Title:
COMPOSITION AND ORGANIC THIN FILM TRANSISTOR USING THE SAME
Document Type and Number:
Japanese Patent JP2016210870
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a composition useful for producing a gate insulation layer having a low dielectric loss tangent.SOLUTION: The composition comprises croconic acid (A), a polymer compound (B) soluble with an alcohol solvent, and an alcohol solvent (C). The alcohol solvent (C) has a boiling point of 180°C or lower at 1 atm; and the polymer compound (B) is a polymer represented by the formula below. The composition is to be used for a gate insulation layer and further contains a melamine compound or a urea compound (D) that reacts with a hydroxyl group in the presence of an acid. A method for forming a gate insulation layer film is provided, which includes a step of applying the above composition on a substrate to form a film and a step of heating the formed film to cure.SELECTED DRAWING: None
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Inventors:
YAHAGI MITSURU
Application Number:
JP2015094643A
Publication Date:
December 15, 2016
Filing Date:
May 07, 2015
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08L101/00; C08F212/14; C08K5/05; C08K5/07; C09D7/12; C09D125/08; C09D161/24; C09D161/28; C09D201/00; H01L21/312; H01L29/786; H01L51/05; H01L51/30
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto
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