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WO/2007/000921A1 |
An exposure apparatus and an exposure method that can reliably perform imaging of an alignment mark of a photosensitive material placed on a stage. While the stage having the photosensitive material placed on it is moved along a predeter...
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WO/2007/000890A1 |
An image position measuring apparatus is provided with a photographing unit, which includes an imaging element and/or a lens and measures the position of a reference mark formed on a work; and a correcting unit for correcting distortion ...
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WO/2007/001023A1 |
An exposure position is accurately controlled in exposure treatment for forming a structural member on a substrate. The substrate is arranged on a stage (22) of an exposure apparatus (31), photographing is performed by arranging a low ma...
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WO/2006/137396A1 |
An exposing method and an exposing device for transferring a pattern written on a photomask to a substrate. The photomask is arranged at a position covering a substrate. The photomask and the substrate touch each other uniformly to creat...
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WO/2006/129711A1 |
Firstly, various parameters required for mark recognition are inputted (step 201). An edge candidate position nearest to the specified position is selected (step 205) or an edge candidate position within a predetermined range based on th...
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WO/2006/118134A1 |
The position variations of partial image patterns sequentially drawn by a drawing apparatus are suppressed. By using previously acquired drawing position variation amount information on the drawing position variation amount representing ...
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WO/2006/118133A1 |
A work position information acquisition device can accurately acquire a position of a work with respect to a table. A table (14) on which a work (12) is placed is shifted relatively to imaging means (226) for imaging the portion on the t...
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WO/2006/115438A1 |
The present invention relates to a method for determining the coordinates of an arbitrarily shaped pattern in a deflector system. The method basically comprises the steps of: moving the pattern in a first direction (X), calculating the p...
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WO/2006/112484A1 |
A plotting device includes: a first convey unit (100) for conveying a measurement work (36a) relatively to exposure heads (24a to 24h); a first plotting unit (102) for successively plotting a test pattern image (112) on the measurement w...
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WO/2006/106746A1 |
[PROBLEMS] To expose a desired exposure image at a desired position on a substrate regardless of deformation of the substrate in the exposure method for exposing the exposure image by relatively shifting an exposure head with respect to ...
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WO/2006/105326A1 |
In formation of monolithic three dimensional memory arrays, a photomask may be used more than once. Reuse of a photomask creates second, third or more instances of reference marks used by the stepper to achieve alignment (alignment marks...
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WO/2006/101024A1 |
An exposure method is provided with a first step of measuring position information of a substrate (P) while shifting the substrate stage (PST) by controlling the substrate stage (PST) in a status where a light path space (K1) is filled w...
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WO/2006/095605A1 |
A light source unit (100A) for alignment is provided with a camera (30), a lighting apparatus (102), and furthermore, a changing section (110), an image processing section (112), an extracting section (114) and a setting section (116). T...
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WO/2006/091482A2 |
Improved autofocusing ('AF') methods and devices for lithography are provided. Some embodiments of the invention provide an AF system that includes one or more interferometers for measuring a distance to a wafer surface or a reticle surf...
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WO/2006/090914A1 |
A calibration method for an image rendering device is provided which calibrates offset in the direction around an optical axis of an alignment camera and enables improvement of the accuracy of correction of image rendering offset relativ...
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WO/2006/090870A2 |
An image forming device and method by which images can be formed with high positioning precision is provided. The image forming device comprises a stage on which a work is mounted, and a drawing device detecting a standard mark on the wo...
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WO/2006/090823A1 |
A rotating positional shift of an alignment camera, which is used for photographing an alignment mark of an object whereupon drawing is to be performed, around an optical axis is corrected, and correction accuracy of a drawing alignment ...
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WO/2006/090580A1 |
A method and a mechanism for positioning and holding a sheet body capable of easily and rapidly attaching and detaching the sheet body to and from a stage without damaging the sheet body and a drawing device using the method and the mech...
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WO/2006/088098A1 |
An XY stage two-dimensionally controlling the positions of slider parts on a lattice platen, comprising the plurality of slider parts controllably positioned independent of each other. Each of the plurality of slider parts comprises a po...
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WO/2006/085556A1 |
An image forming device is provided with a work temperature measuring means for measuring a standby work temperature; a stage temperature measuring means for measuring a temperature of a stage; and a waiting time computing means for obta...
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WO/2006/082639A1 |
A mark image processing device comprises an imaging control unit for imaging an alignment mark on a work a plurality of times by an imaging device while varying imaging conditions such as an illumination intensity or an exposure time, an...
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WO/2006/072583A2 |
Th invention relates to a method of calibration of the beam position of a corpuscular beam. A calibration body with structures is used, wherein the structures have a structure period Ps in the plain section and within each structure ther...
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WO/2006/060528A2 |
A method for forming spacers (22) of specific dimensions on a polysilicon gate electrode (20) protects the sidewalls (24) of the polysilicon gate electrode (20) during selective epitaxial growth. The spacers (22), whether asymmetric or s...
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WO/2006/059457A1 |
An alignment device enabling the suppression of a machine height even if its size is increased and capable of smoothly moving a table in XYѲ directions. The alignment device comprises a translationally driving, translating, and rotating...
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WO/2006/060562A2 |
Precision in scatterometry measurements is improved by designing the reticle, or the target grating formed by the reticle, for greater overlay measurement sensitivity. Parameters of the structure and material of the substrate are first d...
