| Document |
Document Title |
|
JP2005127537A |
To provide a heat treatment method for giving efficient and economical heat treatment to a number of wafers with high quality, and to provide its vertical or horizontal device suitable for the heat treatment method.The individual wafers ...
|
|
JP2005127628A |
To provide a heat treatment furnace capable of unifying the distribution of temperature in a heating chamber by reducing the heat dissipation from a muffle to the external.This heat treatment furnace includes a furnace body 1 provided wi...
|
|
JP3644849B2 |
To expand a temperature distribution guaranteeing range by providing a plurality of wind direction plates adjustable in a wind direction of hot air along a vertical direction of a gap of an upstream side of a hot air circulating route. A...
|
|
JP2005114336A |
To solve the problem, where it is difficult to recover high-boiling-point constituent oil since the product oil of the high-boiling-point constituent in produced gas by carbonizing a carbonizing object is condensed in water.A carbonizati...
|
|
JP2005090949A |
To provide an improved type oven, a tunnel oven especially for mass production of PDP.This heat treatment device is constituted so as to include a means for recirculating heated fluid and to change periodically the flow direction of the ...
|
|
JP2005078818A |
To heat a furnace evenly without heating dry-distilled materials directly by induction heating when treatment of metallic wastes is carried out.In the induction heating dry distillation furnace in which the dry-distilled materials 6 in t...
|
|
JP2005069514A |
To provide a heat-treating furnace, in which flow of current by discharge is prevented between electric heaters used for furnace heating means by discharge.A product as the subject is heat-treated in vacuum or a gas atmosphere of group-0...
|
|
JP3625741B2 |
|
|
JP2005049010A |
To provide a hot air circulation incineration kiln that increases atmospheric air flow rate flowing into a group of shelf boards and thus increases the air flow speed so that the temperature difference between the atmospheric air in the ...
|
|
JP2005048984A |
To provide a heat treatment furnace capable of shortening a time necessary for replacing an initial furnace atmosphere with a desired furnace atmosphere, precisely performing the replacement, and lowering a concentration of residual init...
|
|
JP3623685B2 |
To provide a heat treatment device which can level the heating temperature of a plate-shaped substance to be processed. Hot blast to heat plural sheets of substances 3 to be processed is generated within a heating chamber 13. This device...
|
|
JP3618261B2 |
|
|
JP3615335B2 |
|
|
JP3614748B2 |
To obtain a heat treatment apparatus capable of being surely sealed even without cooling a furnace cover and not generating particles. A furnace opening 16 is provided by partly opening a furnace body 1 for heating a material to be heate...
|
|
JP2005008658A |
To provide an apparatus for a carbonization treatment of wastes designed to improve the heating efficiency in the carbonization treatment of the wastes.This apparatus 11 for the carbonization treatment of the wastes is composed of an out...
|
|
JP2005009702A |
To increase production with efficient and continuous operation without lowering quality in a multi-cell type vacuum heat treating apparatus.This multi-cell type vacuum heat treating apparatus 1 is provided with a plurality of treatment c...
|
|
JP3603176B2 |
|
|
JP2004353928A |
To provide a clean oven, for performing heat treatment in clean high temperature atmospheric gas up to about 500°C, by largely reducing electric power consumption.This clean oven 1 heat-treats a treating object placed in a heat treatmen...
|
|
JP2004354043A |
To provide a heat treatment method for a substrate and a heat treatment furnace capable of early solving the temperature distribution within the substrate when carrying the substrate containing a film forming material between adjacent he...
|
|
JP2004536272A |
The invention relates to a method and a device for the thermal treatment, especially short-term, of flat objects in particular, such as semi-conductor, glass or metal substrates. Heat is, at least in part, supplied to or taken away from ...
|
|
JP3593771B2 |
|
|
JP2004319754A |
To provide compact heat treatment equipment exhibiting excellent maintainability.A lamp house 5 contains 27 flush lamps 69 while arranging, at a constant interval, along a horizontal direction (X direction) perpendicular to the longitudi...
|
|
JP2004303921A |
To provide a heating apparatus which can radiate uniform thermal energy to substrates from a heating surface without a particular apparatus and control.A heating plate 74 is formed of a first heating part 31, a second heating part 32, an...
|
|
JP2004293980A |
To provide a compactly formable heating furnace capable of preventing an object to be heated from being heated locally.Burners 31, 32 have gas nozzles 411, 421 for injecting fuel gas F and air nozzles 511, 521 for combustion for injectin...
|
|
JP2004263206A |
To provide a heat treatment device in which the configuration of a magnetic field generation means is made simple by using a compact solenoid magnet (an air-core coil), and as a result, the weight and the height of the device are reduced...
|
|
JP2004257613A |
To provide a preheater of a preform for a composite material capable of manufacturing the composite material having excellent wear resistance and vibration damping performance.In this preheater, a shielded casing 16 in which a sealingly ...
|
|
JP2004257600A |
To provide a continuous furnace capable of saving power consumption by suppressing heat radiation amount from a heating chamber in the furnace.In this continuous furnace having a muffle 2 passed through the heating chamber 1 in the furna...
