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WO/2023/053380A1 |
The present invention addresses the problem of providing a sliding member covered with a DLC coating with which microfractures in a sliding surface due to development of cracks are less likely to occur, and an increase in abrasive wear c...
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WO/2023/054420A1 |
Provided is an optical laminate in which at least two layers of optical functional layers that transmit visible light are laminated, the optical laminate being characterized by including: a first functional layer which contains at least ...
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WO/2023/055653A1 |
Some embodiments relate to articles having removable coatings. The articles may comprise a substrate and a coating on the substrate. An etch stop layer may be provided between the substrate and the coating to permit removal of the coatin...
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WO/2023/054028A1 |
An electromagnetic wave reflection sheet (1) comprises a substrate (2) and an electromagnetic wave reflection layer (3) sequentially toward one side in the thickness direction. The electromagnetic wave reflection sheet (1) has a transmit...
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WO/2023/047948A1 |
[Problem] To provide an optical product that is less susceptible to cracking due to heat although having a microrelief structure, and has more excellent heat resistance, and a manufacturing method capable of easily creating the optical p...
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WO/2023/045788A1 |
Provided in the present invention are an electrostatic chuck and a semiconductor processing apparatus. In the electrostatic chuck, a gas channel structure comprises an annular gas channel, a primary gas channel group and a secondary gas ...
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WO/2023/046820A1 |
The present invention relates to a coated article comprising a coated surface, the coated surface consisting of a substrate and a coating system, the coating system comprising at least one protective layer consisting of one or more trans...
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WO/2023/048346A1 |
The present invention comprises the steps of: (S11) forming a mold for forming a microneedle polymer layer; (S12) imprinting each of a working electrode, a counter electrode, and a reference electrode on the mold by using acrylic or PLA;...
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WO/2023/047995A1 |
In this sputtering deposition source, a magnetic circuit comprising permanent magnets (22a, 23a) and a yoke (24a) and a magnetic circuit comprising permanent magnets (22b, 23b) and a yoke (24b) are provided on the respective back surface...
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WO/2023/048139A1 |
The purpose of the present invention, relating to lanthanide boride, which is known as a low work function material, is to provide a novel low work function material with low chemical reactivity, in particular a low work function materia...
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WO/2023/045042A1 |
A method for preparing a layered double hydroxide (LDH) film on the basis of in situ conversion of a co-sputtering intermediate film. The method comprises the steps: S1, co-depositing two or more metals onto a surface of a substrate mate...
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WO/2023/045352A1 |
The present invention provides a multi-stage structural membrane for a biomedical use, comprising: a structure composed of Ti, Zr, and Ta, 3 to 4 layers, and a substrate being a titanium alloy. The prevent invention has the advantages th...
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WO/2023/045051A1 |
A sputtering deposition device and method. The device comprises a cavity (25), a plurality of target guns (24), an inert gas supply system (30), and a second gas supply system (32), wherein the target guns (24) are located in the cavity ...
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WO/2023/045835A1 |
Disclosed is a preparation method for a metal compound film, comprising: step 1: placing into a reaction chamber a tray carrying a wafer onto which a film is to be deposited, the tray being located above a base; and step 2: introducing a...
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WO/2023/045190A1 |
The present invention provides a shielding device and a semiconductor process apparatus. The shielding device is configured to shield a base arranged in a process chamber of the semiconductor process apparatus. The base is configured to ...
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WO/2023/045052A1 |
A high-throughput thin film deposition device and thin film deposition method. The device comprises a cavity, a stage (44), a target gun (41), a first gas supply system (45), and a second gas supply system (46). The cavity comprises a sp...
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WO/2023/043516A1 |
Magnet assemblies comprising a housing with a top plate each comprising aligned openings are described. The housing has a bottom ring and an annular wall with a plurality of openings formed in the bottom ring. The top plate is on the hou...
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WO/2023/041018A1 |
Provided is a sputtering target, comprising: a tubular liner, the axis of which is defined as the axial direction, the plane where the radial direction is located being perpendicular to the axial direction; at least one cylindrical targe...
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WO/2023/042849A1 |
A transparent electroconductive film (X) according to the present invention comprises a transparent resin substrate (10) and a crystalline transparent electroconductive layer (20) in this order in the thickness direction (D). The transpa...
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WO/2023/042733A1 |
A surface treatment apparatus (10) comprises: a chamber (20) (accommodating unit) for accommodating at least one workpiece (W); workpiece mounting parts (32a, 32b) (mounting means) for mounting the workpiece (W) so as to face outward and...
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WO/2023/042844A1 |
A transparent electroconductive film (1) comprising a substrate (2) and a crystalline transparent electroconductive layer (3) in this order toward one thickness-direction surface. The crystalline transparent electroconductive layer (3) c...
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WO/2023/043015A1 |
A magnetic field generation device, according to one embodiment, generates a magnetic field inside a chamber of a sputtering device. The magnetic field generation device may comprise: a housing which has an annular shape so as to surroun...
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WO/2023/041185A1 |
A mask frame support element for a mask frame support is described. The mask frame support element includes along a first direction, which is configured to extend along a side edge of a substrate, a protruding section configured to provi...
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WO/2023/042842A1 |
A manufacturing method for a transparent conductive film (3) comprises: a first step for preparing a long substrate (1); a second step for forming, in a vacuum atmosphere, a transparent conductive layer (2) on one surface in the thicknes...
