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WO/2020/103187A1 |
Disclosed are a photomask for use in manufacturing an active switch and a manufacturing method of a display panel. The photomask comprises a light-blocking region, a translucent region, a transparent region and an exposed region. The lig...
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WO/2020/100632A1 |
Provided are a reflective photomask blank and a reflective photomask which have good irradiation resistance and which can obtain good transfer performance. In the reflective photomask blank (10), a reflective layer (2) for reflecting inc...
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WO/2020/101822A1 |
A method of aligning a plate containing a substrate is disclosed wherein multiple cameras with distinct fields of view are aligned with mark cells that are within the field of view of each of the multiple cameras. Tn one example embodime...
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WO/2020/099072A1 |
A pellicle for EUV lithography comprising: a frame; and a membrane supported by the frame, wherein the membrane comprises: a metallic or semimetallic layer, wherein the membrane comprises pores at a density of at least 5 per µm2. The me...
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WO/2020/096731A1 |
Embodiments of the present disclosure are related to systems and methods for autofocusing an imaging apparatus in real-time during substrate scanning to pattern a substrate that includes a photoresist formed over one or more patterned ma...
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WO/2020/096759A1 |
A container for supporting a workpiece, the workpiece including a chamfer around upper and lower edges of the workpiece is disclosed. The container includes a door and a shell capable of coupling with the door to define an isolated envir...
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WO/2020/095959A1 |
The present invention allows improvement in the accuracy of conversion from a coordinate system of a defect inspection device for detecting defects on a multilayer reflection film into a coordinate system of a device other than the defec...
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WO/2020/092963A1 |
Materials and methods to immobilize photoacid generators on semiconducting substrates are provided. PAG-containing monomers are copolymerized with monomers to allow the polymer to bind to a surface, and optionally copolymerized with mono...
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WO/2020/082630A1 |
A method for manufacturing a base plate and a display panel, comprising: providing a first substrate (210); sequentially forming a plurality of photoresist layers (211, 212, 213) arranged in parallel on the first substrate (210) so as to...
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WO/2020/083731A1 |
Inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus comprising: - a vacuum chamber; - a load lock forming an interface between the vacuum chamber and an ambi...
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WO/2020/086933A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/086932A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate having a first side and a second side; a backside coating layer comprising an al...
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WO/2020/078180A1 |
A mask, a display substrate and a manufacturing method therefor, and a display device, relating to the technical field of display. The mask comprises a transparent region (52), a first opaque region, and a first partially transparent reg...
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WO/2020/081842A1 |
The present disclosure provides masks suitable for Extreme Ultraviolet (EUV) and X-ray lithography by including a non-reflective region within the reflective multilayer. This non-reflective region replaces a typical absorber layer used t...
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WO/2020/078985A1 |
The invention describes a method for moving a structure (220) on a semiconductor article (180, 410) comprising providing a focused charged particle beam device (250), providing a semiconductor article (180, 410) comprising a substrate (2...
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WO/2020/078721A1 |
A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region ...
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WO/2020/073391A1 |
Provided in the present application is a photomask and display panel manufacturing method. The manufacturing method comprises: simulating the exposure conditions of a part of a photomask corresponding to production; manufacturing the par...
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WO/2020/074356A1 |
Described herein is a method for source mask optimization with a lithographic projection apparatus. The lithographic projection apparatus comprises an illumination source and projection optics configured to image a mask design layout ont...
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WO/2020/076431A1 |
Generally, examples described herein relate to methods and apparatus for photomask processing. In an example, a photomask is obtained that is protected by a pellicle during a photolithography process. The photomask is cleaned by performi...
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WO/2020/071817A1 |
The present invention relates to a pellicle etching jig and a pellicle etching system. A pellicle etching jig according to one embodiment of the present invention comprises: a first support plate having a set thickness and a set area; a ...
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WO/2020/064217A1 |
A system for securing a particle to a pellicle membrane for subsequent use in a lithographic apparatus, the system comprising a particle securement device configured to secure the particle to the pellicle membrane. The particle securemen...
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WO/2020/062374A1 |
Disclosed are a photomask (1) and a manufacturing method therefor. The photomask (1) comprises: a fully shielded area (2) made of a light shielding material; and a semitransparent region (3), the number of which being set to at least one...
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WO/2020/062515A1 |
A photomask (50) for making a liner-type BPS and a liquid crystal display panel. The photomask (50) for making a liner-type BPS is provided with a liner pattern (52) for forming a main photo spacer color resist liner (51). The liner patt...
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WO/2020/062421A1 |
A photomask (100) and an exposure system, wherein the photomask (100) comprises a complete light-transmission area (10) and a complete light-shielding area (30) arranged in a manner of surrounding the outer periphery of the complete ligh...
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WO/2020/066591A1 |
Provided is a mask blank (100) provided with an etching stopper film (1): that exhibits a high resistance to dry etching that uses a fluorine-based gas and that is employed when patterning a phase shift film (3); and that additionally po...
