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JP2013519863A |
The invention relates to a heat treatment inner chamber (3) for thermally processing a substrate (20), having walls (10) which enclose an inner space (24) of the heat treatment inner chamber (3), having a mounting apparatus (8) for mount...
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JP2013093600A |
To provide a method for managing temperature distribution varying dependently on the patterning of wafer in rapid thermal processing, to greatly enhance the uniformity of rapid thermal processing (RTP).Provided are an apparatus 60 and a ...
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JP5195419B2 |
A heat treating furnace capable of continuously performing binder removal and subsequent firing without requiring a complicated configuration and increasing the equipment size and cost, for example, for degreasing a ceramic molding which...
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JP5167640B2 |
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JP2013032894A |
To provide a heat treatment furnace capable of heating clean intake air with a configuration as inexpensive as possible and with high heat efficiency.The heat treatment furnace supplies clean air, while exhausting air of a heating chambe...
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JP5136764B2 |
A vertical rapid thermal processing system includes a processing chamber and an elevator structure providing for vertical movement of a workpiece within the processing chamber. The elevator structure includes a workpiece support for supp...
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JP5134595B2 |
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JP5114071B2 |
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JP5116074B2 |
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JP2013002728A |
To provide a heat treatment furnace which allows, outside the furnace, a lead wire in the furnace to be connected and detached from an electrode bar exposed to the outside, and to provide a method for replacing a heater of the heat treat...
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JP2012233644A |
To provide a heat treatment furnace which has high pressure resistance, high cooling efficiency, reduced weight, and large baking space and which is usable as a vacuum furnace, a depressurized furnace, or a pressurized furnace and is als...
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JP5074707B2 |
Heat deformation of a front side of a heating chamber in its thickness direction is prevented, and therefore a uniform temperature distribution within, and a low heat loss from, the heating chamber is enabled, by using a bimetal plate as...
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JP5062803B2 |
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JP5054892B2 |
A heating muffle for a muffle kiln for the production of a dental ceramic product containing titanium, which comprises a hollow unit, which is provided with at least one opening for the uptake of the ceramic product and has completely he...
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JP5050513B2 |
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JP5024647B2 |
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JP2012172871A |
To provide a heat treatment apparatus, with which installing cost of a thermocouple is reduced, and a signal from the thermocouple is not required to be calibrated.An in-furnace temperature sensor of a reference area A1 has a first therm...
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JP2012520390A |
A high-temperature furnace for the annealing of sheet-metal joints (4) is described, having an annealing base (2), having a support device (3), which forms a placement surface (17) for coaxially receiving a sheet-metal joint (4) with spa...
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JP2012154542A |
To provide a dry-distillation pyrolysis device in which a treatment object to be pyrolyzed into dry-distilled gas can be dry-distilled while a vessel storing the treatment object is heated in a shorter time than in the conventional syste...
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JP5002071B2 |
The method for producing a fired body of the invention has the steps of: preparing a starting material that is a mixture containing an inorganic compound, an organic binder and a solvent; molding the mixture to obtain a green molded body...
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JP4996525B2 |
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JP4996760B1 |
To provide a batch type heat treatment furnace capable of heat treatment at a stable temperature. The furnace body 10 has a box-shaped furnace main body 11 and is subjected to heat treatment, and a moving table 20 for moving a heat-treat...
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JP4979836B2 |
In a continuous annealing furnace 10, a subject material 1 introduced through an inlet sealing portion 11 is continuously transported from a heating zone 12 to cooling zones 13a to 13c in the hydrogen-gas containing ambient gas so as to ...
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JP4974805B2 |
A hydrogen vacuum furnace (100) is provided with a process chamber (1) wherein a subject (10) to be heated is stored; a heating chamber (2) wherein a heater lamp (25) is stored; and a crystal board (3) for separating the subject (10) and...
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JP4963336B2 |
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JP4958725B2 |
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JP4949192B2 |
The actual temperature in the interior of the firing furnace is measured and stored. The temperature integral recorded at discrete points is determined over the course of time and is stored. The recorded temperature integral is used in a...
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JP4931414B2 |
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JP2012078048A |
To provide a heat treatment device that utilizes a catalyst activation heater for heat treatment, and suppresses increase in size and costs of the device.This heat treatment device 1A includes a heat treatment furnace 20 for housing a wo...
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JP4918949B2 |
A system and method for determining the stray radiation within a heating chamber (74) of a thermal processing apparatus (22). The stray radiation is determined by moving a generally unheated wafer vertically through the heating chamber, ...
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JP4914270B2 |
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JP4902493B2 |
The method for the operation of press oven (10) for ceramic dental material, comprises supplying the ceramic dental material in an embedding mass over a press stamp and detecting the penetration speed of the press stamp. During the press...
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JP4896954B2 |
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JP4864696B2 |
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JP4859514B2 |
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JP2012013256A |
To provide a batch furnace which allows the atmospheric gas to come in uniform contact with all objects to be baked, for baking the objects well.In the condition in which a hearth 3 is inserted into an opening part 2b to be set to a furn...
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JP2012013257A |
To provide a firing furnace capable of easily controlling a firing period and reducing unevenness in firing powder material.A kiln 3 which is a furnace core tube is equipped with a cylindrical outer tube 10 and an inner tube 11. The inne...
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JP4856326B2 |
Tower furnace has a preheating section and a high temperature section connected above it forming a housing. The preheated section equipped with a gas-heated muffle has a stop in the muffle made of heat-insulating material for the high te...
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JP4845286B2 |
A multiple pocket vapour source (105), the vapour produced by an electron beam (205) that can be directed to uncovered crucible pockets, comprising: a) a crucible (301) having a crucible surface, the surface having a plurality of pockets...
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JP2011246316A |
To provide a method for firing ceramic for preventing inflow of impurities such as oxygen into a firing container.An atmospheric gas is directly supplied from a gas supply source 5 arranged outside a firing furnace 1 into the firing cont...
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JP4819276B2 |
The plant (1) has a wall arrangement (2), which defines a heatable inner chamber (3). Parallel heater tubes (4) are arranged in the inner chamber, to guide one or more fluids to be heated. Burners (6) are arranged transverse to the heate...
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JP2011220649A |
To provide a heating apparatus which has a simple structure, is easily handled, can heat an entire heated subject equally without unevenness and is also excellent in heating efficiency.The heating apparatus 10 includes a cylindrical stor...
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JP4808471B2 |
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JP4778611B2 |
An indirect heating device using fossil fuel has a parallelepiped shaped radiant cassette. The cassette has a rectangular cross section with a height/length ratio ≥ 1.5. An Independent claim is included for: a furnace through which art...
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JP4765169B2 |
The single substrate thermal processing apparatus ( 2 ) includes a process chamber ( 5 ) arranged to accommodate a target substrate (W) and provided with a showerhead ( 10 ) disposed on its ceiling. A support member ( 28 ) is disposed to...
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JP4753433B2 |
A heater assembly for an ALD or CVD reactor provides protection for an electrical conductor associated with a heating element by using a purge gas to isolate the conductor from the corrosive environment of the reactor chamber. The purge ...
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JP4753294B2 |
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JP4750147B2 |
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JPWO2009118863A1 |
INDUSTRIAL APPLICABILITY According to the present invention, even if the fastener for fixing the heat insulating layer is broken or otherwise inconvenient, the stopper for fixing the heat insulating layer can be easily replaced in a shor...
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JP4730520B2 |
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