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JP3373413B2 |
To effect a heat treatment of large-size works excellently in the quality thereof without increasing the sizes of constituting instruments. A heat treatment chamber 3 of a hot air circulating system consisting of a main heater 4, a fan 5...
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JP2003031512A |
To enable the accurate carry-in and carry-out of a wafer into or out of a diffusion furnace.The diffusion furnace 10 is provided with a carry-in/carry-out controller 12. A controller 14 included in the carry-in/carry-out controller 12 co...
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JP2003031513A |
To enable the accurate carry-in and carry-out of a wafer into or out of the body of a diffusion furnace.The diffusion furnace 10 is provided with a carry-in/carry-out controller 12. A controller 14 included in the carry-in/carry-out cont...
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JP2003017425A |
To control a temperature inside a furnace for uniform distribution in a diffusion furnace type semiconductor manufacturing equipment, where a semiconductor wafer is carried into the diffusion furnace for high temperature heat treatment o...
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JP2003010826A |
To provide an efficient vacuum heat treatment apparatus for an environmentally harmful organic chemical substance residue, capable of surely, decomposing the organic chemical substance in exhaust gas generated by decomposing the environm...
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JP3361584B2 |
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JP2002372373A |
To provide a vacuum furnace in which maintenance frequency can be decreased as much as possible by preventing scattering of wax, metal vapor, or the like, while ensuring efficient exhaustion. An enclosed container V comprises a tray 3 fo...
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JP2002364808A |
To realize a fixing structure of a radiant tube 1 in a radiant tube burner 100 comprising a ceramic radiant tube 1 internally forming a combustion chamber 9, and a member 3 for holding the radiant tube wherein shift of the radiant tube 1...
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JP2002356705A |
To provide a vacuum furnace capable of preventing scattering of wax, reducing frequencies of the furnace maintenance works, and performing efficient exhaust. A material M to be treated is loaded on an open tray 3, and carried in, and a d...
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JP2002357388A |
To provide a heat treating furnace that can accomplish energy conservation by reducing the quantity of hydrocarbon used for generating an atmospheric gas and eliminating the need of cooling and reheating of the gas. The gas outlet 11a of...
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JP2002353211A |
To provide a heat treatment apparatus which can surely prevent the condensation of a process gas in the position of the base end side of a gas introducing pipe and set up the gas introducing pipe with high positional accuracy and repeata...
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JP2002352938A |
To provide a technology for predicting disconnection of a heater wire, composed of a resistance exothermic body which is the heating means installed at the surroundings of a reaction tube, in a device in which semiconductor wafers of num...
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JP2002343722A |
To provide a quartz glass furnace core tube for low pressure CVD in which height dimension nearly equal to that of a furnace core tube formed of metal material can be obtained although the furnace core tube is formed of quartz glass and ...
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JP2002539926A |
The present invention relates to methods and devices used to remove at least one volatile contaminant from contaminants by vacuuming at high temperatures using a rotary vacuum retort. The charging and charging are performed so that the i...
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JP2002333278A |
To provide a heat insulation member for a high-temperature furnace which can realize in an improvement in productivity due to reductions in a purchasing cost of a carbon felt, man-hours of replacing and repairing and a repair stopping ti...
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JP3344106B2 |
PURPOSE: To provide a hot air circulation furnace in which productivity can be improved and a high purity control over atmospheric gas can be realized under a simple configuration not using any equipment and the like. CONSTITUTION: There...
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JP2002324657A |
To prevent contact failure of each contact point of a high frequency power switch and secure a good contact state for a long time, and realize small sizing of the switch itself.This is a billet heater 1 that comprises a plurality of furn...
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JP2002310561A |
To provide a heating furnace having an excellent thermal efficiency.The heating furnace comprises an inner wall made of a heat insulation reflector made of a quasi-crystal alloy. In this case, the surface roughness (Ra) of the reflector ...
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JP2002307413A |
To provide a method for manufacturing a heat insulator for a baking furnace having low powder dust and a highly dimensional accuracy.The method for manufacturing the heat insulator for the baking furnace comprises the steps of first wet-...
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JP2002305190A |
To improve productivity by enabling particles adhered in a heat treating furnace to be sufficiently removed and to enable heat treatment of proper quality, containing little particles to be executed.A heat treatment apparatus comprises a...
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JP2002299273A |
To improve efficiency in the exchange of a nozzle pipe and to suppress working costs low.A device is provided with supporting part 14 for supporting a semiconductor wafer 13, a treatment pipe 15 for housing the supporting part 14, a heat...
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JP3330570B2 |
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JP3327050B2 |
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JP2002530847A |
A dual resistive heater system includes a base or primary heater (120A), surrounded by a peripheral or edge heater (120B). Both resistive heaters deliver heat to a heated block, and the heaters and heated block are substantially enclosed...
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JP2002252220A |
To properly perform heat treatment without the heat treatment affected by change with time and change in outside environment.Each of heaters is independently powered, and the temperature of objects to be treated in a zone defined by each...
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JP2002231635A |
To enable a wafer as a processing object introduced in a vertical oven to be improved in the uniformity of a time integral value of temperature through its surface.A boat loaded with wafers is introduced into a cylindrical oven, and the ...
