| Document |
Document Title |
|
JP3868411B2 |
To provide a heat treatment furnace for reducing equipment cost, having high utilization efficiency of a constitutive part, reducing the occupying floor area, flexibly coping with a load change of a treating object, and suitable for smal...
|
|
JP2007500447A |
A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processin...
|
|
JP3128191U |
To propose a metal muffle in a heating furnace capable of increasing the drivability of a steel running belt moving on an inner bottom thereof without lowering the physical characteristics of the metal muffle. A portion corresponding to ...
|
|
JP3861099B1 |
To realize a heat treatment furnace in which the entire heat treatment object is gas-cooled as uniformly as possible with a simple configuration. A stirrer 3 for sucking and discharging a cooling gas introduced into a gas cooling space 2...
|
|
JP3859226B2 |
To provide a rapid thermal processing reactor which can handle wafers of multiple sizes and can heat them to an almost uniform temperature in the process. A rapid thermal processing (RTP) reactor 300 uses one or two heat sources 310 to p...
|
|
JP2006329449A |
To solve problems in a conventional baking furnace where oxygen included in furnace atmosphere is blocked from a carbonaceous burned product by breeze filled in a muffle, that it takes much time and work to take in and out the breeze as ...
|
|
JP3843030B2 |
To provide a structure enabling prevention of distortion due to thermal expansion of an inner wall of the furnace and also effective prevention of furnace contamination due to generation of dust from oxidation of a component and a heater...
|
|
JP2006284077A |
To provide a heat radiation reflecting furnace efficiently using radiation energy being sealed in the furnace as much as possible while avoiding or reducing heat storage in components of the furnace and suppressing radiation energy loss ...
|
|
JP2006284005A |
To provide a baking furnace superior in mass productivity, and capable of reducing the variation of product features, preventing the waste consumption of gas for atmospheric baking, and elongating the service life of a heater.Furnace bod...
|
|
JP3835714B2 |
To equalize temperature distribution of a pipe type heater throughout a range of an inlet to an outlet as much as possible and to improve the utilization efficiency of a quantity of heat retained by combustion gas by a method wherein a s...
|
|
JP2006266991A |
To perform connection working and connection releasing operation of a thermocouple and a compensating lead without having an operator enter a vacuum heating furnace.The vacuum heating facility comprises heating a small-piece object to be...
|
|
JP3830146B2 |
To prevent leakage of harmful matter such as dioxins to the outside by preventing simultaneous opening of an outer input opening and an inner input opening by mechanical control and not by electrical control in an incinerator adopting an...
|
|
JP2006258398A |
To provide a ceramic art kiln capable of bisque-firing by utilizing exhaust heat during actual firing simultaneously.This ceramic art kiln is composed of an actual firing part 1 having a combustion chamber 4 in a lower part, a bisque-fir...
|
|
JP3125138U |
To provide a heat treatment furnace suitable for quenching a large heat treatment object. A heat engine 6 is attached to a heat treatment furnace, and a fan 5 is driven by the heat engine 6 to agitate a high-pressure cooling gas during a...
|
|
JP2006234324A |
To provide a kiln for ceramics capable of shortening a series of firing time by simultaneously conducting firing processes of biscuit firing, glost firing and decorating firing, and improving heat efficiency in firing.In this kiln for ce...
|
|
JP3819278B2 |
To eliminate deterioration of a seal member due to a thermal influence from a heat source body by promoting a cooling effect of a mounting flange in the heat source body such as a radiant tube burner to decrease heat transferred to the s...
|
|
JP3814785B2 |
To provide a heat treatment oven which prevents weld cracking, cracking, and the like of a sheet-metal weld zone in the oven due to a rapid thermal shrinkage caused by cooling in a high-temperature range, achieving a long service life an...
|
|
JP2006519497A |
A wafer etching system has a measuring device, an etching chamber, and a controller. The measuring device measures the critical dimension test feature (CD) along the profile of the wafer at a number of preset locations. The etching chamb...
|
|
JP2006518445A |
The present invention provides a system and method for binder removal and sintering of materials such as ceramic materials and products, LTCC intervals, solid oxide fuel cells and powder metals. A combination of microwave and convection/...
|
|
JP2006194558A |
To provide an economical heating furnace capable of heating supply gas and exhaust gas without providing a special heating device in the heating furnace for a semiconductor or the like.In this heating furnace, a metal tube 6 allowing the...
|
|
JP3798246B2 |
|
|
JP3794816B2 |
To provide a vacuum heat treatment apparatus which can produce ultra-high vacuum atmosphere in a short time. In a vacuum heat treatment apparatus 1, a first load-lock chamber 31 is provided in front of a second load-lock chamber 32 conne...
|
|
JP3779348B2 |
PURPOSE: To provide a highly purifying furnace capable of completely purifying a graphite member and easy in maintenance. CONSTITUTION: This furnace has a treatment vessel 11, a graphite furnace member 13 for housing the member to be tre...
|
|
JP2006104284A |
To provide a carbonizing system solving problems on a combustion nozzle that the nozzle is gradually blocked caused of substance stuck in carbonizing sewage sludge in the carbonizing system which discharges and burns dry distillation gas...
|
|
JP3120661U |
To enhance the airtightness of a sintering chamber in a pipe sintering furnace, ensure the reliability of the airtight device by a good heat separating device of the sintering chamber, and extend the service life. Extend. An airtight dev...
