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WO/2022/180304A1 |
In the present invention there is introduced a method for manufacturing a compo nent of an electrochemical energy storage device utilising lithium such that a coating method based on pulsed laser ablation is utilised in the production of...
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WO/2022/181521A1 |
Provided are a nitride semiconductor material with low lattice thermal conductivity and a heat flow switching device comprising the same. A nitride semiconductor material according to the present invention is a metal nitride represented ...
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WO/2022/180085A1 |
A compact device for measuring a secondary vacuum pressure and an on-board system comprising such a device are described. The device and the system are particularly suitable for measuring the vacuum pressure in the compartments of lines ...
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WO/2022/181310A1 |
Provided is a mask blank that has a thin film for pattern formation that has a reduced surface roughness and film stress. The mask blank comprises a multilayer reflection film and a thin film for pattern formation in that order on a prin...
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WO/2022/179742A1 |
A method of manufacturing an optical element (705), such as a metal-dielectric filter, is disclosed. The method comprises a step of deposition of a layer of metallic material (170). The method comprises a step of deposition of an encapsu...
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WO/2022/182713A1 |
The present invention relates to methods of photocatalyzed bonding of compounds directly to surface metal oxides and the articles obtained therefrom. The methods for preparing an articles having a compound bonded to a metal oxide compris...
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WO/2022/180055A1 |
The invention relates to an atomization target (10), a coating system (30), and a coating method for same. The atomization target (10) comprises a base (12) with a target plate (14) which is secured thereon and which is made of a first a...
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WO/2022/181434A1 |
The purpose of the present disclosure is to provide a device and a film-forming method with which it is possible to perform film-forming on the surface of a powder at a high film-forming speed using a dry method without carrying out stir...
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WO/2022/181433A1 |
The purpose of the present invention is to provide a horizontal-type powder surface film forming device which improves dry stirring efficiency of powder and continuously produces a powder covered on the surface with a fine film and which...
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WO/2022/180093A1 |
A multilayer coating exhibiting good corrosion resistance and good abrasion resistance, the multilayer coating comprising layers A and layers B deposited forming a sequence of the type...A/B/A/B/A..., the layers A being CrN-based layers ...
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WO/2022/176422A1 |
Provided is a method for producing a gallium nitride film in which a substrate is arranged so as to face a target including nitrogen and gallium within a vacuum chamber, a sputtering gas is supplied within the vacuum chamber, nitrogen ra...
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WO/2022/176833A1 |
[Problem] To provide: a pellicle capable of suppressing cracking of a pellicle film; and a method for manufacturing the pellicle. [Solution] This pellicle comprises: a silicon (Si) border including a boron (B)-containing Si layer; and a ...
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WO/2022/176230A1 |
This surface-coated cutting tool has a substrate and a coating layer, the coating layer having an average thickness of 0.2-10.0 μm and including a structure in which at least one first layer and at least one second layer are laminated i...
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WO/2022/175587A1 |
The invention relates to a UV sensitive photocathode (100) comprising: a support structure (102), and an amorphous diamond-like carbon coating (104) on the support structure (102). The invention relates also to a method for producing the...
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WO/2022/175325A1 |
A protective coating (1) for a copper alloy substrate (2), said coating (1) comprising a layer of a transition metal, referred to as primer layer (3), and a corrosion protection layer (4) formed by at least one portion of the primer laye...
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WO/2022/175704A1 |
A crucible to evaporate a material is described. The crucible includes a first material compartment configured to contain material to be evaporated, a first heater to heat the first material compartment, a second material compartment con...
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WO/2022/176113A1 |
The present invention addresses the problem of providing a sliding coating film which is capable of suppressing separation phenomenon that is different from detrition due to sliding. The problem is solved by a sliding coating film which ...
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WO/2022/174919A1 |
A substrate support for supporting a substrate in a vacuum processing system is described. The substrate support includes a substrate support body having a front side for supporting the substrate and a back side opposite the front side; ...
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WO/2022/176058A1 |
This cutting tool comprises a base material, and a hard layer provided over the base material. The hard layer comprises a compound represented by TiaAlbBcN. The atom ratio a for the titanium element in the TiaAlbBcN compound is 0.25 or g...
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WO/2022/175703A1 |
A material deposition assembly for depositing a material on a substrate in a vacuum deposition chamber is described. The material deposition assembly includes at least one material deposition source. The deposition source includes a dist...
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WO/2022/177782A1 |
A laminate can comprise an oxide disposed over a first major surface of a substrate. The oxide layer can comprise a thickness of about 40 nanometers or less. The oxide layer can comprise oxygen and a first element. The first element can ...
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WO/2022/174899A1 |
The present invention relates to a method of providing a reaction chamber (10) for a laser evaporation system (100), the reaction chamber (10) comprising at least one wall section (20) with an inner surface (22) facing a reaction volume ...
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WO/2022/174996A1 |
An improved ceramic material for heat insulation is achieved by means of the following selection of specific stabilizers and the adapted proportions: Base of zirconium dioxide (ZrO2) comprising: 1.0 wt.% to 9.0 wt.% of base stabilizers: ...
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WO/2022/177916A1 |
Methods and apparatus for processing a plurality of substrates are provided herein. In some embodiments, a method of processing a plurality of substrates in a physical vapor deposition (PVD) chamber includes: performing a series of reflo...
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WO/2022/173264A1 |
Disclosed is a thin film deposition apparatus for forming a patterned thin film. The disclosed thin film deposition apparatus for forming a patterned thin film may comprise: a source container for containing a source material and produci...
