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Matches 701 - 750 out of 29,273

Document Document Title
WO/2020/076431A1
Generally, examples described herein relate to methods and apparatus for photomask processing. In an example, a photomask is obtained that is protected by a pellicle during a photolithography process. The photomask is cleaned by performi...  
WO/2020/071817A1
The present invention relates to a pellicle etching jig and a pellicle etching system. A pellicle etching jig according to one embodiment of the present invention comprises: a first support plate having a set thickness and a set area; a ...  
WO/2020/064217A1
A system for securing a particle to a pellicle membrane for subsequent use in a lithographic apparatus, the system comprising a particle securement device configured to secure the particle to the pellicle membrane. The particle securemen...  
WO/2020/062374A1
Disclosed are a photomask (1) and a manufacturing method therefor. The photomask (1) comprises: a fully shielded area (2) made of a light shielding material; and a semitransparent region (3), the number of which being set to at least one...  
WO/2020/062515A1
A photomask (50) for making a liner-type BPS and a liquid crystal display panel. The photomask (50) for making a liner-type BPS is provided with a liner pattern (52) for forming a main photo spacer color resist liner (51). The liner patt...  
WO/2020/062421A1
A photomask (100) and an exposure system, wherein the photomask (100) comprises a complete light-transmission area (10) and a complete light-shielding area (30) arranged in a manner of surrounding the outer periphery of the complete ligh...  
WO/2020/066591A1
Provided is a mask blank (100) provided with an etching stopper film (1): that exhibits a high resistance to dry etching that uses a fluorine-based gas and that is employed when patterning a phase shift film (3); and that additionally po...  
WO/2020/066590A1
Provided is a mask blank including an etching stopper film: that exhibits a high resistance to dry etching that uses a fluorine-based gas and that is employed when patterning a pattern-forming thin film; and that additionally possesses a...  
WO/2020/056863A1
Provided in the present disclosure is a light valve mask, which comprises a first substrate, a second substrate, a first electrode, a second electrode, and a light valve medium. The first electrode is provided on the lower surface of the...  
WO/2020/055894A1
An improved ANAB system or process substantially or fully eliminating contaminant particles from reaching a beam target by adding to the usual primary (first) ionizer of the ANAB system or process an additional (second) ionizer to ionize...  
WO/2020/054527A1
Provided is a mask blank wherein, even when a defect is present on the main surface of a substrate of the mask blank, the defect can be made to not affect a transfer image formed by a transfer mask, such that the mask blank is deemed acc...  
WO/2020/056310A1
Techniques and systems for improving wafer contrast by manipulating reflective extreme ultraviolet (EUV) mask absorber are described. Some embodiment disclosed herein provide for EUV absorber material, which transmits some EUV illuminati...  
WO/2020/054131A1
This phase shift mask blank comprises a substrate and a phase shift layer that is formed on the substrate; the phase shift layer contains chromium and oxygen; and the surface of the phase shift layer has an arithmetic mean height of 0.38...  
WO/2020/056080A1
A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at ...  
WO/2020/043675A1
A method for optimizing a binary mask pattern includes determining, by a processor, an evaluation value based on a comparison between a design pattern and a substrate pattern simulated based on the binary mask pattern. The method also in...  
WO/2020/043525A1
Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis ...  
WO/2020/045293A1
The present invention provides: a lightweight optical member which is able to be produced at a relatively low cost, and which is suppressed in strain due to temperature increase, while having a sufficiently blackened or darkened appearan...  
WO/2020/045299A1
The present invention provides: an FPD pellicle frame body in which external color is controlled so as to make it easy to prevent scattering of exposure light, to inspect for adhesion of foreign objects before use, etc.; and an efficient...  
WO/2020/045029A1
Provided is a reflective mask blank that can reduce the shadowing effect of a reflective mask and form a fine and high-precision absorbent body pattern. The reflective mask blank comprises a substrate, a multi-layer reflective film dispo...  
WO/2020/043474A1
A method of controlling an imaging process uses a qualified optical proximity correction (OPC) model, including obtaining an OPC model that is configured to model the behavior of OPC modifications to a pre-OPC design in a process for for...  
WO/2020/040339A1
Provided is an apparatus for producing a metal mask, comprising: a laser unit for generating a laser beam; a beam shaper unit for changing a spot condition of the laser beam; a beam splitter unit for splitting the laser beam into a plura...  
WO/2020/037947A1
An apparatus (20) and method for cleaning a mask. The apparatus (20) for cleaning a mask comprises: a machine body (200); a conveying means (230), comprising a carrier (232) capable of carrying a mask, and capable of moving the mask into...  
WO/2020/036935A1
A machine integrated positioning system (10) shows an operator where to place a raw part (20) in the press brake or other machinery (12). Further, the operator is informed if the dimensions associated with the raw part (20) are, or are n...  
WO/2020/030432A1
The invention relates to a method and to an assembly for characterizing a mask or a wafer for microlithography. A method according to the invention has the following steps: illuminating the object (104, 204) with electromagnetic radiatio...  
WO/2020/028171A1
The methods disclosed herein include recording at near-vertical first and second measurement positions respective first and second interferograms of the photomask surface and defining a difference map as the difference between the first ...  
