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WO/2008/013886A2 |
A method and system are disclosed for aligning a lithography template (120) having a pattern with a sunstrate (130) in preparation for transferring the pattern to a surface of the substrate (130). The system includes an optical imaging s...
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WO/2008/013798A2 |
A contact lithography system includes a patterning tool (110) having a pattern for transfer to a substrate (130); and at least one alignment device (140) coupled to the patterning tool (110). The alignment device (140) is configured to m...
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WO/2008/007173A1 |
A wafer comprises a multi-layer structure (100). The multilayer structure (100) includes a first device structure neighbouring an area (106) for receiving alignment markers. A plurality of alignment markers (110) extend into the multilay...
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WO/2008/004777A1 |
A nanodevice structure according to the present invention includes a substrate (10) having alignment marks (16) formed thereon, a plurality of nanomaterial layers (20) applied on the substrate, and electrodes formed to be in partial cont...
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WO/2008/001077A1 |
Printed circuit boards are manufactured by forming a composite layer using a control system which models a production process to generate data using non-linear compensation techniques to compensate for non-linear distortion occurring in ...
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WO/2007/144452A1 |
An organic-inorganic silicone material, which has a backbone containing -Si-O- units with chromophore groups attached directly to at least a part of the silicon atoms. The film forming composition and resulting coating properties can be ...
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WO/2007/145038A1 |
A proximity aligner (PE) comprises a substrate holding part (21) for holding a substrate (W) as a work to be exposed, a mask holding part (12) for holding a mask (M) having an exposure pattern, and an illumination optical system (40) for...
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WO/2007/142250A1 |
A gap measuring method for measuring a gap between two members by irradiating the two members, which are disposed opposite to each other, with light from one member side to obtain spectral data about intensity of reflected light or trans...
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WO/2007/139017A1 |
A substrate holding member (4) is provided with a first holding section (8) for removably holding a substrate (P) to be immersion-exposed, and a second holding section (9) for removably holding a liquid recovery member (30) having an ope...
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WO/2007/134000A2 |
An apparatus and method measures the gap between one substantially planar object, such as a mask, and a second planar object, such as a substrate. A gapping mark is used for measuring a gap between the first and second plates. The gappin...
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WO/2007/129688A1 |
Provided are a projection exposure device and a projection exposure method capable of positioning a substrate at an appropriate position without using a position measuring device such as an interferometer for measuring the position of a ...
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WO/2007/123249A2 |
In an alignment method for effecting alignment between two plate-like objects, a first plate-like object provided with a first alignment mark and a second plate-like object provide with a second alignment mark are disposed opposite to ea...
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WO/2007/119475A1 |
A disc master exposure device comprises a turntable for turning a disc master, a moving means for moving the turntable horizontally in at least one direction, a beam irradiating means for irradiating an electron beam toward the turntable...
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WO/2007/121300A2 |
An interferometric-spatial-phase imaging (ISPI) system includes a substrate wafer. An alignment configuration is permanently embedded in the substrate wafer. The alignment configuration uses a global coordinate reference system by provid...
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WO/2007/121208A2 |
An interferometric-spatial-phase imaging (ISPI) system includes an alignment mechanism for obtaining continuous six-axis control of a scanning probe tip with respect to a coordinate system attached to a substrate. A gap detection mechani...
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WO/2007/117519A2 |
The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method inc...
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WO/2007/117319A2 |
A phase shift mask (10) that corresponds to a layer of at least one semiconductor die (14) has a substrate. A method thereof includes overlying a phase shifter film (38) over the substrate. A permanent light calibration feature (34) is p...
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WO/2007/117452A1 |
An imaging and punching thermal control system and related method for a plate imaging system including a thermal sensor system coupled to the imaging and the punching device that generates one or more measured signals; a controller that ...
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WO/2007/113933A1 |
An exposure method which can perform exposure precisely without using a large photomask. In the exposure method, exposure is performed while moving a photomask relatively above a substrate. The method comprises a mask position correcting...
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WO/2007/102987A1 |
An apparatus, systems, and methods to print multiple fields on a substrate in parallel are provided. The apparatus incorporates a lithographic apparatus composed of two or more lithographic heads coupled to a common housing as a unit, wi...
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WO/2007/097380A1 |
An aerial image measuring apparatus is partially arranged on a wafer stage (WST), and the rest is partially arranged on a measuring stage (MST), and measures the aerial image of a mark formed by a projection optical system (PL). Thus, fo...
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WO/2007/097379A1 |
The plane position information of the front plane of a wafer (W) is detected at a plurality of detecting points set at prescribed intervals in an X axis direction by multiple point AF systems (90a, 90b), while a wafer stage (WST) is line...
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WO/2007/086316A1 |
During repeated steps (step 201 to step 213) in the lot process, in step 211, an analysis apparatus (500) detects a superposition failure, i.e., deterioration of superposition accuracy and optimizes an apparatus parameter of an exposure ...
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WO/2007/083758A1 |
Y-direction position information on a moving body (RST) is measured by using a interferometer (16y) and encoders ((24A, 26A1), (24B, 26B1) having an excellent short-period stability as compared to the interferometer. According to the mea...
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WO/2007/079639A1 |
A TTL (Through The Lens) alignment system used in a projection exposure apparatus having at least a projection optical system, a reticle, an object stage, an exposure object, and a motion control system comprises at least two position al...
