1 |
To reduce unevenness of light after a wave combination while suppressing a decrease in light guide efficiency. An optical waveguide that combines a light source unit that emits a plurality of types of light and the plurality of types of ...
|
|
JP2019207276A |
To provide a light source device to be used for an exposure apparatus or the like, in particular, a light source device that can highly efficiently use luminous fluxes from a plurality of LEDs by appropriately combining a UV-LED and a CP...
|
|
JP6609061B2 |
|
|
JP6606361B2 |
|
|
JP2019192532A |
To provide a surface light source device that can be made thin, high in luminance, and lightweight while improving luminance uniformity of an outer peripheral region corresponding to an end part of a screen.A surface light source device ...
|
|
JP6590829B2 |
A mirror, in particular for a microlithographic projection exposure apparatus has an optically effective surface, wherein the mirror has a reflectivity of at least 0.5 for electromagnetic radiation which has a prescribed working waveleng...
|