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WO/2022/172954A1 |
A coated tool according to the present invention comprises a base material and a hard coating film on the base material. The hard coating film is a nitride or carbonitride containing 65-90 at.% Al and 10-35 at.% Ti with respect to the to...
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WO/2022/172848A1 |
[Problem to be solved] To provide a stage that facilitates modification while allowing a pipe provided to the stage to be permanently in contact with the stage using a simple method. [Solution] A stage 1 that is installed in a chamber an...
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WO/2022/171493A1 |
The present invention relates to an apparatus (100) for capturing an optical property of a workpiece (105). The apparatus (100) has a mirror device (110), which focusses on the input side and is shaped to direct light (120) from a light ...
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WO/2022/172956A1 |
A gas barrier film (1) comprises a gas barrier layer (21) on at least one surface of a transparent film (11). The gas barrier layer (21) includes at least one silicon oxynitride layer (231) and at least two low-refractive-index layers (2...
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WO/2022/173220A1 |
Disclosed are a patterned thin film forming method and a device manufacturing method using same. The disclosed thin film forming method may comprise the steps of: forming a sublimable material layer on a partial region of a substrate; an...
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WO/2022/168800A1 |
[Problem] The present invention addresses the problem of providing a method with which it is possible to form a functional thin film on a substrate through excellent epitaxial growth and to improve characteristics such as the piezoelectr...
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WO/2022/168728A1 |
This Ta-B sputtering target contains Ta and B, and is characterized by having Ta-B compound particles comprising one or more kinds selected from among Ta2B, Ta3B2, Ta3B4, Ta5B6, TaB, and TaB2, wherein the abundance ratio of elementary su...
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WO/2022/167466A1 |
The invention relates to a method for manufacturing an optical element (2) for a lithography system, the method being carried out outside the lithography system in which the optical element (2) is used, in which method an original surfac...
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WO/2022/169090A1 |
The present invention relates to a novel method for preparing a metal nanostructure providing an enhanced Raman signal, and if surface-enhanced Raman scattering spectroscopy is carried out using a metal nanostructure prepared using the n...
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WO/2022/167868A1 |
A layered semiconductor device comprising a patterning coating deposited on an exposed layer surface of an underlying layer in a first portion of a lateral aspect is adapted to impact a propensity of a vapor flux of a deposited material ...
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WO/2022/160827A1 |
The present invention provides a pixel array, a display device, and a high-precision metal mask plate. The pixel array comprises a plurality of first basic pixel units arranged in odd-numbered rows and a plurality of second basic pixel u...
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WO/2022/163355A1 |
An extended release body according to one embodiment of the present invention is provided with: a base material; and a vapor deposition polymer film that is directly formed on a first surface among the end surfaces of the base material i...
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WO/2022/164447A1 |
A cathode drive unit (100) for a deposition system is described. The cathode drive unit (100) includes a motor (110) having a drive shaft. (111). Further, the cathode drive unit (100) includes a gearbox (120) connected to the drive shaft...
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WO/2022/161606A1 |
The present invention is related to a method for running a laser system (10) for providing a laser beam (22) for heating a surface (68) of a target (66) located in a reaction chamber (62) of an evaporation system (60), the laser system (...
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WO/2022/163719A1 |
A coated tool according to the present disclosure comprises a substrate, and a coating layer positioned on the substrate. The coated tool includes: a first surface having a rake face; a second surface having a flank face; and a ridge por...
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WO/2022/161740A1 |
The invention relates to a method for forming at least one layer (3) on a substrate (2) made of a fluoridic material, comprising: depositing at least one coating material (9) on the substrate (2) to form the layer (3), and generating a p...
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WO/2022/165126A1 |
The present disclosure concerns open-end carbon nanotubes assembled as a microelectrode array in electrode sets/micro-electrode sets (ES/micro-ES). The ES/micro-ES includes three electrodes that are made of highly densified multi-walled ...
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WO/2022/163434A1 |
Provided is a mask blank having few microdefects on the surface of a thin film for pattern formation. A mask blank according to the present invention is provided with a thin film for pattern formation on a substrate. The thin film for pa...
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WO/2022/161605A1 |
The present invention is related to a thermal laser evaporation system (10), the thermal laser evaporation system (10) comprising: - a reaction chamber (20) with a chamber wall (30) for enclosing a reaction volume (22); - a target (12) a...
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WO/2022/160146A1 |
A mask and a manufacturing method therefor, and a mask assembly. The mask comprises a display region and welding regions located at the opposite two sides of the display region in a first direction; each welding region at least comprises...
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WO/2022/159183A1 |
A method of cleaning residue containing ruthenium (Ru) residue on at least one surface of a component of a semiconductor processing chamber is provided. The residue is exposed to a Ru cleaning composition comprising at least one of hypoc...
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WO/2022/158271A1 |
A surface treatment apparatus (10) comprises: a treatment target material placement part (50) (placement means) which is for placement of a treatment target material (W); a chamber (20) (accommodation unit) which accommodates the treatme...
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WO/2022/159633A1 |
A radial magnetron system for plasma surface modification and deposition of high-quality coatings for multi-dimensional structures is described. The system includes an axial electrode, a target material disposed on a portion of the axial...
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WO/2022/158409A1 |
Provided is a SiC single crystal growing apparatus capable of uniformly heating a solid raw material and sublimating the solid raw material into a gaseous raw material, and reducing waste of the raw material when growing a SiC single cry...
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WO/2022/158034A1 |
Provided is a cathode unit CU for a magnetron sputtering device SM with which it is possible to achieve substantial uniformity in the region of the target that is corroded with the progression of sputtering, and increase the target utili...
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