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JP2002079208A |
To upgrade the productivity of a metal recycling process.An object intended for treatment such as a resin-coated aluminum is first subjected to the pyrolytic decomposition of resin by a rotary kiln 101 and then the heating of the aluminu...
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JP2002075900A |
To provide a uniform heating method for heating a platy sample easily with uniform distribution of temperatures without receiving an influence from a temperature distribution of a partition wall.In the method in which a circular platy sa...
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JP2002075889A |
To provide a heat treatment system for reducing a variation in cooling of a heater, enlarging the setting width in temperature difference between inlet and outlet of a coolant path without an influence on temperature uniformity of a work...
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JP2002075888A |
To provide a preventive method of involvement of oxygen gas in a diffusion system for preventing the involvement of oxygen gas into a diffusion furnace (furnace tube) and monitoring the concentration of oxygen in the diffu sion furnace, ...
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JP2002071105A |
To provide a cylindrical metallic heating furnace using three combustion burners with high thermal efficiency.The cylindrical metallic heating furnace having the combustion burners for burning fuel gas in a cylindrical furnace 16 include...
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JP3263383B2 |
To attain heating in a short time by increasing efficiency of heating, to shorten a processing time in one cycle by quickening the descending speed of a temperature, to attain the introduction and discharge of a work in a normal temperat...
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JP2002043238A |
To provide a heat treatment system for evenly heat treating among a plurality of wafers.The heat treatment system 1 comprises a wafer boat 4 for horizontally holding a plurality of wafers and a heater in which the wafer boat 4 is arrange...
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JP2002039691A |
To provide a gas supply tube, a heat treatment furnace using the same, and a heat treatment method wherein atmospheric gas is uniformly injected over a wide area to keep uniformly the atmosphere in the het treatment furnace.A gas injecti...
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JP2002039687A |
To provide a structure of a ceramic calcination batch furnace capable of improving working efficiency with easy maintenance.An easily exchangeable heat insulation box that is previously constructed is mounted in a furnace shell.
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JP2002022109A |
To prolong the service life of a combustion tube heater used in a state where the heater is dipped in a molten metal held in a molten metal holding furnace and, at the same time, to improve the thermal efficiency of the heater.This combu...
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JP2002005575A |
To provide a vacuum heat treating furnace having a function of agitating granule which can (1) readily perform batch processing of granule by small amount, (2) prevent scattering of the granule, (3) raise the treatment speed, (4) uniform...
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JP2002005574A |
To provide recycling equipment for cemented carbide, which dispenses with remelting for obtaining blobs of recovered low melting metal to be used for the used hard metal recycling, and prevents the low melting metal from adhering to the ...
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JP2001358084A |
To provide a thermal treatment device which does not require a loading area or a lift mechanism below a processing vessel, can be reduced in height, made simple in structure, and improved in processing.A holder 1 holds works W disposed a...
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JP2001351873A |
To provide a heat treatment furnace which reduces the number of times of washing a quartz core tube to improve productivity and prevents contamination on a semiconductor wafer during heat treatment.The thermal treatment furnace comprises...
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JP2001348629A |
To provide a refining method by which, at the time of separating impurities such as magnesium chloride and metallic magnesium remaining in a sponge titanium at high temperature under the reduced pressure, introducing the impurities into ...
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JP3240690B2 |
PURPOSE: To provide a hearth for a vacuum furnace made of carbon fiber composite carbon material which can suppress roughness and pulverization of a surface and is durable in a long-term use. CONSTITUTION: A supporting base 12 and suppor...
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JP2001342526A |
To provide a purifying process and vacuum separating equipment having a separating vessel protected from deformation when titanium sponge is processed at a high temperature and under reduced pressure to separate magnesium chloride and ma...
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JP2001344002A |
To provide the heat treating device and method of an object to be treated capable of improving the follow-up performance and stationary characteristics of control.This heat treating device of an object to be treated is provided with a he...
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JP2001341129A |
To provide a method for sterilizing/volume-reducing waste and valuables as much as possible, especially medical waste, safely in consideration of environment, and an apparatus for the method.An apparatus 10 for carbonizing waste comprise...
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JP3233055B2 |
To prevent binder components from being accumulated in the space between the furnace body and the table, etc., by forming a gas introducing passage for introducing a gas into a heating chamber, in the space between a furnace body and the...
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JP3230296B2 |
PURPOSE: To provide a rotary heat treatment furnace, capable of effecting the drying, calcining and pulverizing treatments of works continuously as the treatment of one series and readily coping with the change of the works. CONSTITUTION...
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JP3218840B2 |
PURPOSE: To make the separating state of a material to be treated in each of treating chambers good and to improve the treating accuracy and the treating efficiency by laying the material to be treated on a spacer and shifting it with ca...
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JP2001274107A |
To make thickness and concentration of a film formed on a wafer surface uniform by eliminating pressure gradient of the gas ejected from each ejecting hole of a gas feed pipe in a diffusion furnace. This vertical type diffusion furnace, ...
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JP2001517363A |
(57) [Summary] It is a vertical heat treatment apparatus (10) that processes a semiconductor wafer held in a processing chamber (16). The processing chamber (16) is housed in a processing container (18). The furnace liner (82) surrounds ...
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JP2001267258A |
To provide a method and an equipment for heat treatment in which a set treating temperature can be returned back quickly when the temperature of an article to be treated is varied.In the heat treating method where a heating source is dis...
