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JP6437242B2 |
To provide a light flux control member that is used in plane light source devices suppressing luminance unevenness and high in light utilization efficiency.A light flux control member has: a first incidence plane 151; a second incidence ...
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JP2018536270A |
A light emitting unit including a light source and a Fresnel optical system operably arranged with respect to the light source is disclosed. The Fresnel optical system includes an upper surface and a lower surface which are separated fro...
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JP6434473B2 |
An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (60) having a plurality of light entrance facets (75) each being associated with a secondary light source (106). A spatial l...
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JP2018535453A |
In one embodiment, an optical module is disclosed, which includes a housing that provides a hollow chamber extending from the proximal end to the distal end, and a lens located within the hollow chamber, where the lens is an input surfac...
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JP2018189978A |
To provide an illumination optical device provided with a structure for converting incident light in a linearly polarized state having a polarization direction in a substantially single direction into light in a circumferential direction...
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JP6429171B2 |
An illumination optical unit for EUV projection lithography has a first and second facet mirrors, each with a plurality of reflecting facets on a support. The facets of the first facet mirror can be switched between various tilt position...
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JP6424043B2 |
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JP6417802B2 |
This lighting device (40) comprises an optical element (50), and an irradiation device (60) for irradiating light onto the optical element in such a manner as to scan over the optical element. The irradiation device comprises a light sou...
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JPWO2017131185A1 |
The vehicle head-up display device (1) includes a light source device (11), a display panel (12), and an illumination optical system (13). The display panel (12) is a transparent type. The illumination optical system (13) guides the illu...
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JP6410741B2 |
An illumination optical unit for projection lithography serves for illuminating an object field, in which an object to be imaged can be arranged, with illumination light. The illumination optical unit has a field facet mirror having a pl...
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JP6410115B2 |
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JP2018155982A |
To provide an exposure device with short arc flash lamp, which uses a short arc flash lamp that radiates vacuum violet light in a lens tube and has high light utilization efficiency and improved illumination uniformity.In a lens tube 2, ...
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JP6398839B2 |
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JP6394076B2 |
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JP6394071B2 |
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JP2018147851A |
To provide a solar simulator capable of radiating light having high parallel accuracy and high uniformity, from an extremely close range, and whose manufacturing cost and maintenance cost are inexpensive.A solar simulator includes: a lon...
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JP6390879B2 |
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JP6383727B2 |
In an embodiment this vehicle lamp is equipped with: a first light source (102), which emits a blue laser light (B) having a peak wavelength within a wavelength band of 450-470 nm; a second light source (104), which emits a green laser l...
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JP6381346B2 |
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JP6373231B2 |
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JP6371473B2 |
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JP6370626B2 |
An illumination optical element irradiates a predetermined area of an illumination target surface with light in a planar manner. The illumination optical element has an optical surface directed toward the illumination target surface. The...
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JP6369906B2 |
An illumination optical unit for EUV projection lithography guides illumination light to an illumination field, in which a lithography mask can be arranged. A facet mirror with a plurality of facets guides the illumination light to the i...
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JP2018116279A |
To provide an illumination optical device and a projection exposure device capable of decreasing a loss of light quantity when a mask is illuminated with illumination light in a predetermined polarization state.The projection exposure de...
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JP6364265B2 |
The method involves emitting a light beam (1) in an optical axis defining a Z-direction at a Gaussian distribution (2a). A beam-forming (3) and a beam focusing optics (4) are arranged perpendicular to the z-direction in an XY plane, for ...
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JP6359521B2 |
The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising at least one polarization-influencing arrangement having a first reflection surface and a...
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JP2018518702A |
The illumination system of the microlithography projection apparatus (10) includes an irradiation adjustment unit (52) that adjusts the irradiation distribution of the projected light on the surface (S). The irradiation control unit (52)...
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JP6354725B2 |
An illumination device includes a plurality of excitation light sources; a fluorescent plate for receiving the excitation light and emitting fluorescent light; and an optical system for causing excitation light from each of the plurality...
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JP6356971B2 |
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JP6351625B2 |
An EUV mirror with a substrate and a multilayer arrangement including: a periodic first layer group having N1>1 first layer pairs of period thickness P1 and arranged on a radiation entrance side of the multilayer arrangement; a periodic ...
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JP6350013B2 |
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JP6347895B2 |
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JP6348478B2 |
An EUV projection lithography illumination optical unit guides illumination light toward an object field, the illumination optical unit comprising. The unit includes: a first facet mirror comprising a plurality of first monolithic facets...
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JP2018092809A |
To provide a new structure of a lighting module capable of easily achieving equalization of luminance of a light emission range.A lighting module 10 includes: a light guide plate 13 having a first main surface 13A for emitting emission l...
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JP6343344B2 |
An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (60) having a plurality of light entrance facets (75) each being associated with a secondary light source (106). A spatial l...
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JP6339658B2 |
A microlithographic apparatus includes an objective that includes a transmission filter that is configured to variably modify a light irradiance distribution in a projection light path. The transmission filter includes a plurality of gas...
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JP6330830B2 |
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JP6332758B2 |
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JP6327035B2 |
An illumination device has a plurality of first lens elements to collect incident light beams, and a field lens to guide each of the light beams that have passed through the plurality of first lens elements to an entire region of a speci...
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JP2018077534A |
To provide a catadioptric projection objective device for imaging an object field arranged on an object plane of a projection objective device onto an image field arranged on an image plane of the projection objective device.A catadioptr...
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JP6326432B2 |
Disclosed is a reflector apparatus comprising a reflector and an array of thermoelectric heat pumps each having a first end proximal to and in thermal contact with the reflector and having a second end distal from the reflector, a lithog...
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JP6323425B2 |
An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system (ILS) for illuminating a reticle...
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JP6323743B2 |
An illumination device includes a diffusion member having an anisotropic diffusion surface, a rotary shaft member configured to rotate the anisotropic diffusion surface while a coherent light beam from a light source is illuminated on th...
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JP6318358B2 |
An illumination apparatus comprising, a light source that emits a laser beam, a lens array on which the laser beam is illuminated, a plurality of element lenses having a diameter greater than or equal to the laser beam are arranged in th...
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JP6318383B2 |
To provide a linear light source unit structure having a hole between the light source side of a light guide member and a light-emitting surface, and diffusing incident light.In a linear light source unit structure, the shape of a hole i...
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JP2018066956A |
To provide technology for shaping a light-shielding plate that defines an illumination region into a target shape with high accuracy, while achieving low-cost and space-saving system.The present invention provides an illumination optical...
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JP6316226B2 |
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JP6315050B2 |
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JP6314540B2 |
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JP2018063448A |
To provide a variant form lens that can broaden an illumination range of incident light, and can be formed into miniaturization.A variant form lens 400 has: an incidence part 410; and an outgoing part 430. The incidence part 410 has an e...
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