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WO/2021/236354A1 |
An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the c...
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WO/2021/233172A1 |
An upper electrode mechanism of a semiconductor process device, and a semiconductor process device. The upper electrode mechanism comprises a radio frequency coil (104), current sensors (9a, 9b, 9c, 9d), and current adjustment means (10a...
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WO/2021/236359A1 |
Differences in ion mass of lighter ions (having a higher mobility) and heavier ions are utilized in conjunction with bias voltage modulation of an atomic layer etch (ALE) to provide a fast ALE process. The difference in ion mobility achi...
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WO/2021/236355A1 |
An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the c...
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WO/2021/233339A1 |
A gas inlet structure for blocking plasma backflow. A gas inlet guide body of the gas inlet structure is divided into three parts, namely, a top gas inlet guide body (90), a plurality of layered gas inlet guide groups and a bottom gas in...
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WO/2021/233337A1 |
Disclosed are an ion source baffle (1), an ion etching machine, and a usage method therefor. The ion source baffle (1) comprises a baffle body (11), wherein the baffle body (11) is of a hollow structure; baffles (12) are symmetrically fi...
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WO/2021/237240A1 |
Various embodiments include apparatuses, systems, and methods for using a remote-plasma cleaning system with a directional-flow device for concurrently cleaning multiple processing stations in a processing tool used in the semiconductor ...
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WO/2021/233584A1 |
A charged particle beam device 10 for imaging and/or inspecting a sample 140 is described. The charged particle beam device includes a beam emitter 150 for emitting a primary charged particle beam 105; a retarding field device 100 for re...
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WO/2021/236364A1 |
A method, a non-transitory computer readable medium and a three-dimensional evaluation system for providing three dimensional information regarding structural elements of a specimen. The method can include illuminating the structural ele...
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WO/2021/236379A1 |
A cleanliness monitor, an evaluation system and a method. The cleanliness monitor may include: a first vacuum chamber, a second vacuum chamber, a molecule collector, a release unit, a mass spectrometer, a manipulator that may be configur...
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WO/2021/234035A2 |
The invention relates to a method for operating a particle beam microscope, comprising- setting a distance of an object (92) from an objective lens (35); - setting an excitation of the objective lens; - setting an excitation of a double ...
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WO/2021/237116A1 |
Methods of introducing a small molecule into a crystal of a macromolecule, of obtaining a microcrystal having a macromolecule and a small molecule from a crystal of the macromolecule, of determining a structural model for a complex havin...
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WO/2021/236493A1 |
Described is a process to clean up junction interfaces for fabricating semiconductor devices involving forming low-resistance electrical connections between vertically separated regions. An etch can be performed to remove silicon oxide o...
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WO/2021/233583A1 |
A charged particle beam device 10 for imaging and/or inspecting a sample 140 is described. The charged particle beam device includes a beam emitter 150 for emitting a primary charged particle beam 105, the charged particle beam device ad...
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WO/2021/233597A1 |
A microwave treatment device (1) comprises a treatment chamber (2), in which an object (5) to be treated can be arranged, and a microwave emission device, by means of which microwave radiation can be radiated into the treatment chamber (...
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WO/2021/234817A1 |
The present invention provides a charged particle beam device (1) capable of attenuating intrinsic vibrations of an ion pump (104) which is connected to a lens barrel (101), regardless of the length of the lens barrel (101). A charged pa...
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WO/2021/229732A1 |
The purpose of the present invention is to provide a charged particle beam device contrived in view of the problem addressed by the invention, the charged particle beam device making it possible to improve repeatability of a magnetic fie...
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WO/2021/231035A1 |
Systems, methods and apparatus for regulating ion energies in a plasma chamber and avoiding excessive and damaging charge buildup on the substrate surface and within capacitive structures being built on the surface. An exemplary method i...
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WO/2021/229054A1 |
An ion implantation device (20) is provided comprising an energy filter (25) with a structured membrane, wherein the energy filter (25) is heated by absorbed energy from the ion beam, and at least one additional heating element (50a-d, 5...
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WO/2021/228500A1 |
An ion implantation device (20) comprising an energy filter (25), wherein the energy filter (25) has a thermal energy dissipation surface area, wherein the energy filter (25) comprises a membrane with a first surface and a second surface...
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WO/2021/230519A1 |
The present invention provides a plasma reactor for inductively coupled plasma, the plasma reactor comprising: a ferrite core assembly having a ferrite core stack which includes a plurality of stacked ferrite cores and in which a first p...
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WO/2021/231629A1 |
A nanosecond pulser system is disclosed. In some embodiments, the nanosecond pulser system may include a high voltage power supply; a nanosecond pulser electrically coupled with the high voltage power supply and switches voltage from the...
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WO/2021/231306A1 |
Removing stimulus responsive polymers (SRPs) includes exposure to high energy metastable species, generated in a noble gas plasma, at an elevated temperature. The metastable species have sufficient energies and lifetimes to scission bond...
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WO/2021/228359A1 |
A method (480, 580) of depositing layers of a thin-film transistor on a substrate using a sputter deposition source comprising at least one first pair of electrodes and at least one second pair of electrodes, the method comprising moving...
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WO/2021/227913A1 |
The present invention relates to a temperature control apparatus, a control method therefor, and a plasma device. The temperature control apparatus comprises a temperature control part and a control part; the control part is electrically...