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JP2001262147A |
To solve the problem that the outside air tends to invade from the exhaust port and the quality of the carbide is deteriorated and the yield is decreased by the oxidation in the rotary kiln or the mesh-belt kiln which has been convention...
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JP2001259565A |
To provide a heat treatment method and a heat treating device by which dioxins can be cut at a comparatively low temperature of 300-500°C with the use of a commercial grade powdered decomposer of dioxins.Ash intended for treatment such ...
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JP2001255069A |
To facilitate manufacturing of a helical resistive heat-generating member composed of ceramic resistive heat generating member, and improve its productivity, quality and uniform temperature characteristic.There is provided a heat treatme...
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JP3208047B2 |
To provide a heating furnace which can heat and harden uniformly the paste applied on the surface of a base and can produce the base of high quality and of which the area of installation is small. A plurality of elevating pins 15 which p...
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JP2001241849A |
To obtain a baking furnace of a PDP(plasma display) substrate having good space saving, energy saving, a high clean atmosphere, quick cooling and a waste gas removing efficiency.The PDP substrate baking furnace comprises heaters 4 and gl...
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JP2001221575A |
To suppress deterioration of furnace member and products by early detecting defects in a radiant tube and taking counter measure.An evaporation preventing gas is supplied into a vacuum chamber 12 through a gas supplying source and a gas ...
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JP2001208478A |
To enable a heater element to be partially displaced in a vertical thermal processor capable of processing a semiconductor wafer in a batch, and to enhance uniformity of processing atmosphere with suppression of heat dissipation from the...
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JP2001208611A |
To provide a technology for accurately measuring temperature on a real time basis when a measuring body in a heat treatment device is measured separately from the treatment device.When temperature is measured by a radiation thermometer 1...
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JP2001183072A |
To provide a heat treatment furnace the heat insulation material of which can be cooled inexpensively and effectively. The heat treatment furnace is provided with a pressure vessel 1, the heat insulation material 2 which is installed in ...
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JP2001183066A |
To provide thermal treatment equipment which can efficiently perform heating/cooling treatment by shortening the time required at the time of changing its treating temperature and, at the same time, can guarantee a fixed quality for trea...
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JP2001183070A |
To obtain an economical effect by prolonging the service life of the heating element of a furnace for ceramic industry by protecting the heating element from an external contaminate environment and to enable the heating element to heat t...
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JP2001182912A |
To prevent the break of an outer tube by reducing thermal stress caused by thermal gradient between the lower part of a radiant tube contacting liquid to be heated and the upper part of an outer tube in a single ended radiant tube. The t...
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JP2001183065A |
To provide heating equipment which can perform vacuum heating at a superhigh temperature and a method of using the device. In the heating equipment, an airtight container is covered with a weakly airtight container.
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JP3174379B2 |
PURPOSE: To obtain a heater which has excellent spalling resistance, deterioration resistance and reactivity resistance and in which a temperature can be stably raised and lowered for a long period. CONSTITUTION: An inorganic coating lay...
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JP3175251B2 |
PURPOSE: To equally heat workpiece, even if they are placed at any place on trays, in the title furnace in which a number of the workpiece are placed on the trays provided in multistage form and are heated. CONSTITUTION: For trays 7 prov...
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JP3170237B2 |
To ensure high quality heat treatment of a large work. A heat treatment chamber 2 for a work W, a wind tunnel 4 formed through a heat storage plate 3, a temperature rising heater 5 being turned on upon temperature rise, and a normal hot ...
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JP2001141368A |
To effectively seal a treating chamber while simultaneously opening/ closing the chamber and conveying a material to be treated, and to improve and simplify the operating efficiency of a continuously treating apparatus. A partition chamb...
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JP2001135543A |
To provide a device for heat treatment, with which the magnetic field of a uniform and desired strength can be generated by a comparatively miniaturized magnetic field generating means, further, quick temperature elevation or cooling is ...
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JP3166303B2 |
PURPOSE: To provide a heat treating furnace in which time and energy consumption required for heat treating a material to be treated can be reduced and quick heating of the material to be treated can be realized. CONSTITUTION: The heat t...
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JP2001121125A |
To prevent a material to be treated changed into a thermal decomposition furnace from being softened, fused and stuck to an inner wall even at the time of increasing the heat transmission surface temperature of the thermal decomposition ...
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JP3163676B2 |
PURPOSE: To prevent the generation of preclusion against the increasing of the degree of vacuum due to the evaporation of adhered water by a method wherein the adhesion of water to the internal surface of a furnace shell due to the conde...
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JP3162063B2 |
A heating mantle for heating materials, such as metals, alloys or inorganic chemicals in a retort (42), includes a tubular wall (16) and annular chambers (22) cooperating with said (16) wall for forming a tortious path around the retort ...
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JP2001077011A |
To shorten the downtime attendant on the removal of a sublimable compound, to simplify removal work and improve safety in a semiconductor manufacturing devise for applying an organic film of an anti-reflection film to the surface of a se...
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JP2001064033A |
To prevent the deterioration of the spacer itself of a heating furnace which fixes a muffle and uses the spacer for sealing the muffle and a casing to each other. The muffle 2, a heater 4 and a thermally insulating material 5 are dispose...
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JP2001050669A |
To minimize damages to a work to be treated or the constituting materials in a furnace, while maintaining heating efficiency by a method wherein the heating operation is stopped immediately, when combustion gas happens to leak into a tre...
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