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Matches 351 - 400 out of 2,317

Document Document Title
JP2015063702A
To provide a photosensitive resin composition that has high transparency and a low dielectric constant, is easily subjected to photo-patterning, has high heat resistance, and can be used in a film form.An embodiment of the present invent...  
JP2015509660A
An organic electronic devide in which the present invention contains the poly cycloolefin flat-ized layer, It is related with a manufacturing method of a flat-ized layer especially arranged between a substrate, a functional layer, for ex...  
JPWO2013005429A
A forming object of the present invention is used for an optical component chosen from ftheta lens, an image pick-up lens, or a light guide plate, and contains polymer which has alicyclic structure in a part or all of a repetition struct...  
JPWO2013005429A1
本発明の成形体は、fθレンズ、撮像レンズ たは導光板から選ばれる光学部品に用いら 、繰り返し構造単位の一部または全部に脂 式構造を有するポリマーを含む。そし...  
JP5673337B2  
JP5656349B2  
JP2015007781A
To provide a positive resist composition for immersion exposure, capable of further improving a receding contact angle with an immersion liquid in immersion exposure and reducing watermark defects, and to provide a pattern forming method...  
JP2014240500A
To provide a photoreactive polymer and an alignment layer comprising the same that exhibit excellent alignment rate and alignment stability.The photoreactive polymer comprises a cyclic olefin-based repeating unit with one or more photore...  
JP5629454B2  
JP5624759B2  
JP5624917B2  
JP2014172170A
To solve a problem that a window block used in a window part for detection of a substrate polishing endpoint deteriorates when exposed to light with wavelengths shorter than 400 nm.A multilayer chemical mechanical polishing pad is provid...  
JP5591777B2  
JP5584475B2  
JP5561271B2  
JP5560709B2  
JP5549397B2  
JP5540784B2  
JP2014114422A
To provide a new catalyst for producing a petroleum resin, which can allow the petroleum resin, that is produced by using the catalyst, to be excellent in hue and polymerization conversion ratio of monomers in a starting oil and have low...  
JP2014111569A
To provide a method for producing a compound having a bis(trifluoroalkanesulfonyl)methyl group which is useful as a raw material compound for a resin having high acidity and hydrophobicity and a salt thereof in a simple manner.There is p...  
JP5505538B2  
JP5499889B2  
JPWO2012057135A
A catalyst for a norbornene system polymerization containing a transition metal complex (A) in which the present invention is shown by a general formula (1), And a manufacturing method of a norbornene system copolymer which has a monomer...  
JPWO2012057135A1
本発明は一般式(1)で示される遷移金属錯 体(A)を含有するノルボルネン系重合用触 媒、及び前記重合用触媒の存在下に、ノルボ ルネン系モノマーを単独重合または共重...  
JP2014081496A
To provide a resist material for a mask blank, which shows excellent long-term stability after application and exposure stability in vacuum, an EUV resist material that reduces outgassing in vacuum, and a pattern forming method using the...  
JP2013533893A5  
JP5481944B2  
JP5480850B2  
JP2014065873A
To provide a radical-polymerizable compound which imparts excellent surface drying characteristics and excellent storage stability to a radical-polymerizable resin composition when added thereto.A radical-polymerizable compound has an ai...  
JP5475233B2  
JP5466705B2  
JP5459221B2  
JP5446144B2  
JP5449649B2  
JP2014038332A
To provide an optical alignment film, which is a liquid crystal alignment film which, for instance, can achieve a wide viewing angle and a contrast ratio specific to a photopolymerizable alignment film, and, by making interaction thereof...  
JP5430066B2  
JPWO2012053535A1
本発明は一般式(1)で示される遷移金属錯 体(A)を含有するノルボルネン系モノマー 重合用触媒、及び前記重合用触媒の存在下に 、一般式(2)及び一般式(3)で示さ...  
JPWO2012053535A
The present invention provides a manufacturing method of a norbornene system copolymer which has a monomer unit shown by general formula (2) and a general formula (3) under existence of a catalyst for a norbornene system monomer polymeri...  
JP5422498B2  
JP5401800B2  
JP5397343B2  
JP5396763B2  
JP5396918B2  
JP5390295B2  
JP5380867B2  
JP5383039B2  
JP5375837B2
Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide wa...  
JP5364586B2
The present invention provides a method for preparing a polymer by precipitation polymerization, comprising the steps of mixing an antisolvent a), a monomer b), and a catalyst c), and while polymerizing the monomers, simultaneously preci...  
JP5366740B2
Disclosed is an ether-containing cyclic structure-containing polymer derived from a monomer represented by formula (1) below, or derived from a monomer represented by formula (1) below and a single or more species of cyclic olefinic mono...  
JP2013241595A
To provide a fluorine-containing monomer useful as a monomer to manufacture a base resin of a resist material for a high energy line such as ArF excimer laser.A fluorine-containing monomer as shown in general formula (6) obtained by an e...  

Matches 351 - 400 out of 2,317