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WO/2004/089555A1 |
Known devices for coating a continuous web of material (13) comprise a casting container (1) which consists of a casting surface (8) for the discharge of the coating material in a free falling curtain (C); at least one distribution chamb...
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WO/2004/088423A2 |
The present invention relates to a composition and a process for preparing a composition that comprises: a) a novolak resin partially esterified with from about 3 to about 7 weight percent of a naphthoquinonediazidosulfonyl group; b) one...
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WO/2004/086140A1 |
A silver halide color photographic lightsensitive material, which is excellent in photographic speed and sharpness and which is improved with respect to pressure resistance, especially pressure resistance under wet conditions. In particu...
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WO/2004/083957A1 |
A silver halide photographic material which can form high-contrast images by treatment with a stable developer. The material contains at least one compound rep-resented by the general formula (I) or (II). General formula (I): wherein X r...
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WO/2004/081663A2 |
A positive photosensitive resin composition of at least one uncapped polybenzoxazole precursor polymer, at least one capped polybenzoxazole precursor polymer, at least one photosensitive agent and at least one solvent, use of such compos...
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WO/2004/080714A1 |
A photochromic multilayer body comprises a base composed of a translucent thermoplastic resin such as a polycarbonate resin, a crosslinked resin layer which is formed on a surface of the base and contains 20-40 mass% of inorganic colloid...
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WO/2004/081661A1 |
The present invention relates to a silver halide color photographic light-sensitive material, in particular to a multilayer material which comprises a support provided with blue, green and red sensitive silver halide emulsion layers cont...
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WO/2004/081664A2 |
A heat resistant negative working photosensitive composition that comprises (a) one or more polybenzoxazole precursor polymers (I): wherein x is an integer from about 10 to about 1000, y is an integer from 0 to about 900 and (x+y) is abo...
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WO/2004/076465A2 |
New lithographic compositions (e.g., for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organosilicon polymer dispersed or dissolved in a solvent system, and preferably a cross...
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WO/2004/077151A1 |
A silver halide color photographic lightsensitive material that is excellent in processing stability and has its pressure resistance enhanced. In particular, a silver halide color photographic lightsensitive material comprising a support...
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WO/2004/076495A2 |
A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heatin...
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WO/2004/077148A1 |
A process for producing a silver halide photographic lightsensitive material, wherein use is made of water base coating liquids being excellent in antisepsis, productivity and coating stability. In particular, a process for producing a s...
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WO/2004/077145A1 |
A silver halide photographic lightsensitive material of desirable graininess and high photographic speed. This silver halide photographic lightsensitive material is one comprising a support and, superimposed thereon, silver halide emulsi...
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WO/2004/074933A2 |
Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the ca...
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WO/2004/075589A1 |
A radio base station for transmitting re-transmission data during handover or normal data in a reduced transmission time thereby to ensure a transmission allocation time. The radio base station comprises a buffer for holding communicatio...
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WO/2004/074883A1 |
The invention relates to a neutral-tinted gray photochromic plastic object which remains almost entirely color-neutral or gray both during darkening and lightening conditions. The inventive plastic object can be used especially as a neut...
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WO/2004/072730A1 |
A silver color photography photosensitive material having a support and, applied thereon, at least one layer containing a silver halide emulsion, characterized in that said silver halide emulsion contains at least one selenium compound a...
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WO/2004/068238A1 |
A silver halide emulsion which has high sensitivity, reduced fogging, and a high gamma value regardless of exposure mode, is excellent in storage stability and latent-image stability, and enables high-quality prints to be always obtained...
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WO/2004/068239A1 |
An image forming method for forming a stable image excellent in sharpness with no variation in density in the image part even after continuous printing by means of a high-speed digital printer. The method in which a silver halide color p...
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WO/2004/068236A1 |
A silver halide color photography photosensitive material having a support and, applied thereon, at least one photosensitive emulsion layer and non-photosensitive emulsion layer, characterized in that at least one selected from the photo...
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WO/2004/068237A1 |
A silver halide emulsion which has high sensitivity and a high gamma value regardless of exposure mode, is excellent in coating fluid stability in stagnation and latent-image stability, and enables high-quality prints to be always obtain...
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WO/2004/068242A1 |
A resist composition for use in an immersion lithography process which satisfies a specific parameter; a positive resist composition which comprises a resin component (A) having a dissolution-suppressing group being dissociated by an aci...
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WO/2004/065615A2 |
A crosslinkable second-order nonlinear optical polymer having one or more polarizable chromophore moieties, one or more diene moieties, and one or more dienophile or dienophile precursor moieties, wherein the diene and dienophile moietie...
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WO/2004/060650A1 |
A biaxially oriented thermoplastic structure including a low density core layer formed from polypropylene, highly crystalline polypropylene or high density polyethylene, and outer layers formed from highly crystalline polypropylene or hi...
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WO/2004/057420A1 |
The invention relates to tabular silver halide emulsions that are useful in the field of photography and particularly to a process for preparing the tabular silver halide emulsions. The process of the invention relates to tabular grain f...
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WO/2004/051366A2 |
The invention relates to a method for producing holographic recording materials and to said holographic recording materials. The aim of said invention is to develop a method and materials which make it possible to generate holograms exhi...