WO/2020/024404A1
Disclosed are a mask plate (400) and a manufacturing method for a flexible liquid crystal display panel. The method comprises: obtaining a CF substrate (100) and a TFT substrate (200), which are aligned; implanting PSVA-type liquid cryst...  
WO/2020/023172A1
Embodiments of the present disclosure generally include apparatus and methods for removing adhesive residues from a surface of a lithography mask. In particular, the processing systems described herein provide for the delivery of a solve...  
WO/2020/017779A1
The present invention relates to a method for purifying a waste solution of a thinner and, more specifically, to a method for purifying a waste solution of thinner, by which a waste solution of a thinner used in a rinse process for clean...  
WO/2020/015947A1
Disclosed is a method of determining a characteristic of interest, in particular focus, relating to a structure on a substrate formed by a lithographic process, and an associated patterning device and lithographic system. The method comp...  
WO/2020/016626A1
The present invention refers to a method for determining an effect of one or more of pixels to be introduced into a substrate (110, 310) of a photolithographic mask (100, 300), the photolithographic mask (100, 300) having one or more pat...  
WO/2020/018631A1
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...  
WO/2020/018633A1
Described herein are apparatus and methods used to process a substrate in a chamber, in particular to position a non-round substrate in a holding chamber or a processing chamber. Further described herein are a 3D mapping device that is c...  
WO/2020/014179A1
Methods and film stacks for extreme ultraviolet (EUV) lithography are described. The film stack comprises a substrate with a hard mask, bottom layer, middle layer and photoresist. Etching of the photoresist is highly selective to the mid...  
WO/2020/012789A1
In this substrate processing device, a processing unit sequentially processes a plurality of substrates. During the substrate processing by the processing unit, an inspection unit operates in a pilot mode and inspection mode. When the in...  
WO/2020/011507A1
A method for determining the existence of a defect in a printed pattern includes obtaining a) a captured image of a printed pattern from an image capture device, and b) a simulated image of the printed pattern generated by a process mode...  
WO/2020/012653A1
The present invention addresses the problem of providing a method for manufacturing a photomask for forming a pattern on a curved section of a molded article. The above-described problem can be solved by a method for manufacturing a phot...  
WO/2020/010303A1
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises placing a substrate in a multi-cathode physical vapor deposition cham...  
WO/2020/009762A1
A lithography system for generating grating structures is provided having a multiple column imaging system located on a bridge capable of moving in a cross-scan direction, a mask having a grating pattern with a fixed spatial frequency lo...  
WO/2020/007546A1
An apparatus (200) comprising: a first gripping member (202) comprising a first magnetic element (204) and moveable between a first position and a second position; a first biasing member (210) configured to bias the first gripping member...  
WO/2020/009787A1
Embodiments described herein generally relate to an apparatus and methods for removing a glue residue from a photomask. The glue residue may be exposed when a pellicle is removed from the photomask. Before a new pellicle can be adhered t...  
WO/2020/009169A1
A pellicle frame (1) according to an aspect of the present disclosure has a rectangular shape in plan view, and is provided with one or more recesses (25) in an outer peripheral surface (13) of the pellicle frame (1), the one or more rec...  
WO/2020/008977A1
The purpose of the present invention is to provide: a pellicle complex that has fewer out-gassing occurrences; and a production method for the pellicle complex. This pellicle complex has a pellicle membrane (A) and a pellicle frame (B) j...  
WO/2020/008978A1
The objective of the present invention is to provide a reinforced pellicle film that suppresses the generation of outgas, has high heat resistance and durability, and has excellent EUV transmissivity. A reinforced pellicle film character...  
WO/2020/008976A1
A pellicular complex comprises a carbon film (A), a film part (B) face-to-face-bonded to one side of the carbon film, and a frame part (C) that is arranged along the outer edge of the film part (B), wherein an element constituting the fr...  
WO/2020/008021A1
The invention relates to a method (900) for evaluating a statistically distributed measured value (100, 300, 350) in the examination of an element (810) for a photolithography process, comprising the following steps: (a) using a pluralit...  
WO/2020/006308A1
The systems and methods discussed herein are for the fabrication of diffraction gratings, such as those gratings used in waveguide combiners. The waveguide combiners discussed herein are fabricated using nanoimprint lithography (NIL) of ...  
WO/2020/003053A1
Τ-phase-shifted fiber Bragg gratings in optical waveguides, and methods of formation thereof. Sensing apparatus comprising such gratings using femtosecond pulse duration lasers and specialized transmission diffraction elements or phase ...  
WO/2020/001831A1
Disclosed is a method for assigning features into at least first features and second features, said first features being for at least one first patterning device configured for use in a lithographic process to form corresponding first st...  
WO/2020/004854A1
The present application relates to a plasma etching method using a faraday box, comprising the steps of: providing a base material for etching in the faraday box having a mesh part provided on the upper surface thereof; shielding at leas...  
WO/2019/242280A1
Provided is a mask plate (60), comprising: a plurality of light shielding strips, the plurality of light shielding strips being configured to block light, and the gaps surrounded by the plurality of light shielding strips allowing light ...  

Matches 701 - 750 out of 29,273