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WO/2023/008559A1 |
Provided are a sputtering target and method for producing the same, whereby the generation of arcing is curbed and product yield is improved. This sputtering target is characterized in that, when observed by a laser microscope at 400x ...
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WO/2023/005755A1 |
The present invention provides a susceptor bias adjustment apparatus and method, and a semiconductor process device. The apparatus comprises a positive bias adjustment unit, a negative bias adjustment unit, and an anti-interference unit....
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WO/2023/008133A1 |
This coated tool is provided with a substrate and at least one coating layer positioned on the substrate. The coating layer contains a cubic crystal comprising at least one element selected from groups 4a, 5a and 6a in the periodic table...
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WO/2023/006060A1 |
The present application discloses a process chamber and a wafer machining method. The process chamber comprises a chamber body, a carrier, an inner liner, a first pressure ring, a second pressure ring, an ejector pin device, and a pressu...
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WO/2023/006846A1 |
The invention relates to a process for fabricating an optoelectronic device (1) comprising a substrate (20) and rod-shaped diodes (10) having a spacing ratio h/d at least equal to (1), the process comprising a step of producing a thin co...
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WO/2023/005136A1 |
The present application relates to the technical field of touch screens, and provides a neutral density filter and a preparation method and preparation device therefor. The method comprises: arranging a first target, a second target and ...
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WO/2023/008113A1 |
The coated tool according to the present disclosure has a base, and a coating layer located on the base. The coating layer contains a crystal having a cubic structure. The coating layer has a stripe structure in cross-sectional observati...
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WO/2023/008130A1 |
The coated tool according to the present disclosure has: a base comprising a WC-based cemented carbide that has WC particles as a hard-phase component and that has Co as the main component of a binder phase; and a first coating layer pos...
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WO/2023/006227A1 |
The present invention refers to a method for determining at least one optical property of at least one deposition material used for a for lithographic mask which comprises the steps: (a) determining a height value of the at least one dep...
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WO/2023/008123A1 |
Provided is a film-equipped base material that can effectively increase infrared transmittance when used in an infrared-transmitting lens. The film-equipped base material 1 has a multilayer film 3 provided on a base material 2. The mul...
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WO/2023/006660A1 |
A layered disinfecting structure comprising a first activated carbon layer and a second layer, wherein the second layer contains a metal coating between 10 nm and 20 micrometer in average thickness. The slow release of metal from the sec...
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WO/2023/005008A1 |
A low-dielectric constant high-entropy film and a preparation method therefor, the low-dielectric constant high-entropy film comprising: a SrTiO3 substrate, a La0.7Sr0.3MnO3 buffer layer disposed on the surface of the SrTiO3 substrate, a...
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WO/2023/007935A1 |
A coated tool according to the present disclosure comprises a base, and a coating layer placed on the base. The coating layer contains a crystal having a cubic structure. The coating layer has a striped structure in cross-sectional obser...
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WO/2023/008435A1 |
This reflective mask blank has a substrate, a multilayer reflection film that reflects EUV light, and a phase shift film that shifts the phase of the EUV light in this order. The phase shift film is a film on which an aperture pattern is...
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WO/2023/000913A1 |
Provided are a high-conductivity corrosion-resistant graphite-like carbon protective multilayer composite coating, a preparation method therefor, and an application thereof. The multilayer composite coating comprises a chromium-iridium t...
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WO/2023/001829A1 |
The invention relates to a component with a part (1) which is made of steel, said part being at least partly coated with a nickel diffusion layer (10), and the layer thickness of the nickel diffusion layer (10) equals 1 – 500 µm. The ...
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WO/2023/001992A1 |
The invention relates to a method for obtaining a nanostructured layer of titanium nitride by deposition by cathode sputtering of a substrate at ambient temperature, characterised in that it comprises: - a first step of reactive cathode ...
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WO/2023/001016A1 |
A semiconductor process chamber, comprising a chamber body (100), a shielding assembly (1), a connecting sleeve (2), a grounding assembly (3), and a bearing apparatus (4). The bearing apparatus (4) comprises a liftable base (41) and a de...
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WO/2023/003285A1 |
The present invention relates to a method for setting the size of a frame used for a frame-integrated mask, a strain reduction method, and a frame. More specifically, provided are a method for setting the size of a frame, a strain reduct...
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WO/2023/003286A1 |
The present invention relates to a method for reducing a deformation amount of a mask cell sheet part, a frame-integrated mask, and a method for manufacturing the frame-integrated mask. More particularly, the present invention relates to...
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WO/2023/001137A1 |
The present invention belongs to the technical field of OLEDs, and particularly relates to a silver-based alloy, a preparation method therefor, a silver alloy composite thin film and the use thereof. The silver-based alloy provided in th...
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WO/2023/284994A1 |
The present invention relates to a CMAS resistant overlay coating (240) comprising at least one CMAS resistant layer, wherein the overlay coating (240) is i. disposed over a surface (11a) of a substrate (10a) comprising or consisting of ...
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WO/2023/286289A1 |
[Problem] To improve step coverage of a coating film. [Solution] To use a film formation device equipped with a first electrode, a second electrode, a first power supply source, a second power supply source, and a phase adjuster. The fir...
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WO/2023/285500A1 |
The invention relates to an apparatus (1) for coating a substrate (2), having a vacuum chamber (10) and at least one vacuum pump (11), which is designed to evacuate the vacuum chamber (10), and having at least one substrate mount (20), w...
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WO/2023/285913A1 |
The present invention provides a production apparatus which is capable of continuously performing steps from fabrication to sealing of an organic compound film. This production apparatus is capable of continuously performing a patterning...