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WO/2020/066590A1 |
Provided is a mask blank including an etching stopper film: that exhibits a high resistance to dry etching that uses a fluorine-based gas and that is employed when patterning a pattern-forming thin film; and that additionally possesses a...
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WO/2020/056863A1 |
Provided in the present disclosure is a light valve mask, which comprises a first substrate, a second substrate, a first electrode, a second electrode, and a light valve medium. The first electrode is provided on the lower surface of the...
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WO/2020/055894A1 |
An improved ANAB system or process substantially or fully eliminating contaminant particles from reaching a beam target by adding to the usual primary (first) ionizer of the ANAB system or process an additional (second) ionizer to ionize...
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WO/2020/054527A1 |
Provided is a mask blank wherein, even when a defect is present on the main surface of a substrate of the mask blank, the defect can be made to not affect a transfer image formed by a transfer mask, such that the mask blank is deemed acc...
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WO/2020/056310A1 |
Techniques and systems for improving wafer contrast by manipulating reflective extreme ultraviolet (EUV) mask absorber are described. Some embodiment disclosed herein provide for EUV absorber material, which transmits some EUV illuminati...
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WO/2020/054131A1 |
This phase shift mask blank comprises a substrate and a phase shift layer that is formed on the substrate; the phase shift layer contains chromium and oxygen; and the surface of the phase shift layer has an arithmetic mean height of 0.38...
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WO/2020/056080A1 |
A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at ...
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WO/2020/043675A1 |
A method for optimizing a binary mask pattern includes determining, by a processor, an evaluation value based on a comparison between a design pattern and a substrate pattern simulated based on the binary mask pattern. The method also in...
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WO/2020/043525A1 |
Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis ...
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WO/2020/045293A1 |
The present invention provides: a lightweight optical member which is able to be produced at a relatively low cost, and which is suppressed in strain due to temperature increase, while having a sufficiently blackened or darkened appearan...
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WO/2020/045299A1 |
The present invention provides: an FPD pellicle frame body in which external color is controlled so as to make it easy to prevent scattering of exposure light, to inspect for adhesion of foreign objects before use, etc.; and an efficient...
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WO/2020/045029A1 |
Provided is a reflective mask blank that can reduce the shadowing effect of a reflective mask and form a fine and high-precision absorbent body pattern. The reflective mask blank comprises a substrate, a multi-layer reflective film dispo...
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WO/2020/043474A1 |
A method of controlling an imaging process uses a qualified optical proximity correction (OPC) model, including obtaining an OPC model that is configured to model the behavior of OPC modifications to a pre-OPC design in a process for for...
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WO/2020/040339A1 |
Provided is an apparatus for producing a metal mask, comprising: a laser unit for generating a laser beam; a beam shaper unit for changing a spot condition of the laser beam; a beam splitter unit for splitting the laser beam into a plura...
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WO/2020/037947A1 |
An apparatus (20) and method for cleaning a mask. The apparatus (20) for cleaning a mask comprises: a machine body (200); a conveying means (230), comprising a carrier (232) capable of carrying a mask, and capable of moving the mask into...
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WO/2020/036935A1 |
A machine integrated positioning system (10) shows an operator where to place a raw part (20) in the press brake or other machinery (12). Further, the operator is informed if the dimensions associated with the raw part (20) are, or are n...
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WO/2020/030432A1 |
The invention relates to a method and to an assembly for characterizing a mask or a wafer for microlithography. A method according to the invention has the following steps: illuminating the object (104, 204) with electromagnetic radiatio...
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WO/2020/028171A1 |
The methods disclosed herein include recording at near-vertical first and second measurement positions respective first and second interferograms of the photomask surface and defining a difference map as the difference between the first ...
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WO/2020/024404A1 |
Disclosed are a mask plate (400) and a manufacturing method for a flexible liquid crystal display panel. The method comprises: obtaining a CF substrate (100) and a TFT substrate (200), which are aligned; implanting PSVA-type liquid cryst...
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WO/2020/023172A1 |
Embodiments of the present disclosure generally include apparatus and methods for removing adhesive residues from a surface of a lithography mask. In particular, the processing systems described herein provide for the delivery of a solve...
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WO/2020/017779A1 |
The present invention relates to a method for purifying a waste solution of a thinner and, more specifically, to a method for purifying a waste solution of thinner, by which a waste solution of a thinner used in a rinse process for clean...
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WO/2020/015947A1 |
Disclosed is a method of determining a characteristic of interest, in particular focus, relating to a structure on a substrate formed by a lithographic process, and an associated patterning device and lithographic system. The method comp...
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WO/2020/016626A1 |
The present invention refers to a method for determining an effect of one or more of pixels to be introduced into a substrate (110, 310) of a photolithographic mask (100, 300), the photolithographic mask (100, 300) having one or more pat...
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WO/2020/018631A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/018633A1 |
Described herein are apparatus and methods used to process a substrate in a chamber, in particular to position a non-round substrate in a holding chamber or a processing chamber. Further described herein are a 3D mapping device that is c...
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