|
|
JP2004253665A |
To provide a wafer holder for a semiconductor manufacturing apparatus wherein the thermal uniformity of the wafer holding surface of a wafer holder having a wafer mounting surface is improved, and to provide a semiconductor manufacturing...
|
|
JP3560190B2 |
To improve production efficiency by detecting temperatures of a plurality of heating bodies to control the temperatures of residual heating bodies so that the temperatures of the residual heating bodies converge onto the temperatures of ...
|
|
JP2004231424A |
To solve problems that thermal efficiency is low and refractory such as fine ceramic used as a heat conducting plate is expensive and difficult to form large sized one in the conventional indirect heating type lime kiln, though there are...
|
|
JP2004231463A |
To provide a firing furnace which requires only a small maintenance work and in which a dewaxing process and a sintering process can be performed for producing a sintered compact having a constant quality, and to provide a production met...
|
|
JP3554847B2 |
A determination unit determines the absolute exhaust pressure of an exhaust system (15), based on the pressure difference between the exhaust pressure measured by a differential pressure gage (23) and the atmospheric pressure measured by...
|
|
JP3548809B2 |
PURPOSE: To contrive to miniaturize a furnace or to decrease setting space, to decrease consumption of electric power, and to raise work efficiency of sending in or taking out work of baked material or maintenance work. CONSTITUTION: A p...
|
|
JP3543949B2 |
To enable stable control, without the need for atmospheric air introduction and inert gas introduction, simplify the structure of an exhaust system and reduce cost. An apparatus, where a treatment object matter (w) is contained in the in...
|
|
JP3543963B2 |
To improve maintenance operability by simplifying the piping of an exhaustion system. The heat-treating equipment is provided with a main valve 18, a 1st auxiliary valve 30, and a 2nd auxiliary valve 31 for a pipe 13 of the exhaustion sy...
|
|
JP3534955B2 |
To provide a gaseous far infrared ray heater capable of performing a uniform heating of the entire heating object and further provide a far infrared ray heating furnace. A gaseous far infrared ray heater 10 is constituted by a tubular ra...
|
|
JP3533572B2 |
To provide a heat treating device in a magnetic field capable of improving characteristic of a disclike member to be treated such as a magnetic disc uniformly in the circumferential direction, saving energy, and controlling temperature w...
|
|
JP3528944B2 |
PURPOSE: To provide the subject system enabling necessary mechanical power to be significantly reduced by utilizing, as a heat source, hot effluent changing in a time series fashion within the temperature range between 40 and 70°C, alon...
|
|
JP3526779B2 |
To provide the preventing method of bending of a muffle in a continuous sintering furnace, sintering the products of powder metallurgy or the like. In a muffle type continuous sintering furnace 10, a muffle 21 is disposed on a sintering ...
|
|
JP3524838B2 |
To provide a method for controlling a combustion furnace for manufacturing dental prosthesis material, the method being better adapted to various dental prosthesis materials, particularly for at least reducing or completely excluding the...
|
|
JP2004132679A |
To prevent contamination from a syringe needle or a contaminated medical apparatus used in a hospital or the like.In the radiation down-draft melting furnace, heat resistant bricks 3 are laid on a furnace bottom, and an exhaust groove 2 ...
|
|
JP2004132565A |
To provide a heat treatment furnace for easily supplying an atmospheric gas into a furnace body at a low cost without generating dew condensation and capable of saving energy.This heat treatment furnace, wherein the atmospheric gas is su...
|
|
JP2004108725A |
To provide a pressurization induction melting device capable of preventing a water cooled cable connecting an induction coil in a melting furnace incorporated in a pressure vessel with external power supply from being deformed even when ...
|
|
JP3511376B2 |
To perform multiple processes by a single set. A plurality of contact zones A-C required for processing of a work W are formed in a muffle body 11 by a first feed and discharge mechanism 17 - a third feed and discharge mechanism 19. The ...
|
|
JP2004093123A |
To provide a non-oxidation furnace with high energy efficiency capable of stably carrying out incomplete combustion of a fuel in a furnace body, a non-oxidation furnace with high energy efficiency provided with a control mechanism capabl...
|
|
JP2004085126A |
To sufficiently reduce the treatment unevenness of a treated object even when the flow velocity distribution of treatment gas in a furnace is uneven.This vacuum heat treatment furnace for leading the treatment gas into the evacuated furn...
|
|
JP3506303B2 |
To make good use of a high temperature unburnt gas generated when a cutting oil deposited on metal chip or the like is vaporized or pyrolytically decomposed as a melting fuel and thereby contrive enhance energy saving. On the introductio...
|
|
JP2004077011A |
To provide a radiation heating device capable of evenly and stably heating an object to be heated in a furnace by heat radiation.A tubular flame burner 2 and a radiation heating box 3 surrounding the flame of the tubular flame burner 2 f...
|
|
JP2004060991A |
To provide a muffle for a kiln usable for efficiently manufacturing a bulky ceramic product.This muffle 1 for a kiln houses a material to be fired in a firing chamber R comprising a floor part 2, side wall parts 3, 4, 5 and 6. The firing...
|
|
JP3499718B2 |
To realize a large-sized rotary kiln having a furnace core duct with a large inlet diameter not found heretofore and with a long axis. This indirect heating type rotary kiln is constructed such that at least both ends of a metallic furna...
|
