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JP4226510B2 |
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JPWO2007010607A1 |
The carburizing furnace is arranged so as to be able to open and close the upper end closed vertical tubular furnace main body 12, the graphite tubular heating element 13 coated on the inner surface of the furnace main body 12, and the l...
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JP4214040B2 |
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JP4215469B2 |
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JP4207354B2 |
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JP2009002581A |
To provide a rotary processor, efficiently moving a material to be treated between cylinders different in diameter from each other.This rotary processor includes: a rotatable first cylinder 31a, a second cylinder 31b having a diameter sm...
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JPWO2006135042A1 |
To provide a firing furnace in which the risk of contamination of the material to be fired is extremely low without putting the material to be fired in a firing container or the like. To provide a firing furnace that has a simple device ...
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JP4204253B2 |
A treatment chamber for heating and pressing workpieces and a heat insulating structure which covers the treatment chamber sideways and from above are provided within a high-pressure vessel. Below the treatment chamber are disposed a bas...
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JP4198618B2 |
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JP2008296237A |
To provide a multi-stage type heating apparatus with which a plurality of metal plates can simultaneously be heated and also, the heated metal plate can individually be taken out and a strict management of the heating temperature can be ...
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JP4178626B2 |
To provide a heat treatment apparatus and a heat treatment method, with which the effect of impurity is hardly exerted upon a material to execute the heat treatment even in the case impurity source in a furnace which can exert adverse ef...
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JP4180492B2 |
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JP2008261619A |
To provide a shuttle kiln for baking ceramics, superior in energy-saving performance, reducing furnace construction cost with a simple furnace body structure, and without causing nonuniformity of baking by ceramic packing position.This s...
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JP4173153B2 |
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JP4171074B2 |
A novel rapid thermal process (RTP) barrel reactor processes a larger batch of semiconductor substrates than was previously possible. The RTP barrel reactor is characterized by a short process cycle time in comparison to the same process...
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JP2008241194A |
To provide a heating furnace having a heat reflecting plate usable at a high temperature and suppressing heat transfer along an external wall by heat conduction because a reflection factor falls greatly due to oxidation at the high tempe...
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JP2008241076A |
To provide a heating method, an intermittent feed-type tunnel furnace and a batch furnace capable of keeping dispersion of a surface temperature of a treated object within a certain temperature difference in increasing the temperature of...
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JP4157215B2 |
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JP4158386B2 |
A thermal processing system (50) includes a cooling tube that covers a processing vessel (56) and heaters (100). The cooling tube has a tubular base member (110) and a cooling pipe (112) spirally wound around the tubular base member (110...
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JP4158905B2 |
To provide a high speed gas carburizing treatment device with an extremely simple structure where the amount of carburizing gas to be used can be saved, and cost can be reduced, and to provide a treatment method therefor. The gas carburi...
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JP4154787B2 |
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JP2008201670A |
To provide a firing furnace having scarce maintenance burdens and enabling a degreasing process and a firing process which can produce a sintered compact of a specified quality, and a manufacturing method using the firing furnace.The fir...
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JP2008202961A |
To suppress thinning of a heater and occurrence of spark, also prevent occurrence of cyanogen, and efficiently raise temperature.Body space that is surrounded by a furnace material and has the heater is shut off into a sample space and a...
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JP2008151371A |
To provide a heat treatment device, and its method capable of preventing falling of dust onto a board, reducing electric power and improving product quality, with respect to the heat treatment device performing heat treatment onto a heat...
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JP2008138964A |
To provide a sealing apparatus for a heating furnace with superior sealability and durability by a simple composition.The sealing apparatus for the heating furnace carrying out heat treatment of a material to be heat-treated mounted on a...
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JP4103997B2 |
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JP4103054B2 |
The invention relates to a method of brazing of aluminium parts in a furnace using a flux, which is carried out effectively without using a corrodible metallic muffle, wherein the furnace inner walls, made preferably of carbonaceous refr...