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WO/2023/286427A1 |
Provided is a substrate holding device capable of smoothly discharging assist gas without deteriorating a function of improving sealing between an annular wall and a process-target substrate. This substrate holding device SH comprises:...
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WO/2023/285639A1 |
A target (10) for sputtering having target material (11) for sputtering, the target material (11) comprising a lamellar structure and a porosity of at least 1% and having a resistivity lower than 1000 ohm.cm, e.g. below 100 ohm.cm, e.g. ...
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WO/2023/287550A1 |
One or more embodiments described herein generally relate to methods and systems for monitoring film thickness using a sensor assembly. In embodiments described herein, a process chamber having a chamber body, a substrate support dispose...
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WO/2023/287544A1 |
Methods and apparatus for processing a substrate are provided. For example, a method includes sputtering a material from a target in a PVD chamber to form a material layer on a layer comprising a feature of the substrate, the feature hav...
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WO/2023/286411A1 |
In the present invention, a replaceable blade (1) is used to cut a material to be cut made of a non-ferrous metal or an alloy thereof, wood, a wood-based material, or a resin. A coating (14) that coats a substrate (10) is provided. The c...
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WO/2023/284596A1 |
A high-conductivity, corrosion-resistant and long-lifetime MAX phase solid solution composite coating, and a preparation method therefor and the use thereof. The preparation method comprises: by using a high-power pulse magnetron sputter...
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WO/2023/286669A1 |
The present invention pertains to a reflection type mask blank having: a substrate; a Mo/Si multilayer reflection layer on the substrate; an intermediate layer on the Mo/Si multilayer reflection layer; a barrier layer on the intermediate...
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WO/2023/286369A1 |
Provided is a vacuum processing device capable of removing introduced particles to the greatest extent possible while maintaining a vacuum atmosphere. The device has a vacuum chamber 1, 2 in which a processing unit 4 is installed. A va...
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WO/2023/283865A1 |
In a general aspect, a ceramic thin film with nanotwinned regions at a tunable volume fraction is manufactured. In some aspects, a method for manufacturing a ceramic thin film on a surface of a substrate in an evacuated chamber is disclo...
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WO/2023/279466A1 |
A compound semiconductor capacitor (100). The compound semiconductor capacitor (100) comprises an upper electrode plate (110), a lower electrode plate (130), and a dielectric layer (120). The dielectric layer (120) is provided between th...
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WO/2023/280465A1 |
The invention relates to a coating plant (1) for coating an object (2), for example a metallic strip (2), with a material present in the gas phase. The strip (2) can for example be transported in a transport direction (5) by means of tra...
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WO/2023/280263A1 |
Disclosed are a near-perfect light absorber and a universal preparation method therefor. The light absorber consists of a polymer film and a light dissipation layer; the polymer film and the light dissipation layer both have conical stru...
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WO/2023/280887A1 |
The invention relates to a transparent optical element (51) for a vehicle, in particular a motor vehicle, comprising at least one first transparent layer (53) made of a polymer material, characterised in that the transparent optical elem...
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WO/2023/279563A1 |
Provided are a production device and a production method for a thin film catalyst. The production device comprises a vacuum chamber, multiple evaporators, multiple air ducts, an ion generator and a control unit. The multiple evaporators ...
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WO/2023/280951A1 |
Methods for producing layered nanocarbon structures placing a workpiece in a working chamber, applying a vacuum to the chamber, processing the workpiece surface with gas ions, applying a material sublayer to the workpiece surface, deposi...
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WO/2023/282988A1 |
An evaporation system for providing a gas for a reactive deposition process, reactive deposition apparatuses, and methods of reactive deposition are provided. The evaporation system in includes a multi-zone diffuser assembly for single o...
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WO/2023/282150A1 |
In the present invention, a gas is fed over the entire surface of a target. In the present invention, a vacuum container (2) of a sputtering device (1) is provided with at least one target holder (32) for holding a target (30). The targe...
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WO/2023/280464A1 |
The invention relates to a coating plant (1) for coating a planar object (2), for example a strip. The strip is transported by means of transport rollers (3a, 3b). The coating plant (1) comprises: - a vacuum chamber (4), - a device (6) f...
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WO/2023/276703A1 |
This film-forming apparatus comprises a processing container, a sputtering target provided in the processing container, a pedestal having a mounting surface for mounting of a substrate in the processing container, a shutter member capabl...
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WO/2023/274558A1 |
The invention relates to a method for cooling at least one sputter target (1), wherein a sputter target (1) is retained on a target carrier (3), heat is removed from the target carrier (3) and the target by means of a heat sink (2), and ...
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WO/2023/277920A1 |
The present disclosure is directed to a precursor delivery system is provided having a vaporizer and a reservoir. The reservoir includes an upstream end in fluid communication with the vaporizer. A reservoir valve is in fluid communicati...
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WO/2023/274596A1 |
The present invention relates to a substrate support for receiving and transporting a plurality of substrates.
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WO/2023/275109A1 |
The invention relates to a metal component (1) which has a wear-protection coating, in particular a hydraulic valve component, the tribologically loaded surface (2) of which is at least partly provided with a wear-protection coating (4) ...
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WO/2023/277163A1 |
In film formation apparatuses for conducting sputtering, there is a demand to further efficiently remove, by using a getter material, gas molecules from the inside of a chamber, particularly from the vicinity of a target to improve the q...
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WO/2023/276066A1 |
This cutting tool comprises a base material and a coating film disposed on the base material, wherein the coating film includes a first layer and a second layer, the first layer having a hardness H1 of 25 GPa to 40 GPa inclusive, and the...
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