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WO/2004/046814A1 |
A silver halide color photosensitive material high in sensitivity and excellent in shelf life stability, latent image stability, and processing stability. The material comprising a support and further comprising, over the support, at lea...
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WO/2004/046811A1 |
A silver halide photosensitive material for color print and its production method. Particularly, a silver halide photosensitive material which has the coating aptitudes such as the liquid wettability in high−speed coating, the density ...
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WO/2004/046812A1 |
A silver halide photosensitive material having a high photosensitivity, undergoing little fog, and having a favorable gradation, a long shelf life, a favorable pressure resistance, an excellent text image reproducibility, and an excellen...
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WO/2004/046817A1 |
A silver halide photosensitive material having a paper support in which resin coating layers are provided on both sides of a paper base by coating, particularly a silver halide photosensitive material having an excellent glossiness, an i...
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WO/2004/046815A1 |
A silver halide color photosensitive material exhibiting a high photosensitivity, an excellent granularity, a low humidity−dependence in photographing, and a favorable radiation fog resistance. The material is characterized in that at ...
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WO/2004/046813A1 |
A silver halide color photosensitive material comprising a silver halide emulsion high in photosensitivity, excellent in granularity and latent image stability, and good in preservability stability. The material comprising a support and ...
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WO/2004/046824A1 |
A process for producing a deformed image comprising the steps of: digitally exposing a colour photographic silver halide material, said colour photographic silver halide material comprising on a deformable plastic support at least one bl...
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WO/2004/046825A1 |
A deformable colour photographic silver halide material, said colour photographic silver halide material comprising on a deformable plastic support at least one blue-sensitive silver halide emulsion layer containing at least one yellow c...
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WO/2004/046822A1 |
A silver halide color photosensitive material having a high photosensitive, hardly undergoing fog, and exhibiting a good granularity and an excellent development stability. The silver halide color photosensitive material comprising a sup...
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WO/2004/046821A1 |
A silver halide color photosensitive material exhibiting an excellent granularity even though it has a high photosensitivity and exhibiting favorable photography performance hardly changing even if a silver halide emulsion coating soluti...
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WO/2004/046823A1 |
A deformable colour photographic silver halide material, said colour photographic silver halide material comprising on a deformable plastic support at least one blue-sensitive silver halide emulsion layer containing at least one yellow c...
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WO/2004/046816A1 |
A method for producing a silver halide photosensitive material using an aqueous coating liquid excellent in preservability, cleanability, productivity, and coating stability without marring the photography performance. The method for pro...
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WO/2004/043704A1 |
A process for forming an image on a substrate, which comprises coating the substrate with an amine of molybdenum, tungsten or vanadium that changes colour on heating or irradiation as an aqueous dispersion or suspension or as a solution ...
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WO/2004/042475A1 |
A resist composition, characterized in that it comprises (A) a fluorine-containing polymer having an acidic group being blocked with a blocking group having a cycloalkyl group, an organic group having one or more of cycloalkyl groups, a ...
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WO/2004/042474A1 |
A negative type photosensitive resin composition characterized by comprising an alkali-soluble photosensitive resin (A) having acid groups and having three or more ethylenic double bonds per molecule, an ink repellent (B) comprising a po...
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WO/2004/041881A1 |
A polymeric compound for photoresist, comprising monomer units having a skeleton of 2,6-dioxabicyclo[3.3.0]octane in its polymer structure. The monomer units having a skeleton of 2,6-dioxabicyclo[3.3.0]octane comprise monomer units of th...
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WO/2004/042704A2 |
Optical media (10) having markings that are non-interfering, or substantially non-interfering with readout of data from the optical media are disclosed. The optical media having at least one layer (101) comprising a formulation comprised...
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WO/2004/040377A1 |
Disclosed is a chemical-amplification positive-working photoresist composition having compliability to various types of resist patterns with excellent sensitivity and pattern resolution exhibiting high exposure margin and focusing depth ...
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WO/2004/039758A1 |
The invention relates to a novel presentation for a phenolic compound in solid form. More specifically, the invention relates to hydroquinone beads. The invention also relates to the preparation of said pearls. The inventive method is ch...
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WO/2004/039601A1 |
Vesicular images are formed by thermal imaging of imageable layers containing thermally imageable vesicular imaging compositions. The vesicular images can be used as masks for imaging printing plate precursors. In one aspect, the printin...
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WO/2004/040371A2 |
Novel copolymers suitable for forming the top layer photoimageable coating in a deep UV, particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition an ...
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WO/2004/037866A2 |
Photoresist compositions that contain one or more components having sulfonamide and Si substitution. Preferred photoresist compositions of the invention contain an Si-polymer such as a silsesquioxane that has sulfonamide substitution and...
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WO/2004/038506A1 |
A chemically amplified positive photosensitive resin composition capable of forming thick or extra thick resist patterns, which comprises (A) an alkali-soluble novolac resin, (B) an alkali-soluble acrylic resin, (C) an acetal compound, a...
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WO/2004/035641A1 |
A process for the production of fluoropolymers for resists excellent in transparency to vacuum ultraviolet rays, characterized in that in the production of a fluoropolymer comprising structural units resulting from an fluorine -containin...
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