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JP2002228364A |
To solve a problem in a conventional roller hearth kiln in which combustion gas coming in contact with an object to be burned sometimes provides the object with a harmful effect.Occurrence of the harmful effect on the object to be burned...
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JP2002228361A |
To solve a problem in a conventional method for forming a passive state film on an inside surface of a metal pipe in which joints at a front end and a rear end of the metal pipe are connected by caulking one by one, resulting in renderin...
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JP3310997B2 |
PURPOSE: To enable minimizing and lightening of a continuous treatment apparatus having a simple structure and easily execute quick and smooth carrying of a material to be treated between treatment chambers being different atmospheres. C...
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JP2002206863A |
To provide a continuously heat treating furnace in which an accurate temperature distribution can be controlled by using a gas combustion type radiant tube burner as a heating means of a heating chamber, and an adequate energy saving eff...
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JP2002208591A |
To control a treatment temperature by measuring temperatures in a plurality of points inside a wafer face.In a batch-system vertical hot wall-type heat treatment apparatus 10, radiation thermometers 50 which penetrate the sidewall of a p...
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JP3299882B2 |
To provide a heating furnace which can uniformly heat-harden the paste coated on the surfaces of the base plate, can produce base plates of high quality with its installation area reduced. A glass base plate 12 coated with a sealing agen...
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JP2002188889A |
To prevent the deformation of a muffle in the width direction and in the vertical direction.Both ends of support rollers 11 are arranged by being supported on bearings 12 provided on a counter 1 in a manner to be freely peripherally rota...
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JP3292086B2 |
To provide a heater which can efficiently remove additives contained in a material to be heated and a ceramic element manufacturing method using the heater. In the inside of a heating furnace 3, a heat resistant vessel 4 in which a mater...
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JP2002168570A |
To obtain a hot air circulation burning furnace in which variation of temperature distribution can be suppressed by uniform circulation of hot air even for articles, e.g. ceramic circuit boards, stacked in multistage through an incinerat...
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JP2002167607A |
To provide an electric pressure sintering apparatus which can be automated, improve the efficiency in the case of manufacturing sintered stocks, and realize mass production.This electric pressure sintering apparatus 1 having a pair of si...
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JP2002164333A |
To provide a heat treatment apparatus, by which a heating treatment can be executed in a stable air current, using a method wherein the oxidation of a substrate is prevented in the heating treatment and the oxidation of the substrate is ...
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JP2002151423A |
To provide a diffusion furnace heating a semiconductor wafer on a boat for uniform characteristic.The diffusion furnace comprises a furnace tube 12, a heater 3 on external wall of the furnace tube 12, a lid member 4 provided to freely op...
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JP2002151427A |
To provide a heat treatment apparatus wherein the uniformity of the temperature distribution of a substrate can be surely and easily secured during heat treatment.A region to be irradiated with light is divided into four zones: a ring zo...
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JP2002147966A |
To provide a melting furnace formed such that a product with uniform quality is easily produced since a temperature difference according to a spot hardly occurs to a molten substance in a crucible, the crucible is hardly damaged, and an ...
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JP2002137208A |
To improve especially a furnace apparatus for direct heating type fumigation heat treatment in a method for drying lumber.A heating temperature of the whole area or a part in a fumigation heat treating furnace 1 which is obtained from re...
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JP2002134428A |
To provide a heat treating apparatus which maintains high heat insulation during processing and holds the heat radiation high during temperature falling after ending a process, thereby improving the temperature lowering characteristics.T...
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JP2002124482A |
To prevent the occurrence of particles in a medium not heated when a furnace port cover 11 is moved downward and to prevent a reaction tube 4 from being damaged when outer force is given to an elastic body 203.In the furnace, a screw 202...
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JP3277689B2 |
PURPOSE: To obtain a door opening mechanism which always allows properly opening and closing a door of a container such as a vacuum or pressure vessel on which a differential pressure is exerted, by a method wherein when an actuator is o...
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JP3275919B2 |
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JP3274089B2 |
To carry out heat treatment of a large-sized article safely and surely. A heat treatment apparatus is provided with hot plates 2 vertically arranged in four steps in a heat treatment chamber 1, hot air heated by a heater 52 is supplied a...
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JP3274090B2 |
To allow a large work to be subjected to heat treatment without wind with temperature being appropriately distributed. A heat treatment room is divided into up and down parts by a partition plate 4 and a hot plate 3 for closing, and a ho...
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JP2002097517A |
To provide a high-speed rotating engine capable of particularly preventing a wear of a rotating part thereof, wherein a turbine for circulating a gas through a thermal cooling cell, is droven.The hardening cell, wherein parts of steel ar...
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JP2002093733A |
To provide a heat treatment apparatus of a semiconductor wafer, which can prevent air for cooling introduced into a space between a heater and a liner tube from leaking into load chamber.A clearance between a tube support 5 and a flange ...
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JP2002090067A |
To provide a heat treating apparatus for improving a utility efficiency of an input heat energy without giving an influence to quality and yield of a product in the apparatus for heat treating a product such as an electronic component, a...
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