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WO/2021/228390A1 |
A carrier transport system for transporting a carrier within a vacuum chamber is described. The carrier transport system includes a track assembly extending in a transport direction, the track assembly comprising: a first passive magneti...
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WO/2021/231544A1 |
A system, method and software for generating and receiving information about the AC, DC, RF, voltage, and other characteristics and information provided by components in a system. The information can provide insight into the operational ...
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WO/2021/227943A1 |
Provided in the present invention are a semiconductor reaction chamber and atomic layer plasma etching equipment. The semiconductor reaction chamber comprises: a dielectric window and a reaction chamber body; a sprinkler head, provided b...
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WO/2021/229966A1 |
The purpose of the present invention is to precisely correct misalignment caused by a charging phenomenon. A charged particle beam drawing method according to the present invention comprises: a step for virtually dividing a drawing regio...
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WO/2021/230518A1 |
Provided according to the present invention is an inductively coupled plasma reactor comprising: a reaction chamber providing a plasma reaction space; a ferrite core arranged to surround the plasma reaction space; and an antenna coil for...
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WO/2021/232036A1 |
A novel method, composition and storage and delivery container for using antimony- containing dopant materials are provided. The composition is selected with sufficient vapor pressure to flow at a steady, sufficient and sustained flow ra...
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WO/2021/224079A1 |
The invention relates to a system for analysing the surface of a material, comprising: - a pulsed electron source (10) forming a monochromatic beam of incident electrons (100); - means (20) for conveying incident electrons (100) to the s...
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WO/2021/224290A1 |
The invention relates to a device and a plasma method for coating containers having a container interior, the device having at least one plasma station, which comprises at least one plasma chamber with at least one treatment location, fo...
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WO/2021/225264A1 |
Disclosed is a plasma etching method. The plasma etching method comprises: a first step for evaporating liquid perfluoropropyl carbinol (PPC); a second step for supplying a discharge gas including the evaporated PPC and argon gas to a pl...
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WO/2021/226287A1 |
A method for controlling a temperature of a substrate support assembly is provided. A first direct current (DC) power is supplied to a heating element embedded in a zone of the substrate support assembly included in a processing chamber....
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WO/2021/225263A1 |
A plasma etching method is disclosed. The plasma etching method comprises: a first step for vaporizing liquid pentafluoropropanol (PFP); a second step for supplying discharge gas comprising the vaporized PFP and argon gas into a plasma c...
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WO/2021/225411A1 |
The present invention relates to a frequency control device for providing power to a load by controlling a frequency to correspond to a variable resonant frequency of the load. The frequency control device comprises: an inverter that con...
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WO/2021/225890A1 |
An apparatus for forming a plasma may include one or more coupling ports to accept and RF current. The apparatus may additionally include a receptacle to accommodate one or more gases, in which the receptacle is oriented along a first ax...
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WO/2021/225759A1 |
A system and method for etching workpieces in a uniform manner are disclosed. The system includes a semiconductor processing system that generates a ribbon ion beam, and a workpiece holder that scans the workpiece through the ribbon ion ...
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WO/2021/223843A1 |
A drive unit (120) for moving a device (110) in a vacuum processing system is provided. The drive unit includes one or more electromagnets (124) having one or more coils (126) and a housing (122). The one or more electromagnets are arran...
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WO/2021/225934A1 |
The present disclosure provides a gas distribution assembly including a frame with a first portion and a second portion that are parallel and opposite one another. Manifolds are disposed parallel to and between the first portion and the ...
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WO/2021/225719A1 |
Methods and apparatus of controlling a temperature of components in a process chamber that is heated by a plasma or a heater and cooled by a coolant flow through a heat exchanger. An apparatus, for example, can include a chuck assembly a...
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WO/2021/225771A1 |
A surface-relief structure and techniques for fabricating the surface-relief structure are disclosed. The surface-relief structure includes a substrate, a plurality of ridges on the substrate, and a plurality of grooves each between two ...
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WO/2021/226203A1 |
Methods for pre-cleaning substrates having metal and dielectric surfaces are described. The substrate is exposed to a strong reductant to remove contaminants from the metal surface and damage the dielectric surface. The substrate is then...
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WO/2021/219519A1 |
A detector includes a set of sensing elements, first section circuitry communicatively coupling a first set of sensing elements to an input of first signal processing circuitry, second section circuitry communicatively coupling a second ...
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WO/2021/219621A1 |
The invention relates to an electrode structure for guiding and, for example, splitting a charged particle beam, for example an electron beam, along a longitudinal path, having multipolar electrode assemblies which are mutually spaced al...
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WO/2021/222726A1 |
Apparatus and methods for processing a workpiece using a plasma are provided. In one example implementation, an apparatus can include a processing chamber. The apparatus can include a plasma chamber comprising a dielectric tube defining ...
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WO/2021/222668A1 |
Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit for use in a process chamber includes: a chamber liner having a tubular body with an upper portion and a lower portion; a co...
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WO/2021/220388A1 |
Provided is a charged particle beam device, the purpose of which is to detect and discriminate charged particles emitted from a sample in a specific direction from charged particles emitted in other directions. As one aspect for achiev...
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WO/2021/220508A1 |
These tweezers 8 that can grip a sample piece 9 comprise a gripping member 8a1 and a gripping member 8a2. The gripping member 8a1 has a gripping region 8c1 and a butting region 8b1, and the gripping member 8a2 has a gripping region 8c2 a...
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