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WO/2022/058120A2 |
Disclosed herein is a connector for electrically connecting a feedthrough of a vacuum tool to a high voltage power source, the connector comprising: a connector wire assembly configured to be in electrical connection with a high voltage ...
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WO/2022/058252A1 |
Arrangements involving objective lens array assemblies for charged-particle assessment tools are disclosed. In one arrangement, the assembly comprises an objective lens array and a control lens array. Each objective lens projects a respe...
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WO/2022/060665A1 |
Exemplary semiconductor processing chambers may include showerhead. The chambers may include a pedestal configured to support a semiconductor substrate, where the showerhead and pedestal at least partially define a processing region with...
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WO/2022/058546A1 |
The present invention relates to a method for treating a sample using glow-discharge plasma comprising one or more treatment steps, in which the sample for treatment is subject to plasma treatment in a treatment vessel provided with a te...
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WO/2022/060536A1 |
The microfluidic device (100, 200) has a first reservoir (102, 202) that preferably includes a first liquid (108, 208). The first liquid (108, 208) is being held by a capillary stop valve (228, 230) in the first reservoir (102, 202). A s...
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WO/2022/060351A1 |
Embodiments disclosed herein generally relate to an apparatus having a partially anodized gas distribution showerhead including a body having a plurality of gas passages extending therethrough from an upstream side to a downstream side, ...
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WO/2022/060932A1 |
Exemplary semiconductor processing chambers include a gasbox. The chambers may include a substrate support. The chambers may include a blocker plate positioned between the gasbox and the substrate support. The blocker plate may define a ...
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WO/2022/060509A1 |
Embodiments disclosed herein include a plasma treatment chamber, comprising one or more sidewalls. A support surface within the one or more sidewalls holds a workpiece. A first gas injector along the one or more sidewalls injects a first...
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WO/2022/057978A1 |
The present invention relates to a device (1), a system (50) and a method (100) for plasma-enhanced chemical vapor deposition. A process chamber (2) is configured to receive at least one workpiece carrier (30). According to the invention...
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WO/2022/058542A1 |
The present invention relates to a method for treating a sample using glow-discharge plasma, in an apparatus comprising a treatment vessel, an electrode, a counter-electrode, and a power supply comprising one or more transformers and hav...
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WO/2022/060470A1 |
An apparatus, system and method. An apparatus may include an RF power assembly, arranged to output an RF signal; a resonator, coupled to receive the RF signal, the resonator comprising a first output end and a second output end, and a dr...
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WO/2022/059171A1 |
The present invention comprises: a charged particle optical system that scans a sample with a pulsed charged particle beam; a light source (120) that irradiates the sample with pulsed light; a detector (112) that detects secondary charge...
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WO/2022/060537A1 |
The method is for preparing a sample in a microfluidic device. The microfluidic device is provided that has a first reservoir in fluid communication with a second reservoir in fluid communication with and adjacent to a draining unit that...
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WO/2022/053175A1 |
The invention relates to multiple particle beam system comprising a magnetic immersion lens and comprising a detection system. Here, a cross-over of the second individual particle beams is provided in the secondary path between the beam ...
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WO/2022/055124A1 |
Disclosed are a method for protecting an apparatus from etching substances and a method for forming an oxide film. The method for protecting an apparatus from etching substances according to the present invention comprises the steps of: ...
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WO/2022/053647A1 |
What is described is a process for producing synthesis gas from CO2, which can save power in the production of synthetic hydrocarbons. This is achieved by a process for producing synthesis gas that has the following steps: Splitting a hy...
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WO/2022/055831A1 |
The present disclosure provides a magnetic immersion electron gun and a method of generating an electron beam using a magnetic immersion electron gun. The electron gun includes a magnetic lens forming a magnetic field, a cathode tip disp...
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WO/2022/055609A2 |
A microwave energy source that generates a microwave energy is disclosed. The microwave energy source has an on-state and an off-state. A control circuit is coupled to the microwave energy source and includes an output to generate a cont...
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WO/2022/054535A1 |
Provided are an electron gun, an electron gun component, an electron beam application device, and a positioning method which make it possible to align the emission axis of an electron beam with the optical axis of an electron optics syst...
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WO/2022/056344A1 |
Methods and apparatus that monitors deposition on a shutter disk in-situ. In some embodiments that apparatus may include a process chamber with an internal processing volume, an enclosure disposed external to the internal processing volu...
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WO/2022/055730A1 |
Exemplary processing methods may include forming a plasma of a silicon-containing precursor. The methods may include depositing a flowable film on a semiconductor substrate with plasma effluents of the silicon-containing precursor. The s...
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WO/2022/054431A1 |
A focused energy beam device equipped with a support part for supporting a substrate to be processed and a focused energy beam column which is provided with a differential pump and is capable of relative movement so as to correspond to a...
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WO/2022/055718A1 |
Exemplary semiconductor substrate supports may include a pedestal shaft. The semiconductor substrate supports may include a platen. The platen may define a fluid channel across a first surface of the platen. The semiconductor substrate s...
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WO/2022/055813A1 |
A component for use in a plasma processing chamber system is provided. A component body has a plasma facing surface. A coating is over at least the plasma facing surface, wherein the coating comprises spinel, wherein the spinel consistin...
