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WO/2022/250823A1 |
A plasma vapor deposition (PVD) chamber used for depositing material includes an apparatus for influencing ion trajectories during deposition on a substrate. The apparatus includes at least one annular support assembly configured to be e...
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WO/2022/251205A1 |
Ternary and quaternary shape memory alloys, particularly nickel-titanium based quaternary and quaternary shape memory alloys, are disclosed and made by a method employing physical vapor deposition (PVD), such as by sputtering, of NiTiX, ...
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WO/2022/250937A1 |
Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate comprises applying a DC target voltage to a target disposed within a processing volume of a plasma processing chamber,...
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WO/2022/250879A1 |
Methods and apparatus for processing a substrate using improved shield configurations are provided herein. For example, a process kit for use in a physical vapor deposition chamber comprises a shield comprising an inner wall comprising a...
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WO/2022/249674A1 |
A layered body (100) comprises a hard coat film in which a hard coat layer (11) is provided on one main surface of a film substrate (10), a primer layer (3) provided on the hard coat layer and in contact with the hard coat layer, and an ...
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WO/2022/250475A1 |
The present invention relates to an Oldham ring for a scroll compressor. More particularly, the Oldham ring for a scroll compressor, according to the present invention, is characterized in that a medium-entropy alloy material is located ...
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WO/2022/247433A1 |
A method for improving the reduction-resistant property of a ceramic PTC thermosensitive element, which method belongs to the technical field of the preparation of electronic components. The ceramic PTC thermosensitive element is a bariu...
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WO/2022/250936A1 |
Methods and apparatus for processing substrates are provided herein. For example, a magnet to target spacing system configured for use with an apparatus for processing a substrate comprises a sensor configured to provide a signal corresp...
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WO/2022/251140A1 |
Methods of processing a substrate in a PVD chamber are provided herein. In some embodiments, a method of processing a substrate in a PVD chamber, includes: sputtering material from a target disposed in the PVD chamber and onto a substrat...
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WO/2022/250343A1 |
The present invention relates to a method for manufacturing silicon-coated copper, silicon-coated anti-oxidation copper using same, and a semiconductor device using same and, more particularly, to copper having a silicon (Si)-coated surf...
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WO/2022/245513A1 |
Embodiments of the present disclosure generally relate to flexible substrate fabrication. In particular, embodiments described herein relate to an apparatus and methods for flexible substrate fabrication using nip rollers to improve tens...
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WO/2022/244788A1 |
The purpose of the present invention is to provide a non-evaporable-getter coating device capable of coating a non-evaporable getter on an inner surface of a vacuum container or a vacuum pipe of various shapes and standards when used by ...
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WO/2022/244326A1 |
The present invention addresses the problem of achieving: a metallized film which is able to be conveyed without an increase in the contact resistance and without the occurrence of breakage even if a conductive thin film layer is formed ...
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WO/2022/242879A1 |
According to one aspect of the present disclosure, an apparatus (10, 20) for manufacturing a composite film (104) is provided. The composite film (104) includes a first film (101), at least one deposited layer (101a) and at least one sec...
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WO/2022/246338A2 |
Disclosed are example embodiments of systems and methods for displaying a workout session. For example, a method for displaying a workout session is disclosed. The method includes determining whether a plurality of participants are eligi...
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WO/2022/243756A1 |
Barrier films including a (co)polymeric substrate, at least one dyad on the substrate, each dyad made of a (co)polymer layer and an oxide layer overlaying the (co)polymer layer, and an outer (co)polymer layer overlaying the dyads. Option...
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WO/2022/244342A1 |
A cutting tool provided with a base material and a coating that is disposed on the base material, wherein the coating includes a first layer, the first layer is formed from a MoC1-x layer formed from a compound represented by MoC1-x or a...
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WO/2022/243734A1 |
A nozzle for an evaporated material distributor is described. The nozzle includes a nozzle inlet for receiving evaporated material; a nozzle outlet; and a nozzle passage extending between the nozzle inlet and the nozzle outlet having a f...
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WO/2022/244191A1 |
A cutting tool provided with a base material and a coating that is disposed on the base material, wherein the coating includes a TaC1-x layer formed from a compound represented by TaC1-x, x is between 0.40 and 0.60 inclusive, and 95 mass...
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WO/2022/244864A1 |
A mixed powder which contains a first organic compound and a second organic compound, and which is able to be used in a vapor deposition method. With respect to this mixed powder, the spread angle θ1 of the vapor deposition track when a...
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WO/2022/244686A1 |
The present invention provides a method for producing a far-infrared transmission member that has a high far-infrared transmittance. Provided is a method for producing a far-infrared transmission member in which a mixed target of NiO and...
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WO/2022/243611A1 |
The invention relates to a method for depositing a chromium-based material from a target onto a metal substrate, by continuous magnetron sputtering, using a plasma generated in a gas. According to the invention: the ratio between the flo...
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WO/2022/243544A1 |
The invention relates to an apparatus (10) for producing a material layer (12) on a substrate surface (14) comprising a substrate holder (18) for a substrate (16) having the substrate surface (14), a material source unit (20) comprising ...
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WO/2022/244443A1 |
The present invention provides a cathode unit for a magnetron sputtering device SM, the cathode unit being capable of forming a well-coated film across the entire surface of a substrate which has recesses having a high aspect ratio, whil...
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WO/2022/242732A1 |
The present application provides an ECG electrode; the ECG electrode comprises an electrode substrate and a doped graphite-like carbon film located on the outer surface of the electrode substrate; the doped graphite-like carbon film comp...
