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WO/2005/119395A2 |
The present invention is directed towards a method and system of controlling movement of a body coupled to an actuation system that features translating movement of the body in a plane extending by imparting angular motion in the actuati...
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WO/2005/116577A1 |
A method of adjusting an imaging optical system capable of fine-adjusting the position of an adjusting optical element with good sensitivity. A lighting light in a specified wavelength band is applied to adjusting marks including a plura...
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WO/2005/114095A2 |
Methods and apparatus (100, 110) are disclosed for measurement of critical dimensions (CD) of features and detection of defects in reflecting UV, VUV, and EUV lithography masks and in transmitting UV and VUV lithography masks. The measur...
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WO/2005/106932A1 |
[PROBLEMS] To provide an analysis method for easily and suitably analyzing measurement data, which relates to manufacture of a device and dependent on a combination of a recipe and a process unit. [MEANS FOR SOLVING PROBLEMS] In the anal...
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WO/2005/106590A1 |
An exposure apparatus (1) relatively scans a glass board (8) by laser beams by an exposure optical system (3), and directly exposes a functional pattern on the glass board (8). The exposure apparatus is provided with an image pickup mean...
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WO/2005/106596A1 |
An exposure apparatus (1) relatively scans a glass board (8) with laser beams irradiated from an exposure optical system (3) in a direction orthogonally intersecting a shifting direction (arrow A) of the glass board, and exposes a functi...
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WO/2005/104756A2 |
The present invention provides methods, devices and device components for fabricating patterns on substrate surfaces, particularly patterns comprising structures having microsized and/or nanosized features of selected lengths in one, two...
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WO/2005/106595A1 |
An exposure apparatus is provided with a light deflecting means (10) provided in an exposure optical system (3) for deflecting laser beams in a shifting direction of a glass board (8), an image pickup means (5) for picking up an image of...
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WO/2005/106591A1 |
A reference glass board (8B) whereupon a reference pattern (P) to be an exposure position reference is previously formed is arranged on a lower side of a glass board (8A), and is transferred in an arrow A direction by a transfer means (4...
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WO/2005/106597A2 |
A flexographic printing plate and a method for making a flexographic printing plate. According to one aspect, the method comprises the steps of providing a photopolymer substrate having a top surface pretreated with a non-gelatinous inkj...
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WO/2005/104196A1 |
[PROBLEMS] To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. [MEANS FOR SOLVING PROBLEMS] In an alignment sensor of exposing equipment, in the case of performing posi...
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WO/2005/096353A1 |
[PROBLEMS] To reduce a superimpose error after exposure without using a plenty of time or cost. [MEANS FOR SOLVING PROBLEMS] An alignment condition decision device includes: an acquisition unit (610) for performing position measurement f...
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WO/2005/096354A1 |
At subroutine 201 and at step 205, the best focus plane of a projection optical system (PL) and the offset component of a multipoint AF system are detected as calibration information. During measurement of an alignment mark by means of a...
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WO/2005/093832A1 |
The invention relates to a method for producing an integrated circuit arrangement with an auxiliary indentation, particularly with aligning marks, and an integrated circuit arrangement. The invention also relates to a method for producin...
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WO/2005/091887A2 |
A plasma generated EUV light source reflecting element includes a multilayer stack (20) having at least one binary layer (30) comprising a first material (32) doped with a second material (34) and capping layers (22) including single and...
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WO/2005/092025A2 |
Methods and systems for measuring a characteristic of a substrate (90) or preparing a substrate (90) for analysis are provided. One method for measuring a characteristic of a substrate (90) includes removing a portion of a feature on the...
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WO/2005/092043A2 |
A method of making a printed circuit board by coating a surface of a substrate with an electrically conductive polymer and curing or setting the polymer on the substrate. The polymer coating is laced with a catalytic reducing agent.
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WO/2005/090931A1 |
The attenuation and phase shift properties of an embedded attenuated phase shift mask (EAPSM) maybe independently selected. After or during plowing of regions of an embedded phase shift layer, exposed regions of a substrate are etched to...
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WO/2005/088686A1 |
A step measuring method by which height distribution can be accurately measured in the case of exposing an object by a scanning exposure method, even when a plurality of areas having different heights due to steps exist in an asymmetrica...
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WO/2005/087969A1 |
An accuracy of alignment of a substrate with a mask is improved and a film forming plane of the substrate after film forming is protected by eliminating a positional shift of the substrate at the time of moving up and down a magnet. A su...
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WO/2005/083756A1 |
[PROBLEMS] To highly efficiently manufacture high-performance and high-quality micro devices at a high throughput. [MEANS FOR SOLVING PROBLEMS] Prior to carrying in a wafer W to exposure equipment (200) which is to expose the wafer W, a ...
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WO/2005/081059A1 |
Disclosed is a mask for photolithographic processes, comprising opaque and transparent zones and a surface structure. At least some opaque zones are embodied as positively resting zones while at least some transparent zones are spaced ap...
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WO/2005/081066A1 |
An optical lithography method is disclosed that uses double exposure of a reusable a chromeless alternating phase-shifting template mask and a binary trim mask to fabricate regularly-placed rectangular contacts in standard cells of appli...
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WO/2005/081290A1 |
An exposure apparatus capable of restricting expansion of damage even if liquid leaks to prevent reduction in operating rate and exposure accuracy. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) to...