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WO/2023/042777A1 |
Provided are a tool and the like excellent in abrasion resistance. A coated ultrafine grain cemented carbide drill 1 is produced by coating an ultrafine grain cemented carbide with a hard coating film by means of PVD or CVD, said coated ...
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WO/2023/040675A1 |
The present application relates to a method and apparatus for optimizing a process parameter of a film coating process, and a real-time film coating monitoring system. The method comprises: acquiring a target performance parameter of a f...
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WO/2023/042210A1 |
A method for coating a metallic surface by a graphene layer by depositing a graphene molecular precursor comprising a compound having an aromatic hydrocarbon component that is derivatized by a tethering group. The tethering groups react ...
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WO/2023/042841A1 |
This method for producing a transparent electroconductive film (3) comprises a first step for preparing a long and narrow substrate (1), a second step for forming a transparent electroconductive layer (3) on one thickness-direction surfa...
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WO/2023/042848A1 |
A transparent conductive film (X) according to the present invention comprises a transparent resin substrate (10) and a crystalline transparent conductive layer (20) in this order in the thickness direction (D). The transparent conductiv...
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WO/2023/041415A1 |
The present invention relates to a coated cutting tool (1) comprising a substrate (5) and a coating (6), wherein the coating (6) comprises a from about 0.5 to about 10 pm nano-multilayer (8) of alternating nanolayers of a first nanolayer...
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WO/2023/042843A1 |
A transparent conductive film (1) is provided with a base material (2) and an amorphous transparent conductive layer (3) in this order when observed toward one side in the thickness direction. The base material (2) has a second thermal s...
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WO/2022/231690A9 |
A multilayer coating including an adhesion layer; and a protective coating is disclosed. The multilayer coating can be applied to a portion of at least one of a base and a tip of an interface cone. A method of making a coated interface c...
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WO/2023/041017A1 |
Provided are a sputtering target and a method for manufacturing the sputtering target. The sputtering target comprises: a tubular liner tube, an axis thereof being defined as an axial direction, and a plane where a radial direction is lo...
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WO/2023/041263A1 |
The invention relates to a system and a method for the multi-step processing of planar substrates, more particularly planar glass substrates, on a substrate carrier, wherein a plurality of mutually spatially separated processing stations...
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WO/2023/042438A1 |
The present invention addresses the problem of providing: a light blocking film and a multilayer antireflection film, each of which has excellent light blocking properties, antireflection properties and chemical stability; a method for p...
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WO/2023/035955A1 |
A silver alloy target material. The silver alloy target material consists of silver, indium and scandium; in the silver alloy target material, the content of indium in percentage by mass is 0.2%-1%, the content of scandium in percentage ...
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WO/2023/038174A1 |
The present invention relates to an apparatus for forming a high-functional compound layer on the surface of a material by using ion injection, the apparatus comprising a first ion generator and a second ion generator, which are respecti...
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WO/2023/038016A1 |
A sputtering target is provided which enables manufacturing a heat assisted magnetic recording medium that has high saturation magnetization and few in-plane oriented magnetic grains. This sputtering target, for producing a heat assist...
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WO/2023/037077A1 |
The invention relates to a method for generating nanoparticles on the surface of a substrate, said method comprising: - a step of providing the substrate made of a material comprising at least one element from columns 4, 5, 13 and 14 of ...
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WO/2023/036200A1 |
The present application provides a thin film mask, comprising: a first layer and a second layer. The first layer and the second layer are laminated; the second layer comprises an adhesive film; the absorption coefficient of the first lay...
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WO/2023/037810A1 |
Provided are: a hard nitride-containing sputtering target that can prevent the occurrence of arcing during sputtering, caused by inclusion of relatively course zirconia particles, and can suppress the generation of particles during film ...
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WO/2023/038081A1 |
The purpose of the present invention is to provide a CoFeB alloy-based target material that reduces generation of particles during sputtering. Provided is a sputtering target material comprising an alloy containing Co and/or Fe, and B an...
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WO/2023/032041A1 |
A sputtering apparatus provided with a treatment chamber, a substrate holder for holding a substrate on a substrate-holding surface in a treatment space in the treatment chamber, a first target holder for holding a first target so that a...
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WO/2023/032582A1 |
A coated tool according to the present disclosure comprises a base and a coating layer positioned on at least a portion of the surface of the base. With the coated tool according to one aspect of the present disclosure, in a case in whic...
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WO/2023/033182A1 |
This λ-Ti3O5 film forming substrate comprises a support substrate and a λ-Ti3O5 film provided directly on the support substrate.
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WO/2023/030764A1 |
The invention relates to a method for joining a first component (1) with a second component (2) in order to form an assembly (12) of a process automation field device, having the steps of: - placing a first joint zone (4) of the first co...
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WO/2023/033067A1 |
A plasma-resistant laminate according to the present disclosure comprises a substrate, a membrane electrode formed on the substrate, and a dielectric layer formed on the membrane electrode, the substrate including sapphire, the dielectri...
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WO/2023/031551A1 |
The invention relates to a method for depositing a carbon-based material from a target onto a metal substrate, by ion-assisted cathode sputtering. According to the invention, the ratio between the flow of ions that is directed toward the...
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WO/2023/032721A1 |
The present invention relates to a substrate-holding device including a mask member, a biaser, and a contact part. A contact member is provided with an inclined surface, an extending surface, and an abutting surface. A substrate is posit...
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WO/2023/034479A1 |
A substrate carrier and a substrate assembly comprising the same are provided. The substrate carrier comprises an accommodation space; a guide unit disposed adjacent to the accommodation space; and a supporting unit disposed under the ac...
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