|
|
JP3766137B2 |
To obtain the subject refractory excellent in resistance to oxidation, sparring and wear, etc., by limiting the respective contents of readily oxidizable additive(s) such as metal(s) and boride(s) in a refractory feedstock comprising a m...
|
|
JP2006078019A |
To provide a heat treatment equipment capable of shortening the distance to make illumination distribution become broad by making illumination distribution in a surface of a panel-shape object to be heated such as a semi-conductor wafer ...
|
|
JP2006077281A |
To provide a heat treatment apparatus for heat-treating a steel bar, which spends a constant and extremely short period of time between works of extracting the steel bar from a heating furnace and charging it into a cooling pond, so as t...
|
|
JP3758745B2 |
To reduce the occurrence of a combustible gas explosion risk through reduction of penetration of air to the inner side of a furnace by a method wherein a super purge line in which inactive gas is fed during opening of a door and a govern...
|
|
JP2006046865A |
To provide a kiln that can shorten time for firing and can reduce variation in the porosity and flexural strength of fired bodies, as compared with existing kilns using external heating.A kiln body 11 has a quadrangular muffle 15 of carb...
|
|
JP3739233B2 |
To conduct heat treatment of objects to be heated which generate gaseous inflammable substances while keeping accuracy in temperature. An outer tank 3 comprises an upper chamber 31 for housing an inner tank 1 and a lower chamber 32 for h...
|
|
JP3720784B2 |
To provide a hot air circulation type oven wherein inflow of hot air into a gap between an oven main body and an oven door is prevented, and attachment of sublimated matter contained in the hot air to surfaces of the oven door and the li...
|
|
JP3715707B2 |
To prevent a vent passage from being closed owing to an oxide of metal contained in a heated alloy being deposited on a heat storage unit in a heat storage alternate combustion furnace. A heat storage alternate combustion furnace is adap...
|
|
JP2005311306A |
To shorten the transfer time, increase the number of pieces treated and improve the throughput, in such a way that a plurality of workpieces can be transferred by each holder, having a ring-shaped support plate.The apparatus comprises a ...
|
|
JP2005533232A |
A method and an apparatus for insulating and controlling a temperature in a semiconductor manufacturing environment. The present invention comprises at least one modular heating element designed to be mounted around the process chamber o...
|
|
JP2005533378A |
The device (100) and method are provided to heat treat the substrate (108) held on the carrier (106). The device (100) is a heating having a container (101) having a top (134), a side (136) and a bottom (138) and a heating element (112-1...
|
|
JP2005299948A |
To provide a microwave baking furnace capable of extending its service life wherein an inner shell wall which structures a heating element for defining a baking chamber is not damaged by thermal shock.In the microwave baking furnace, a s...
|
|
JP2005299990A |
To provide a high temperature heating device capable of carrying out heat treatment in a high temperature of an heat treatment target object such as a wafer substrate placed in a reaction chamber.In the high temperature heating device ha...
|
|
JP2005272822A |
To provide a furnace diagnosis method which permits not only judgment whether repair is necessary or not but also decision on the priority order of necessary repair and further to provide a furnace diagnosis system which permits decision...
|
|
JP2005274040A |
To provide a heat treatment device for quickly exhausting thermally decomposed gas while uniforming temperature distribution in a heating chamber.The heat treatment device 1 for heating articles being carried via a container 4 comprises ...
|
|
JP2005249276A |
To provide a clean oven capable of a cleanliness at a high level by suppressing dusting from a packing without adopting a special structure in the oven even at a high temperature of 500°C and in the rising and lowering of the temperatur...
|
|
JP2005243667A |
To provide heat treatment equipment which heats the outer part of a testpiece by high-frequency induction heating while heating an inner part thereof by an infrared lamp, and can rapidly heat up an SiC substrate having a diameter of some...
|
|
JP2005235962A |
To provide a heating furnace which can raise a cooling effect to quickly cool an inside of a process chamber, and thus can enhance throughput of this device.The heating furnace 10 comprises a process container 4 which is internally forme...
|
|
JP2005221135A |
To provide a burning furnace capable of efficiently and uniformly burning a treated object.This burning furnace for burning the treated object charged into a treatment chamber 22 in the furnace by using a heating gas, is provided with th...
|
|
JP2005207663A |
To prevent the corrosion by a dry distilled gas, of a furnace main body and to reduce radiation loss.In this induction heating type pyrolysis furnace, a dry distillation tank for putting a dry-distilled substance is mounted in a furnace ...
|
|
JP3671142B2 |
To provide an apparatus which prevents a substrate from being partly deformed to cause a positional deviation because of the temperature difference between the substrate and a substrate support member when the substrate is replaced in a ...
|
|
JP2005172276A |
To provide a high temperature treating technique which consumes relatively small energy and can make harmless waste products which are difficult to treat such as PCB.This is a high temperature treating device comprising a furnace chamber...
|
|
JP2005163155A |
To provide a metal heat treatment device applying hot gas which is capable of efficiently and reliably performing the heat treatment requiring isothermal maintenance such as austempering, multi-temper and multi-quench without using a sal...
|
|
JP3664340B2 |
To provide a heating device which keeps the merits on a function having the conventional muffle furnace to a refractory furnace, i.e., the function, such as shortening of dew point adjusting time, reducing of scratch on a product, and ca...
|
|
JP3109840U |
A substrate support ring has a band having an inner perimeter that at least partially surrounds a periphery of the substrate. The band has a radiation absorption surface. A lip extends radially inwardly from the inner perimeter of the ba...
|