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WO/2022/245712A1 |
Methods and systems for the delivery of molten metals and metal alloys at a fixed volume are provided. The system includes an evaporation system having a fluid inlet port and a fluid delivery system. The fluid delivery system includes an...
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WO/2022/241952A1 |
A transition metal nitride coating with a nanometer multilayer structure, a preparation method therefor and the use thereof. The transition metal nitride coating with the nanometer multilayer structure comprises a nitride bonding layer d...
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WO/2022/240357A1 |
5 This disclosure concerns a method of fabricating a dysprosium scandate film on an etched surface of a silicon wafer removed from an etchant, comprising contacting the etched surface of the silicon wafer with an alcohol for at least 1 h...
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WO/2022/238412A2 |
The invention relates to a computer-implemented method (20) of generating data for calibrating optical coating apparatuses configured to apply optical coatings to surfaces of substrates. The method is characterized by: measuring spectral...
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WO/2022/240549A1 |
A roller (100) for transporting a flexible substrate is described. The roller (100) includes a first coolant supply (110) for cooling a first part (101) of the roller (100) and a second coolant supply (120) for cooling a second part (102...
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WO/2022/240385A1 |
The invention relates to a computer-implemented method (20) of generating data for calibrating optical coating apparatuses (12) configured to apply optical coatings to surfaces of substrates: the invention is characterized by comparing (...
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WO/2022/241033A1 |
Apparatus and associated methods relate to forming an epitaxial layer of aluminum (14') on an aluminum-nitride compound (12'). The aluminum is epitaxially grown on the crystalline aluminum- nitride compound by maintaining temperature of ...
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WO/2022/240051A1 |
According to one embodiment of the present invention, an evaporation source comprises: a crucible part which has an internal space filled with an organic material, and which has a spout outlet penetrating the upper surface thereof in the...
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WO/2022/239752A1 |
The present invention pertains to a production method that is for a reflection type mask blank and that comprises a step for forming a reflective multilayer film on a substrate using an ion beam sputtering device that uses a process gas ...
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WO/2022/234029A1 |
A method for treating the surface of a steel strip is provided where the method comprises the steps of providing a steel strip (5), plasma treatment of the steel strip by a magnetron plasma sputter unit (1); transferring of the plasma tr...
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WO/2022/235420A1 |
A roller (100) for transporting a flexible substrate (10) is described. The roller (100) includes a main body (101) having a plurality of gas supply slits (103) provided in an outer surface (102) of the main body (101). The plurality of ...
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WO/2022/233737A1 |
The present invention relates to a method of producing a solar cell comprising a metal oxide layer on a substrate, and a solar cell comprising such metal oxide layer.
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WO/2022/235064A1 |
The present invention provides a metal structure manufactured using an anodic oxide film and a method for manufacturing same.
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WO/2022/232870A1 |
A substrate with a film. The substrate with a film comprising a porous substrate. The porous substrate having one or more pores extending through the substrate. A film can be applied to the porous substrate. The film being a vapour depos...
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WO/2022/235421A1 |
A roller (100) for transporting a flexible substrate (10) is described. The roller (100) includes a main body (101) having a plurality of gas supply slits (103) provided in an outer surface of the main body (101). The plurality of gas su...
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WO/2022/228200A1 |
Provided are a coating member and a preparation method therefor, a housing and an electronic product. The coating member comprises a substrate, an anode oxide layer and a base layer. The anode oxide layer is formed on the surface of the ...
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WO/2022/228448A1 |
Disclosed are a fluorocarbon/palladium/magnesium-scandium hydrogen-chromic film and a preparation method therefor. The film comprises, sequentially arranged on a substrate, a magnesium-scandium composite film layer, a palladium catalytic...
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WO/2022/230182A1 |
This cutting tool includes a rake face and a flank face, and is composed of a base material and a coating provided on the base material. The coating includes a TiMAlN layer which contains cubic crystal grains of TixMyAlzN. An atomic rati...
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WO/2022/230857A1 |
A sputtering device (10) is provided with: a first target holder (111) and a second target holder (112) respectively holding a first target (T1) and a second target (T2) with surfaces thereof opposing each other; a substrate holder (16) ...
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WO/2022/228969A1 |
Method and corresponding device for plasma treating substrates (21) moving along a transport direction (5) through a treatment zone that is delimited in a direction transversal to said transport direction (5) by at least one wall (13) fo...
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WO/2022/231967A1 |
A method of facilitating formation of a via in an inorganic substrate may include applying a single-sided acidic wet etching process to a first surface of the inorganic substrate in a first state in which the inorganic substrate has a ma...
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WO/2022/229427A1 |
The invention relates to a coated cutting tool having at least one rake face and at least one flank face and a cutting edge inbetween, the coated cutting tool comprising a substrate and a coating, the coating comprises a (Ti,Al)N layer, ...
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WO/2022/224594A1 |
The present invention comprises: a substrate which has a principal surface with a diameter of not less than 3 inches; and a piezoelectric film which is formed on the substrate, which contains potassium, sodium, niobium, and oxygen, and w...
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WO/2022/224797A1 |
This laminate has an A layer on at least one side of a substrate, wherein: the A layer contains at least aluminum (Al) and oxygen (O); and when a site corresponding to 5.0-25.0%, a site corresponding to 40.0-60.0%, and a site correspondi...
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WO/2022/224929A1 |
A multi-layer thin film including: a first thin film layer comprising a predetermined material and having a refractive index of n1; and a second thin film layer comprising the predetermined material and having a refractive index of n2 (w...
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