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WO/2006/059634A1 |
Disclosed is a stage device comprising a first moving stage (WST) for supporting and moving an article, an electrical contact (115) formed on the first moving stage (WST), and a grounding device (100) which comes into contact with the el...
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WO/2006/057263A1 |
Stopper mechanisms (48A, 48B) prevent a wafer table (WTB) and a measurement table (MTB) from approaching each other closer than a predetermined distance, and a drive mechanism (34A) can cancel the prevention. As a consequence, for exampl...
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WO/2006/058192A2 |
Using an imaging system (104) in relation to a plurality of material layers (114, 116) is described, the material layers being separated by a distance greater than a depth of field of the imaging system. A focal plane (106) of the imagin...
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WO/2006/054255A1 |
The invention relates to a system (1) for detecting motion of a body (2) , said body comprising a first diffraction pattern (3A) and a second diffraction pattern (3B) with a predetermined orientation relative to said first diffraction pa...
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WO/2006/046428A1 |
It is possible to configure a highly-accurate mark position detection device. Moreover, it is possible to provide an evaluation method capable of evaluating characteristics of the image formation optical system with a high sensitivity. F...
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WO/2006/046682A1 |
A reticle protective member, a reticle carrying apparatus, an exposure device, and a reticle carrying method. A position measuring device (29) measures the position of a position measurement mark (26) formed on the lower surface of a ret...
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WO/2006/041777A1 |
Systems and methods of aligning a lithographic mask (62) are described. In one aspect, a substrate (8) and a lithographic mask (62) are aligned based at least in part on a motive force between a substrate alignment mark (70) on the subst...
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WO/2006/036019A2 |
An image recording device recording an image on an image-forming region of a strip-shaped flexible substrate stretched between a supply reel and a take-up reel, the device having: a stage section structured to suck the flexible substrate...
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WO/2006/037027A1 |
A photomask may include a patterned layer, a phase-shift layer adjacent the patterned layer, a first aperture, a second aperture, and a light-absorbing layer. The first aperture may allow light to pass through the patterned layer and the...
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WO/2006/036017A1 |
An alignment section calibration system used in a device which handles elongated, flexible recording media, has an alignment section, a calibration member, and a relative moving mechanism. The alignment section is disposed so as to be ab...
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WO/2006/030727A1 |
In step 602, the grid of a wafer supplied is approximated by, for example, up to third degree of function fitting. In step 612, a residual error between the position of the sample shot area by the function and an actual position is compa...
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WO/2006/022309A2 |
The present invention provides a substrate positioning mechanism and a substrate positioning method, and a substrate conveying device equipped with the substrate positioning mechanism, and an image forming device equipped with the substr...
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WO/2006/020194A2 |
An improved lithographic alignment method, system, and template. The method includes creating, within a lithographic subfield, subsequent-layer features which are intentionally offset from their respective previous-layer features, where ...
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WO/2006/019166A1 |
[PROBLEMS] To provide an information display method capable of effectively performing analysis and evaluation of alignment results, which in turn enables easy setting of effective alignment condition and parameter. [MEANS FOR SOLVING PRO...
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WO2005110755B1 |
The invention relates to a method for feeding a plate to an impression cylinder of a printing press, to a method for producing said plate and to a device for laterally aligning and guiding a tympan sheet that is to be fed to a printing p...
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WO/2006/019617A1 |
Systems and techniques for alignment with latent images. In one implementation, a method includes detecting a location of a latent image on a substrate, repositioning the substrate based on the detected location of the latent image, and ...
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WO/2006/012388A2 |
Various test structures and methods for monitoring or controlling a semiconductor fabrication process are provided. One test structure formed on a wafer as a monitor for a lithography process includes a bright field target (30) that incl...
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WO/2006/007297A1 |
Improved integration of alignment or overlay and other processes. A semiconductor part such as a substrate of alignment has a plurality features, which may be included in alignment marks or overlay features. Elongated features such as du...
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WO/2006/005619A1 |
A method and apparatus is described for aligning a first article relative to a second article, for example for aligning a nanoimprint template with a semiconductor wafer. The method comprises the steps of: providing said second article w...
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WO/2006/003863A1 |
Exposure equipment (1) is provided with an exposure optical system (2) for irradiating a color filter board (6) with exposure light from a light source (7), and a transfer means (4), on which the color filter board (6) arranged to face t...
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WO/2005/124832A1 |
A plurality of measuring points in an off-axis surface position measuring device are disposed in a frame-form area MA so as to singly surround an exposure area IA. This allows a region on a wafer W reaching the exposure area IA to pass t...
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WO/2005/124834A1 |
An aerial image of a measurement mark (PM) provided on a measurement mask (Rm) is matched with a center in an X axis direction of a slit (122) provided on a Z tilt stage (38). While the measurement mark is irradiated with irradiation lig...
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WO/2005/122219A1 |
Disclosed is a substrate holder (PH) comprising a base (PHB), a first holding unit (PH1) which is formed on the base (PHB) for suction-holding a substrate (P), and a second holding unit (PH2) which is formed on the base (PHB) for suction...
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WO/2005/121903A2 |
The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.
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WO/2005/119370A2 |
A machine and method for high speed production of circuit patterns on silicon wafers or similar substrates may be used for applications including printing Integrated Circuit (IC) packaging patterns onto wafers prior to separating IC chip...
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