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WO/2022/055736A1 |
Exemplary semiconductor substrate supports may include a pedestal having a shaft and a platen. The semiconductor substrate supports may include a cover plate. The cover plate may be coupled with the platen along a first surface of the co...
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WO/2022/055900A1 |
Exemplary etching methods may include flowing a fluorine-containing precursor and a hydrogen-containing precursor into a remote plasma region of a semiconductor processing chamber. The hydrogen-containing precursor may be flowed at a flo...
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WO/2022/055757A1 |
A method for controlling a plasma tool is described. The method includes receiving, by a processor, a first set of metric data from a plasma tool. The method further includes analyzing the first set of metric data to determine a first lo...
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WO/2022/055313A1 |
The present invention provides a method for sensing leakage from a processing chamber that is a vacuum chamber. According to the method for sensing leakage from a processing chamber, leakage from a processing chamber can be sensed by usi...
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WO/2022/054072A1 |
The invention provides a system for growth of one or more crystalline materials, specifically diamonds. The system comprises a microwave generator integrated with a pressure controller and an Optical Emission Spectrometer (OES) to form a...
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WO/2022/049445A1 |
Plasma device (1) comprising at least two plasma cells (Cx), and a command unit (2), wherein the first and the second electrodes of a given plasma cell are independent from the corresponding first and second electrodes of the contiguous ...
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WO/2022/048897A1 |
A charged particle system (400) generates a charged particle multi beam along a multi beam path (406, 408). The charged particle system comprises an aperture array (430), a beam limit array (421) and a condenser lens (410). In the apertu...
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WO/2022/048898A1 |
Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding th...
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WO/2022/051073A1 |
Methods and systems for processing a bevel edge of a wafer in a bevel plasma chamber. The method includes receiving a pulsed mode setting for a RF generator of the bevel plasma chamber. The method includes identifying a duty cycle for th...
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WO/2022/051125A1 |
The present invention provides a magnetron system, comprising a baseplate assembly. The baseplate assembly defining a housing portion and a power feedthrough. A sputtering target is disposed within the housing portion of the baseplate as...
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WO/2022/048896A1 |
Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising: at least one aperture array comprising at least two dif...
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WO/2022/042779A1 |
The objective of the invention is a tilting element (1) of a manipulation stage (15) using a movement apparatus comprising a linear actuator attached to a fixed part (2) and connected to a blade (8), which is attached at its other end to...
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WO/2022/046519A1 |
A method for processing a substrate includes forming a patterned layer over the substrate, the layer including an opening, where a surface of the opening includes a sidewall and a bottom wall. The method includes processing the patterned...
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WO/2022/041597A1 |
A high-resolution in-situ fluid turbulence heating chip of a transmission electron microscope. The high-resolution in-situ fluid turbulence heating chip is structurally characterized in that: an upper base chip (1) and a lower base chip ...
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WO/2022/042336A1 |
Disclosed in the present invention are a semiconductor reaction chamber and a semiconductor processing equipment. The semiconductor reaction chamber comprises a cavity, an electrostatic chuck, a functional wire and an air pressure adjust...
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WO/2022/046296A1 |
This disclosure provides a reactor system that includes a microwave source configured to generate a microwave energy, one or more energy sources configured to generate a thermal energy and a field-enhancing waveguide (FEWG) coupled to th...
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WO/2022/047190A1 |
Surface imaging apparatuses, surface analysis apparatuses, methods based on detection of secondary electrons or secondary ions that include a spatially scanned and DC or pulsed primary excitation source resulting in secondary electrons o...
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WO/2022/044066A1 |
A charged particle beam device according to the present invention comprises a charged particle source that emits charged particles, a detection circuit that detects electrons which are generated by a sample as a result of irradiation wit...
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WO/2022/046356A1 |
The present invention provides a magnetron system comprising a baseplate assembly that defines a housing portion and a power feedthrough. A magnet assembly and a segmented target assembly are disposed within the housing portion. The segm...
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WO/2022/046297A1 |
This disclosure provides a reactor system that includes a microwave energy source that generates a microwave energy, a field-enhancing waveguide (FEWG) coupled to the microwave source. The FEWG includes a field-enhancing zone having a cr...
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WO/2022/043408A1 |
Systems and methods for simulating a plasma etch process are disclosed. According to certain embodiments, a method for simulating a plasma etch process may include predicting a first characteristic of a particle of a plasma in a first sc...
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WO/2022/046615A1 |
Plasma processing apparatus for processing a workpiece are provided. In one example embodiment, a plasma processing apparatus for processing a workpiece includes a processing chamber, a plasma chamber separated from the processing, and a...
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WO/2022/043694A1 |
The invention relates to a method of preparing a sample for analysis. The method comprises: providing a sample comprising a surface region of interest on a first face of the sample and a second face oriented at an angle to the first face...
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WO/2022/040967A1 |
A high-resolution in-situ temperature difference chip for a transmission electron microscope and a manufacturing method therefor. The in-situ temperature difference chip comprises a substrate (1) having both sides covered by insulation l...
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WO/2022/044443A1 |
Provided is a tissue structure evaluation system capable of detecting fluctuations caused by an imaging device from a sample image. A tissue structure evaluation device (10) comprises: a feature amount extraction unit (13) which extracts...
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WO/2022/046270A1 |
A method includes performing a first on phase including applying an SP pulse to an SP electrode to generate plasma, performing a second on phase after the first on phase, performing a corner etch phase after the second on phase, and perf...
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