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Matches 1,001 - 1,050 out of 29,297

Document Document Title
WO/2018/055994A1
The present invention provides a support frame for pellicles that has both low dusting characteristics and high light fastness and the ion elution amount of which is reduced to the utmost limit to an extent that noise is not generated ev...  
WO/2018/046377A1
A source grating structure (G0) for interferometric X-ray imaging cable of generating a non-uniform intensity profile behind a surface (S) of the grating structure when exposed to X-ray radiation.  
WO/2018/048005A1
A mask protecting module is provided. The mask protecting module comprise a frame and a membrane supported by the frame, and the membrane may comprise areas that are different from each other in terms of at least one selected from optica...  
WO/2018/044678A1
A reticle pod includes an outer pod, an inner pod cover and an inner base plate. A reticle is supported on the base and is contained within the environment created by the inner pod cover and the inner pod base. The inner pod cover can in...  
WO/2018/043347A1
Provided is a pellicle production method which allows for the simplification of production steps. The pellicle production method comprises: a step for forming an SiC film (11) on a lower surface (21a) of an Si substrate (21); a step for ...  
WO/2018/037864A1
It tends to be difficult to create a phase shift film having a transmittance of 20% or more from a single layer phase shift film made of silicon nitride material; as such, provided is a mask blank including a phase shift film having a tr...  
WO/2018/037863A1
The purpose of the present invention is to provide a mask blank (100) of which a light-shielding film pattern (2a) has high ArF light resistance, and which solves the problem of detection sensitivity being insufficient when mask detectio...  
WO/2018/034460A1
The present invention relates to a photosensitive resin composition and a cured film prepared therefrom. The photosensitive resin composition additionally includes a thermal acid generator in addition to a conventional siloxane polymer, ...  
WO/2018/030703A1
The present invention relates to a nano protrusion forming method and a base material having a nano protrusion surface formed by the method, which forms, through a wet etching process by an acid solution without using a nano mask, an ant...  
WO/2018/029184A1
The invention concerns an optical system comprising a scanning unit, a first lens- element group comprising at least a first lens element, a focusing unit which is designed to focus beams onto a focus, wherein the focusing unit comprises...  
WO/2018/023838A1
A novel protection film for preventing from growing a haze on a photomask, comprising a frame (2) connected to a photomask (1) and a protection film (3) connected to ends of the frame (2). A gas channel is provided on the frame (2). Acco...  
WO/2018/022371A1
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber...  
WO/2018/020913A1
This mask blank is provided with a light blocking film on a light transmitting substrate. The light blocking film has an optical density of 2.5 or more with respect to ArF excimer laser exposure light, and has a structure that comprises ...  
WO/2018/020994A1
The present invention provides a mask blank substrate, a mask blank, and a transfer mask that enable deterrence of focus error even when a transfer mask having relatively sparse transfer patterns is manufactured without using a high-spec...  
WO/2018/022372A1
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a an absorber layer on the capping layer, the absorber layer made from an alloy of at least ...  
WO/2018/017478A1
Disclosed are methods and materials for removing groups from a polymer.  
WO/2018/016262A1
The present invention provides a mask blank in which a correction rate of EB defect correction is sufficiently fast and a correction rate with respect to a translucent substrate to EB detect correction is sufficiently high, even when a p...  
WO/2018/015114A1
A direct write exposure apparatus configured to process a plurality of substrates is described, the apparatus comprising: - a substrate holder configured to hold a substrate having a usable patterning area; - a patterning system configur...  
WO/2018/016485A1
Provided is a photomask used in scanning type projection exposure provided with a projection lens formed from multiple lenses, wherein the line width for a plurality of patterns (Cnn) for the photomask present in a region (SA2) transferr...  
WO/2018/014554A1
A mask plate (10) and fabrication method therefor. The mask plate (10) comprises: a frame (11), which comprises a hollow portion (111) and a rim (112) surrounding the hollow portion (111); an opening plate (12), which is provided on the ...  
WO/2018/010227A1
A photo mask with an exposure compensation function (1, 2, 3, 4, 5), comprising light shielded areas (11, 21, 31, 41, 51) and exposure areas (12, 22, 32, 42, 52) surrounded by the light shielded areas (11, 21, 31, 41, 51). The exposure a...  
WO/2018/010940A1
Provided is a process, including: obtaining data specifying a layout of a lithographic pattern; obtaining performance metrics of a computational analysis of the layout, the performance metrics indicating performance of one or more comput...  
WO/2018/010228A1
A photo mask with an exposure compensation function (1, 2), comprising light shielded areas (11, 21) and exposure areas (12, 22) surrounded by the light shielded areas (11, 21). The exposure areas (12, 22) comprise compensation sub-areas...  
WO/2018/012324A1
A pellicle frame (2) which can effectively suppress deformation of an exposure master plate (8) caused by adhesion of the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided. ...  
WO/2018/012323A1
A pellicle frame (2) which can effectively suppress deformation of an exposure master plate (8) caused by adhesion of the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided; ...  