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JP2008119342A |
To accurately melt an internal resin so as to be a target temperature and a uniform temperature by heating a whole capsule where the resin for molding a denture base and a dental crown is encapsulated.A heating furnace includes: a cylind...
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JP2008107050A |
To provide a high-temperature heating furnace capable of uniformly heating a sample of a comparatively large area.In this high-temperature heating furnace 1 having a main heating chamber 2 for heating the flat plate-shaped sample placed ...
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JP2008107011A |
To provide a burning furnace capable of efficiently and uniformly burning a treating object, and charging the treating object into a furnace main body without hardly decreasing the temperature in the furnace main body without installing ...
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JPWO2006016430A1 |
The present invention provides a firing furnace having excellent durability and thermal efficiency for a long period of time without significantly deteriorating the heat insulating performance of the heat insulating layer, preventing the...
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JPWO2006013651A1 |
An object of the present invention is to provide a firing furnace which is free from occurrence of warping and corrosion in a heat insulating layer, so that it becomes possible to eliminate the necessity of exchanging members forming the...
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JP4084412B2 |
A structure for use in a reactor for processing a substrate, the structure comprising:a susceptor having a first surface adapted for mounting a substrate thereon; a second surface; and a plurality of openings extending through said susce...
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JP4078612B2 |
To shorten the time for a dry distillation process and to save the supply volume of inactive gas by rapidly carrying on substitution of dry distillation gas with the inactive gas at finish of the dry distillation process. In the inductio...
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JP4077930B2 |
The tower furnace for heat treatment of metal strips (6) incorporates a muffle (3) which extends over the entire furnace height. An isolated plug (1) with an electric heating element (2) is inserted into the top section of the muffle, wh...
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JPWO2005122231A1 |
A shutter 20 that shields radiant heat from the high temperature region 32 to the low temperature region 30 is installed between the high temperature region and the low temperature region so as to be able to move forward and backward. Th...
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JP2008082644A |
To actualize normal growth of an oxide film on an aluminum foil for electrolytic capacitor when annealed, without being influenced by the air.An aluminum foil coil 30 manufactured with cold rolling is stored in a main heating chamber 10 ...
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JP4067671B2 |
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JP4061466B2 |
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JP4060356B2 |
A substrate thermal conditioning apparatus with a chamber, a plate located in the chamber and a gas supply. The plate has a top heat transfer surface with grooves therealong. A substrate is placed on standoffs of the heat transfer surfac...
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JP4060737B2 |
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JP2008050645A |
To provide a method for continuously heat-treating a metallic wire rod in which in the case of performing the continuous heat-treatment while running the metallic wire rod in a pipe, such problem as generating the surface flaw on the met...
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JP4058147B2 |
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JP4048242B2 |
To exhaust sublimed gas or the like by a small amount of air with high heat efficiency. An IR heater H which is a heating device is composed of a heat generation part 1 in which a resistance body is arranged between an insulation glass l...
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JP4045689B2 |
A thermal processing unit of the invention includes a substrate-holder which can support a plurality of substrates in such a manner that the plurality of substrates are arranged at a predetermined pitch, and a chamber vessel for housing ...
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JP2008024991A |
To provide a vacuum heat treatment device where degassing time is short, and vacuum retainability is hard to be lowered.The vacuum heat treatment device 1 is provided with a rotary vessel 4 arranged in a vacuum and further having a stora...
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JP4041923B2 |
There is provided a method for brazing aluminium parts and/or aluminium alloy parts, wherein the brazing is carried out under an inert atmosphere in a brazing chamber (2), preferably an elongated chamber, composed wholly or partly of car...
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JP4039491B2 |
To provide: an apparatus for heat treatment in which heater replacement is safely and easily performed, and replacement cost is low; a furnace for heat treatment; an insulation material; and an exhaust duct in the heat treatment apparatu...
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JP4035416B2 |
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JP4036598B2 |
To provide a heat treatment apparatus enabling safe and easy work for heater replacement and having a reduced replacement cost. The heat treatment apparatus comprises a heat treatment furnace provided with a gas exhausting duct 22 above ...
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