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WO/2018/068441A1 |
A mask plate (30), a stitching exposure method, a display panel, and a manufacturing method. The mask plate (30) is used for manufacturing scan lines (21) or data lines (22) of a display panel by means of exposure; the mask plate (30) is...
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WO/2018/071063A1 |
Diffraction-based focus target cells, targets and design and measurement methods are provided, which enable sensitive focus measurements to be carried out by overlay measurement tools. Cells comprise a periodic structure having a coarse ...
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WO/2018/061544A1 |
Disclosed is a proximity exposure method wherein: a mask (M), in which mask patterns (31) larger than the resolution limit of a resist (R) are formed, is prepared with respect to a resist pattern (43) having the smallest pitch (P) that i...
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WO/2018/063325A1 |
Lithographic apparatuses suitable for complementary e-beam lithography (CEBL) are described. In an example, method of forming a pattern for a semiconductor structure including forming a pattern of parallel lines above a substrate. The me...
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WO/2018/063331A1 |
Lithographic apparatuses suitable for complementary e-beam lithography (CEBL) are described. In an example, a method of forming a pattern for a semiconductor structure includes forming a pattern of parallel lines above a substrate. The m...
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WO/2018/057327A1 |
A method of patterning a substrate. The method may include: providing a first surface feature and a second surface feature in a staggered configuration within a layer, the layer being disposed on the substrate, and directing first ions i...
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WO/2018/057345A1 |
Asymmetric structures formed on a substrate and microlithographic methods for forming such structures. Each of the structures has a first side surface and a second side surface, opposite the first side surface. A profile of the first sid...
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WO/2018/055995A1 |
Provided are: a support frame (1) for pellicles, which has both low dust generation properties and high light resistance, while being ultimately reduced in the ion release amount to the extent such that haze is not produced even in cases...
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WO/2018/056033A1 |
Provided is a mask blank for a phase shift mask that transmits ArF excimer laser light at a transmittance of 10% or greater, has a high correction rate ratio for translucent substrates when EB defect correction is performed, and for whic...
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WO/2018/055994A1 |
The present invention provides a support frame for pellicles that has both low dusting characteristics and high light fastness and the ion elution amount of which is reduced to the utmost limit to an extent that noise is not generated ev...
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WO/2018/046377A1 |
A source grating structure (G0) for interferometric X-ray imaging cable of generating a non-uniform intensity profile behind a surface (S) of the grating structure when exposed to X-ray radiation.
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WO/2018/048005A1 |
A mask protecting module is provided. The mask protecting module comprise a frame and a membrane supported by the frame, and the membrane may comprise areas that are different from each other in terms of at least one selected from optica...
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WO/2018/044678A1 |
A reticle pod includes an outer pod, an inner pod cover and an inner base plate. A reticle is supported on the base and is contained within the environment created by the inner pod cover and the inner pod base. The inner pod cover can in...
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WO/2018/043347A1 |
Provided is a pellicle production method which allows for the simplification of production steps. The pellicle production method comprises: a step for forming an SiC film (11) on a lower surface (21a) of an Si substrate (21); a step for ...
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WO/2018/037864A1 |
It tends to be difficult to create a phase shift film having a transmittance of 20% or more from a single layer phase shift film made of silicon nitride material; as such, provided is a mask blank including a phase shift film having a tr...
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WO/2018/037863A1 |
The purpose of the present invention is to provide a mask blank (100) of which a light-shielding film pattern (2a) has high ArF light resistance, and which solves the problem of detection sensitivity being insufficient when mask detectio...
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WO/2018/034460A1 |
The present invention relates to a photosensitive resin composition and a cured film prepared therefrom. The photosensitive resin composition additionally includes a thermal acid generator in addition to a conventional siloxane polymer, ...
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WO/2018/030703A1 |
The present invention relates to a nano protrusion forming method and a base material having a nano protrusion surface formed by the method, which forms, through a wet etching process by an acid solution without using a nano mask, an ant...
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WO/2018/029184A1 |
The invention concerns an optical system comprising a scanning unit, a first lens- element group comprising at least a first lens element, a focusing unit which is designed to focus beams onto a focus, wherein the focusing unit comprises...
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WO/2018/023838A1 |
A novel protection film for preventing from growing a haze on a photomask, comprising a frame (2) connected to a photomask (1) and a protection film (3) connected to ends of the frame (2). A gas channel is provided on the frame (2). Acco...
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WO/2018/022371A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber...
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WO/2018/020913A1 |
This mask blank is provided with a light blocking film on a light transmitting substrate. The light blocking film has an optical density of 2.5 or more with respect to ArF excimer laser exposure light, and has a structure that comprises ...
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WO/2018/020994A1 |
The present invention provides a mask blank substrate, a mask blank, and a transfer mask that enable deterrence of focus error even when a transfer mask having relatively sparse transfer patterns is manufactured without using a high-spec...
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WO/2018/022372A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a an absorber layer on the capping layer, the absorber layer made from an alloy of at least ...
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WO/2018/017478A1 |
Disclosed are methods and materials for removing groups from a polymer.
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WO/2018/016262A1 |
The present invention provides a mask blank in which a correction rate of EB defect correction is sufficiently fast and a correction rate with respect to a translucent substrate to EB detect correction is sufficiently high, even when a p...