WO/2018/008594A1
Provided are: a pellicle film which has higher EUV transmittance; a pellicle frame; and a pellicle. Also provided are: an original plate for light exposure, which uses this pellicle film, pellicle frame or pellicle and enables the achiev...  
WO/2018/004678A1
Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, and in particular, relate to an apparatus and method for scanning the microelectronic substrate through a cryogenic fluid mixture used to t...  
WO/2018/004646A1
An embodiment includes a system comprising: a photoresist solution; wherein the solution, in equilibrium, comprises: (a)(i) a stabilized metal oxide, (a)(ii) a destabilized metal oxide, and (a)(iii) an organic ligand that is not bonded t...  
WO/2018/003603A1
Provided are: a pellicle film for extreme ultraviolet (EUV), said pellicle film having reduced adhesion of dust and the like; a pellicle frame body; a pellicle; and a method for manufacturing the pellicle. In this method for manufacturin...  
WO/2018/004815A1
Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes ma...  
WO/2017/220930A1
The invention relates to a system (2) for producing an optical mask (35) for surface microtexturing, said system (2) comprising: a substrate (10) having a surface (11) that is to be textured; a layer of material (20) which covers the sur...  
WO/2017/220929A1
The invention relates to a system (2) for producing an optical mask (35) for surface treatment, in particular surface microtexturing, said system (2) comprising: a layer of material (20) which has an outer surface (21) that is exposed to...  
WO/2017/218860A1
A metrology apparatus has an illumination source that directs collimated light to a reference surface and to an optical component having a test surface that is in parallel with the reference surface. A first imaging lens defines a Fourie...  
WO/2017/214081A1
Presented here are manufacturing techniques to create an irregularly shaped electronic display, including a hollow within which a sensor, such as a camera, can be placed. The manufacturing techniques enable the creation of the hollow any...  
WO/2017/211090A1
A mask plate and substrate spacing column, and a method for manufacturing same, and a display panel containing the substrate spacing column. In the mask plate, at least one exposure zone (30) is formed; the at least one exposure zone (30...  
WO/2017/211544A1
Disclosed is a method of determining a pellicle compensation correction which compensates for a distortion of a patterning device resultant from mounting of a pellicle onto the patterning device. The method comprises determining a pellic...  
WO/2017/210958A1
A halftone mask and a method for manufacturing a TFT substrate. The halftone mask comprises first and second non-transparent regions (910, 920) respectively corresponding to positions of a source electrode and a drain electrode of a TFT,...  
WO/2017/213817A1
Provide is a method of patterning spacers, the method comprising: providing an initial patterned structure in a substrate in a processing chamber, the initial patterned structure comprising an organic mandrel and an underlying layer; exp...  
WO/2017/207297A1
The invention relates to a method and an appliance for predicting the imaging result obtained with a mask when a lithography process is carried out, wherein the mask comprises mask structures to be imaged and the mask is destined to be i...  
WO/2017/206577A1
A mask plate, comprising a completely light transmissive region (100) and a completely light shielding region (200). A semi-light transmissive structure (300) is provided at the junction of the completely light transmissive region (100) ...  
WO/2017/206809A1
A method for correction of an optical proximity effect, comprising: parsing and dividing the periphery of a design pattern to obtain segments to process; for a segment having a corner comprising a segment side (101) and an adjacent side ...  
WO/2017/207512A2
A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured...  
WO/2017/209330A1
The present invention relates to a laser exposure method capable of forming a dual line, an exposure apparatus, and a method and an apparatus for manufacturing a fine pattern having a dual line by using the laser exposure method. More sp...  
WO/2017/202665A1
A method is proposed involving obtaining data regarding an expected focus offset during a patterning process due to topography of a region of a substrate surface. A modification of a transmission or reflection of a region of a patterning...  
WO/2017/204113A1
[Problem] To be capable of generating two types of pulsed light having mutually different temporal intensity waveforms, by using a simple configuration. [Solution] A pulsed light generation device comprising: an optical coupler comprisin...  
WO/2017/202134A1
A mask management system (1) and a mask use method. The mask management system (1), comprises: a mask feeding module (11) configured to provide at least one mask group (100), each mask group (100) comprising a cartridge (101) and a plura...  
WO/2017/199728A1
This semiconductor device is provided with: first and second inspection mark regions (51a, 51b) having same patterns, each of which includes a plurality of superposition inspection marks (61a, 61b); a first element region (52) having a p...  
WO/2017/197915A1
A photolithography mask, manufacturing method thereof, and photolithography method employing the photolithography mask. The photolithography mask comprises a substrate (3), a mask pattern arranged on a surface of the substrate (3), and a...  
WO/2017/200159A1
The present invention relates to an overlay mark, and an overlay measurement method and a semiconductor device manufacturing method using the same. The present invention provides an overlay mark for determining the relative shift between...  
WO/2017/191932A1
Provided are a novel water-soluble diacetylene monomer, a photolithography composition comprising the water-soluble diacetylene monomer and a conductive polymer, and a fine pattern preparation method using same. The water-soluble diacety...  

Matches 1,001 - 1,050 out of 29,297