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WO/2005/076935A2 |
A device for creating nano-sized features on a substrate having an extreme ultra violet source, and a mask positioned between the extreme ultra violet source and a photosentive material coated substrate for limiting the wavelengths trans...
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WO/2005/073764A1 |
Methods for imaging regular patterns are provided. A multi-channel imaging head is configured in accordance with the repeat of a pre-determined regular pattern such that no swath boundaries appear within the visibly imaged features of th...
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WO/2005/069082A1 |
A method is described for measuring a dimension on a substrate, wherein a target pattern (455) is provided with a nominal characteristic dimension that repeats at a primary pitch of period P, and has a pre-determined variation orthogonal...
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WO/2005/067815A1 |
In general, in a first aspect, the invention features a lithography system (100) that includes a stage (110) for supporting a wafer, an illumination system including a radiation source (155) and a lens assembly (150), wherein die illumin...
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WO/2005/065303A2 |
Magnetic nanoparticle masks for lithographic applications of a substrate and methods for producing such masks via defining regions of localized magnetic field maxima and minima on a substrate are provided. Also provided are methods for p...
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WO/2005/064410A2 |
A method according to one embodiment of the invention may be performed using a calibration plate (38) having at least one alignment marker (40) and at least one height profile (46). First, the calibration plate is positioned using an ali...
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WO/2005/062131A1 |
A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of a...
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WO/2005/059655A2 |
The invention relates to a process for the fabrication of a polymeric optical microstructure, being supported or not by a substrate, starting from a thermoplastic polymer, wherein a thermoplastic polymer is blended with an UV curable res...
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WO/2005/056294A1 |
A method of printing a patterned layer comprises (step 31 in Figure 4) detecting the position and alignment of clichés supported on subbeds on the bed of a printing machine (see Figure 5) using alignment marks thereon. The positions of ...
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WO/2005/053906A1 |
A method of manufacturing mirrors is disclosed comprising, producing two blocks of glass (10a,10b), joining the two blocks to produce a combined block whereby one surface (12) of the combined block comprises a plane and each of the two b...
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WO/2005/052695A1 |
The invention relates to a method for aligning two flat substrates with one another each having at least one aligning mark for mutual alignment, particularly for aligning a mark with a wafer before exposure. This method comprises a first...
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WO/2005/050316A2 |
An aspect of the present invention includes a method for patterning a workpiece. Said method including the actions of coating said workpiece with a layer sensitive to a writing wavelength of an electromagnetic radiation source, placing s...
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WO/2005/047974A2 |
In general, in one aspect, the invention features a method for determining the location of an alignment mark on a stage including measuring a location, x l, of a stage along a first measurement axis using an interferometry system, measur...
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WO/2005/045364A1 |
It is possible to detect position information on a plurality of partitioned areas arranged on a object according to a model. AIC(M’) of a model M’ having a small degree of freedom of parameters is compared to AIC(M) of a model M havi...
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WO/2005/045529A2 |
In general, in one aspect, the invention features a method that includes monitoring a position of a stage (140) along a first measurement axis and a second measurement axis of a multi-axis interferometry system and determining a position...
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WO/2005/043243A2 |
Embodiments of the invention provide methods and apparatuses for efficient and cost-effective imaging of alignment marks. For one embodiment, alignment mark imaging is accomplished separately from, and independent of product imaging thro...
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WO/2005/041291A2 |
A method and mask to improve measurement of alignment marks is disclosed. An exemplary embodiment of the invention includes a resist mask with patterned alignment mark comprising an assemblage of features whose spacing is smaller than th...
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WO/2005/040932A2 |
Method, apparatus and stamp for aligning a first surface (11) of a first object (10) with a second surface (22) of a second object (20), facing said first surface, wherein light of a predetermined wavelength is introduced into one (10) o...
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WO/2005/038523A2 |
One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template.
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WO/2005/036624A1 |
An exposure apparatus (EX) has a substrate stage (PST) capable of moving while holding a substrate (P), a substrate alignment system (5) for detecting an alignment mark (1) on the substrate (P) held by the substrate stage (PST) and detec...
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WO/2005/036620A1 |
An exposure device includes: a first control system (92) having a controller (56) for controlling a first stage according to its position deviation and an ILC controller (58) for acquiring a correction value group for bringing the positi...
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WO/2005/031458A2 |
A photomask (1900) for producing partial-depth features (712 and 912) in a photo-imageable polymer layer (412) on a wafer of a chip scale package (200) using exposure tools capable of resolving sizes of a critical dimension or larger, ha...
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WO/2005/029193A2 |
A method for determining a spatial property of an object includes obtaining a scanning low coherence interference signal from a measurement object that includes two or more interfaces. The scanning low coherence interference signal inclu...
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WO/2005/029192A2 |
An apparatus for positioning an object having a substrate and an overlying film and a portion of a photolithography apparatus relative to one another includes a photolithography apparatus relative to one another includes a photolithograp...
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WO/2005/029181A2 |
A pellicle membrane (1) is connected to a frame (3), substantially parallel to a reticle base plate (5), so as to define an enclosure with a space (9) between the reticle carried on the base plate (5) and the pellicle membrane (1). A mas...
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WO/2005/022258A2 |
A photomask and method for maintaining optical properties of the same are disclosed. The method includes providing a substrate including a first surface having an absorber layer formed thereon and a second surface located opposite the fi...
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