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WO/2007/077920A1 |
An exposure device (100) exposes a substrate (W) to form a pattern. The exposure device (100) includes a first platform tower (14) and a second platform tower (16) arranged at a predetermined interval, and an exposure body (18) having a ...
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WO/2007/077925A1 |
During a movement of a wafer stage (WST) from a loading position for introducing a wafer (W) onto a wafer stage (WST) to an exposure start position where exposure to the wafer (W) is started, at least a part of an alignment system (ALG1,...
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WO/2007/077926A1 |
A plurality of marks are successively detected within a measuring area separated in a Y axis direction from an exposure area directly under a projection unit (PU), while shifting the detecting area of an alignment system (ALG) in the Y a...
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WO/2007/069480A1 |
An aligner and an aligning method by which the cost of a photomask can be reduced and the time required for aligning the photomask can be shortened. On a photomask (1a), a translucent pattern (11) capable of transmitting light energy is ...
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WO/2007/069222A2 |
The invention relates to a device comprising a first material (10) and a second material. (20) whereby the first and the second material are so provided towards each other as to form at least one focusing microstructure with a focal poin...
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WO/2007/068978A1 |
The present invention relates to a hologram viewing arrangement, to an alignment device, to a display device, to a device for aligning first and second members and to a device for aligning an optical beam with a desired target. A hologra...
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WO/2007/066758A1 |
A substrate holding device includes: a base; a support unit (81) formed on the base to support the rear surface of a substrate (P); a first wall (31) formed on the base, having a first upper surface opposing to the rear surface of the su...
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WO2007031842B1 |
A printing support is wholly manufactured within an irradiating machine (36) equipped with visible marks located on the lower plate and on the machine (3OB, 30L) . The laminar support supports the plates positioned on a dimensionally sta...
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WO/2007/061025A1 |
A wafer mark (M) formed on a wafer has a periodic structure wherein the strength of even-number-order diffracted light is made weaker than that of odd-number-order diffracted light, i.e., reflected light of illuminating light from a ligh...
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WO/2007/058151A1 |
Provided is a plane position detecting apparatus which can highly accurately detect the position of a plane to be detected by suppressing influence, which is of a relative positional shift due to polarization components generated in a lu...
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WO/2007/046407A1 |
[PROBLEMS] In a method for creating a template data for use in a template matching for recognizing a captured mark image data during drawing, based on a position indicted by the captured mark image data acquired by capturing a mark forme...
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WO/2007/046408A1 |
Disclosed is a plotting device for relatively moving a stage on which a recording medium is placed and a plotting head having a plurality of plotting elements in a predetermined scan direction and causing the plotting elements to plot pl...
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WO/2007/043324A1 |
In an exposure apparatus, a substrate side alignment mark formed on a color filter substrate (6) and a mask side alignment mark formed on a photomask (7) are caught within a same visual field and imaged by an imaging means (3). A stage (...
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WO/2007/043323A1 |
A photomask (1) is composed of a transparent base material (2) and a light shielding film (3) formed on one plane of the transparent base material (2). The photomask is provided with a plurality of mask patterns (4) which are arranged in...
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WO/2007/038134A2 |
A significant improvement in the alignment of a particle-beam-generated pattern relative to a pre-existing pattern present on a substrate has been accomplished using optical measurement to register the particle beam to the pre-existing p...
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WO/2007/034379A2 |
The invention relates to a system (1) for detecting motion of a body (2) comprising a first elongated grating strip (4) coupled to said body and a separate and substantially stationary second elongated grating strip (5) crossing said fir...
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WO/2007/031105A1 |
The present invention relates to alignment of a writing system and a workpiece (11). In particular, it relates to alignment to write a second layer pattern on a workpiece (11) that has a first layer pattern, using an SLM (21). It extends...
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WO/2007/031049A1 |
The invention relates to a device for determining the relative position in the X-Y plane of two substantially flat elements (2,3), which are arranged at a distance in the Z-direction substantially one above the other, using at least one ...
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WO/2007/019677A1 |
A method and apparatus for determining the alignment of printing plate mounted on an imaging drum, and applying an image to a printing plate while maintaining registration and alignment between the image and a reference edge of the print...
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WO/2007/018029A1 |
A color filter substrate (6) having an alignment mark is placed on a predetermined position of one end of a pattern region set on a surface. The color filter substrate (6) is conveyed by convey means (1) with the alignment mark ahead. Im...
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WO/2007/014451A1 |
A system and method for aligning tile images of an area of interest of an integrated circuit having N metal layers M, where N>1, includes a parametric representation algorithm for extracting parametric representations of edges from an im...
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WO/2007/013140A1 |
A plurality of first patterns each having a plurality of basic regions formed within one-shot exposure region are formed on a substrate. When forming second patterns corresponding tot he respective basic regions by a plurality of shots o...
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WO/2007/013612A1 |
A plotting device includes a plotting head for forming a plotting point on a substrate. The plotting head is moved relatively against the substrate and the plotting head plots an image on the substrate according to the movement. It is po...
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WO/2007/010971A1 |
A stage device (10) comprising a wafer holding member (14) on which a wafer (12) is placed, a Z-axis support base (18) liftably supporting the Z-axis member (16) of the water holding member (14), a θz support base (22) rotatably support...
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WO/2007/007549A1 |
A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurr...
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