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WO/2018/015114A1 |
A direct write exposure apparatus configured to process a plurality of substrates is described, the apparatus comprising: - a substrate holder configured to hold a substrate having a usable patterning area; - a patterning system configur...
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WO/2018/016485A1 |
Provided is a photomask used in scanning type projection exposure provided with a projection lens formed from multiple lenses, wherein the line width for a plurality of patterns (Cnn) for the photomask present in a region (SA2) transferr...
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WO/2018/014554A1 |
A mask plate (10) and fabrication method therefor. The mask plate (10) comprises: a frame (11), which comprises a hollow portion (111) and a rim (112) surrounding the hollow portion (111); an opening plate (12), which is provided on the ...
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WO/2018/010227A1 |
A photo mask with an exposure compensation function (1, 2, 3, 4, 5), comprising light shielded areas (11, 21, 31, 41, 51) and exposure areas (12, 22, 32, 42, 52) surrounded by the light shielded areas (11, 21, 31, 41, 51). The exposure a...
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WO/2018/010940A1 |
Provided is a process, including: obtaining data specifying a layout of a lithographic pattern; obtaining performance metrics of a computational analysis of the layout, the performance metrics indicating performance of one or more comput...
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WO/2018/010228A1 |
A photo mask with an exposure compensation function (1, 2), comprising light shielded areas (11, 21) and exposure areas (12, 22) surrounded by the light shielded areas (11, 21). The exposure areas (12, 22) comprise compensation sub-areas...
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WO/2018/012324A1 |
A pellicle frame (2) which can effectively suppress deformation of an exposure master plate (8) caused by adhesion of the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided. ...
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WO/2018/012323A1 |
A pellicle frame (2) which can effectively suppress deformation of an exposure master plate (8) caused by adhesion of the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided; ...
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WO/2018/008594A1 |
Provided are: a pellicle film which has higher EUV transmittance; a pellicle frame; and a pellicle. Also provided are: an original plate for light exposure, which uses this pellicle film, pellicle frame or pellicle and enables the achiev...
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WO/2018/004678A1 |
Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, and in particular, relate to an apparatus and method for scanning the microelectronic substrate through a cryogenic fluid mixture used to t...
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WO/2018/004646A1 |
An embodiment includes a system comprising: a photoresist solution; wherein the solution, in equilibrium, comprises: (a)(i) a stabilized metal oxide, (a)(ii) a destabilized metal oxide, and (a)(iii) an organic ligand that is not bonded t...
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WO/2018/003603A1 |
Provided are: a pellicle film for extreme ultraviolet (EUV), said pellicle film having reduced adhesion of dust and the like; a pellicle frame body; a pellicle; and a method for manufacturing the pellicle. In this method for manufacturin...
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WO/2018/004815A1 |
Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes ma...
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WO/2017/220930A1 |
The invention relates to a system (2) for producing an optical mask (35) for surface microtexturing, said system (2) comprising: a substrate (10) having a surface (11) that is to be textured; a layer of material (20) which covers the sur...
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WO/2017/220929A1 |
The invention relates to a system (2) for producing an optical mask (35) for surface treatment, in particular surface microtexturing, said system (2) comprising: a layer of material (20) which has an outer surface (21) that is exposed to...
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WO/2017/218860A1 |
A metrology apparatus has an illumination source that directs collimated light to a reference surface and to an optical component having a test surface that is in parallel with the reference surface. A first imaging lens defines a Fourie...
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WO/2017/214081A1 |
Presented here are manufacturing techniques to create an irregularly shaped electronic display, including a hollow within which a sensor, such as a camera, can be placed. The manufacturing techniques enable the creation of the hollow any...
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WO/2017/211090A1 |
A mask plate and substrate spacing column, and a method for manufacturing same, and a display panel containing the substrate spacing column. In the mask plate, at least one exposure zone (30) is formed; the at least one exposure zone (30...
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WO/2017/211544A1 |
Disclosed is a method of determining a pellicle compensation correction which compensates for a distortion of a patterning device resultant from mounting of a pellicle onto the patterning device. The method comprises determining a pellic...
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WO/2017/210958A1 |
A halftone mask and a method for manufacturing a TFT substrate. The halftone mask comprises first and second non-transparent regions (910, 920) respectively corresponding to positions of a source electrode and a drain electrode of a TFT,...
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WO/2017/213817A1 |
Provide is a method of patterning spacers, the method comprising: providing an initial patterned structure in a substrate in a processing chamber, the initial patterned structure comprising an organic mandrel and an underlying layer; exp...
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WO/2017/207297A1 |
The invention relates to a method and an appliance for predicting the imaging result obtained with a mask when a lithography process is carried out, wherein the mask comprises mask structures to be imaged and the mask is destined to be i...
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WO/2017/206577A1 |
A mask plate, comprising a completely light transmissive region (100) and a completely light shielding region (200). A semi-light transmissive structure (300) is provided at the junction of the completely light transmissive region (100) ...
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WO/2017/206809A1 |
A method for correction of an optical proximity effect, comprising: parsing and dividing the periphery of a design pattern to obtain segments to process; for a segment having a corner comprising a segment side (101) and an adjacent side ...
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