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JP6587557B2 |
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JP6582487B2 |
A light source device, an illumination device, and a projector which are capable of thinning a bundle of light beams while being low in afocal magnification ratio, and are small in size are to be provided. The light source device include...
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JP6582465B2 |
A projection lens included in a projector using laser beams as a light source is provided, the laser beams including as the light source, first blue laser light beams, second blue laser beams, first green laser beams, second green laser ...
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JP6583741B2 |
An illumination optical system having high degree of freedom regarding change of polarization state. The illumination optical system for illuminating an illumination objective surface with light from a light source includes a first spati...
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JP6579363B2 |
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JP6574087B2 |
To provide: an exposure device and an exposure method, with which a mask pattern can be accurately exposed and transferred in relation to a shape of an exposed region of a workpiece even if the workpiece is distorted, and exposure accura...
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JP6569722B2 |
Provided is a liquid crystal illumination device capable of providing a high-efficiency and high-intensity liquid crystal panel. The liquid crystal illumination device includes a liquid crystal panel, a light source configured to project...
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JP6570298B2 |
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JP6565362B2 |
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JP6565365B2 |
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JP6558093B2 |
A feeding mechanism is used to adjust the distance between a reduction side lens group and an object plane for back focus adjustment. A rotation angle adjustment mechanism capable of rotating action independent of rotating action perform...
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JP2019128581A |
To provide a light source device capable of condensing light emitted from a light source to a predetermined irradiation range and increasing use efficiency of light.A light source device 10 is constituted by a light source 12, a collimat...
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JP6547887B2 |
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JP6540183B2 |
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JP6540044B2 |
An optical projection device, which effectively suppresses variation in aberration due to irregularities in installation positions of lens groups which form an optical projection system, and a projector which includes the optical project...
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JP6542208B2 |
The disclosure provides an optical component that includes an optical element fixed in the transverse direction in a frame. The frame has a linear expansion of at most 0.01% in the transverse direction even in the case of a linear expans...
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JP2019109302A |
To provide an illumination optical system that suppresses enables optimal illumination light for a dark field illumination, as suppressing a loss of an amount of light.An illumination optical system 1, which irradiates an irradiated surf...
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JP6537899B2 |
A light emitting apparatus for a vehicle includes a light source, a diffuser and a beam guider. The light source emits light having a beam pattern with a first imaginary line starting from a center of the beam pattern and extending to a ...
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JP6536724B1 |
To provide a light source device in which a plurality of semiconductor laser chips are used to increase the light output while suppressing the expansion of the device scale. A light source device includes a plurality of light emitting re...
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JP2019517033A |
The extreme ultraviolet (EUV) lithography ruling engine that prints one-dimensional lines on the target workpiece includes a light source for EUV synchrotron radiation, a pattern source that defines a 1D pattern, an illumination unit (IU...
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JP6529809B2 |
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JP6527737B2 |
To provide a plate-shaped focusing optical system plane light source of thin total thickness, having an irradiation object surface of high illuminance uniformity and having a light radiation surface smaller than the irradiation object su...
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JP6520211B2 |
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JP2019079062A |
To increase effective resolution of imaged light reflected from a polarizing beam splitter.Polarizing beam splitter plates 104 and systems incorporating such beam splitter plates are described. The polarizing beam splitter plate includes...
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JP6512253B2 |
The present invention is provided with: a mask holding drum (21) that holds a reflective mask (M); a beam splitter (PBS), which reflects an inputted lighting luminous flux (EL1) toward the mask (M), and which passes through a projection ...
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JP6503766B2 |
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JP6506982B2 |
Described herein is a lens having at least one object-side and at least one image-side refractive surface. In order to determine a light intensity of an effective luminous flux propagating through the lens without the need for additional...
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JP6506599B2 |
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JP6501187B2 |
The invention relates to a photolithographic illumination device including: a light beam source; a condenser (5); an optical homogenizing system (4), including at least one microlens array (L3, L4), arranged upstream from the condenser (...
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JP6502325B2 |
The disclosure provides a system for producing structures in a substrate. The system includes a projection exposure system. The projection exposure system includes a projection optical unit and an illumination system.
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JP6498680B2 |
A faceted reflector (32, 32″) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflec...
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JP6495437B2 |
Near-infrared light is projected substantially uniformly. Included is an infrared semiconductor laser element (1) that emits a near-infrared laser beam (L1), a diffusion member (5) that does not include a fluorescent substance and that d...
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JP6493445B2 |
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JP6494259B2 |
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JP6493325B2 |
A light optical device capable of forming a bracelet-form lighting pupil distribution in a peripherally-polarized state with a light quantity loss satisfactorily controlled, the device comprising a light flux conversion element (50) for ...
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JP6494339B2 |
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JP6493584B2 |
An EUV projection lithography illumination optical unit guides illumination light toward an object field, the illumination optical unit comprising. The unit includes: a first facet mirror comprising a plurality of first monolithic facets...
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JP6489769B2 |
An optical element comprises a reflecting coating on a substrate. The reflecting coating contains boron and can have a thickness of more than 50 nm.
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JP2019032558A |
To provide an illumination optical device capable of forming an annular illumination pupil distribution of a peripheral polarization state while satisfactorily suppressing a luminous energy loss.The illumination optical device of the pre...
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JP6472055B2 |
In a method for operating a microlithographic projection exposure apparatus, a facet mirror is illuminated with projection light having a center wavelength of between 5 nm and 30 nm. The facet mirror has a plurality of adjustable mirror ...
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JP6471900B2 |
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JP6471424B2 |
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JP6467353B2 |
The assembly to homogenize a light beam, especially from an excimer laser, has at least two optical functional surfaces (26) in succession along the light path (z). Two groups of refractive or diffractive imaging elements are at the opti...
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JP6468765B2 |
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JP6465594B2 |
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JP2019015974A |
To provide an exposure apparatus and an exposure method by which higher efficiency and a longer service life of a spatial optical modulation element can be achieved.An exposure apparatus 100 includes: a microlens array 142 in which micro...
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JP6457754B2 |
An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement to predefine a shape of the illumination ...
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JP6450561B2 |
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JP6450721B2 |
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JP6438412B2 |
Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to s...
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