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WO/1996/019351A1 |
A printing process prints a continuously moving substrate (50) with elongate, semi-tone graphics. The printed substrate (50) is incorporated into a composite elastic material (48), in which the substrate (50) is contracted, thereby formi...
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WO/1996/011376A1 |
An on-axis through the lens optical alignment system for use in semiconductor manufacturing using step and scan photolithographic techniques. An optical alignment system uses a partially common path with the projection optics (16) optica...
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WO/1996/007870A1 |
A system (1) for aligning substrates (13) when preparing flat panel displays by lithography. A spherical reflector (3) (imaging mirror) is used to focus a small geometric object (5), such as a cross, etched at the center of the reflector...
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WO/1996/006738A1 |
An apparatus (1) and method for aligning flexible printing plates (251), and for accurately drilling pin register holes (191) therein, includes a three way adjustable table top assembly (23) which can be selectively adjusted in X and Y d...
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WO/1996/004592A1 |
A method and apparatus for repetitively imaging a mask pattern (C) on a substrate (W) are described. The focusing of the projection lens system used for imaging and various other parameters of the apparatus and the projection lens system...
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WO/1995/034025A1 |
A method and apparatus for repetitively imaging a mask pattern (C) on a substrate (W) are described. Various parameters of the apparatus and the projection lens system (PL) can be measured accurately and reliably and measuring devices of...
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WO/1995/020139A1 |
The present invention provides a grating-grating interferometric alignment system for microlithography. It includes an electromagnetic radiation source (116) of a coherent single or multiple discrete wavelengths or in some cases broadban...
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WO/1995/015004A1 |
The proposed support element for an automatic loading tray (10) of an exposure unit for silicon wafers has a circular section with an outer diameter compatible with guiding a loading station and smaller than that of a silicon wafer; the ...
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WO/1995/001874A1 |
This invention provides a setting process for printing including applying to a design a setting template including locating means, forming a printing plate (30) from the templated design, wherein the resulting printing plate (30) has loc...
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WO/1994/028796A1 |
A method for aligning layers used in the production of microelectronics components, comprises superpositioning a first layer (4), having a small selectively positioned x-ray-transparent area (3), over a second layer having an alignment d...
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WO/1994/029043A1 |
Apparatus for bending a lithographic plate (P) having an image thereon, comprising an inspection system (51) for (a) inspecting a plate held on a table (47) at an inspection station, (b) determining the extent to which the plate needs to...
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WO/1994/028374A1 |
There are first and second relatively movable plates (12 and 20). On a face of each of the first and second plates (12 and 20), there are first and second alignment marks (13 and 21), each being a linear grating of parallel lines of unif...
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WO/1994/024611A1 |
An on-axis through the lens optical alignment system for use in semiconductor manufacturing using step and scan photolithographic techniques. An optical alignment system uses a partially common path with the projection optics optical axi...
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WO/1994/022169A1 |
A composite target used in alignment of layers (22-26) on a wafer uses alignment marks placed in a target area (9, 10). First alignment marks (11) are composed of material from a first layer (22) placed on the wafer. As subsequent layers...
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WO/1994/020223A1 |
A method and apparatus for exposing a substrate of relatively large surface area to radiation according to a predetermined pattern recorded on a mask, particularly useful in applying a painted border to an automobile windshield, includes...
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WO/1994/018522A1 |
The structure of the optical system of this detection is simple, and the adjustment of this system is easy. The detection range is wide, and the resolution is high. The positional shift in a plane can be detected, and at the same time, t...
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WO/1994/007179A1 |
A system and method for exposing excess photoresist on the edges, sides and multiple surfaces of a photosensitized substrate. The substrate (1) is placed on a transparent chuck (2) and a mask (3) is placed on top of the substrate. The su...
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WO/1994/002807A1 |
A double-sided exposure apparatus (1) with an optical registration system accurately aligns and prints a circuit pattern on both sides of a workpiece, such as a circuit board (40). The apparatus, with exposure chamber (2), has a computer...
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WO/1994/001808A1 |
The system comprises a latent image detection device comprising an alignment device which uses non-actinic radiation (10) and which is intended for aligning the mask pattern with respect to the substrate (3) and is designed for detecting...
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WO/1994/001240A1 |
The apparatus for machining and material processing includes an excimer laser and a Fresnel zone plate array (FZP) positioned parallel to the workpiece, with the distance between the FZP and the workpiece being the focal length of the FZ...
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WO/1994/000802A1 |
In a process for monitoring the position of a printed image on a printing block (62), when the block is made, at least two marks (72, 74) are placed within the printed image (68) in a known position in such a way that they to do not inte...
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WO/1993/022143A1 |
Method and apparatus for mounting and presenting of multi-colour separation films in exactly coinciding and registering positions, e.g. in a copying machine, whereby inter-related part-colour films or carrier foils therefore are provided...
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WO/1993/017369A1 |
The invention relates to a multiple assembly register system which facilitates the production of even large assemblies with the aid of predetermined register standards in such a way that the assembly positions selected can be locked or s...
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WO/1993/014445A1 |
An improvement for reducing proximity effects comprised of additional lines, referred to as intensity leveling bars, into the mask pattern. The leveling bars perform the function of adjusting the edge intensity gradients of isolated edge...
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WO/1993/009467A1 |
A system and method for transferring a reticle (201) pattern to a substrate image (203) by scanning. The reticle is placed between an illumination system (118) and the projection lens (117). The substrate is located below the projection ...
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WO/1993/006618A1 |
A method and apparatus for forming patterns, which are applicable favorably to manufacturing semiconductor integrated circuits, etc., by a projective exposure method. In the method, a pattern provided on a first substrate (3) is projecte...
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WO/1992/016090A1 |
Apparatus for use in printing, e.g. a printed circuit on a substrate (9) comprises a table (4) and means, e.g. pins (40) for securing the substrate (9) thereto, a support (2, 3, 5, 16, 6, 8) adapted to rigidly mount a camera (7) on the t...
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WO/1992/008167A1 |
Alignment of two objects such as a mask (8) and a wafer (9) is achieved using crossed polarizer imaging and polarization sensitive targets (11, 15) to enhance signal contrast in proximity alignment. Two linearly polarized illumination be...
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WO/1992/004673A1 |
Memory technologies for storing include RAMS and CCDs. Adaptive memory capability and memory servo capability improve memory characteristics. In a RAM embodiment, a detector (220B, 220A) is used to detect a memory address condition (217)...
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WO/1992/003842A1 |
A method and a device for transferring minute patterns (12) on the mask (11) to the substratum (17) by means of illuminating optical system (1-10) projecting beams of illuminating light onto the mask (11) and a projection aligner having ...
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WO/1992/002041A1 |
In the production of three-dimensional structures made of single-crystal semi-conductor material, the orientation of the crystal lattice must be accurately known. Markers on the wafers are used for this purpose, previously in the form of...
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WO/1991/018401A1 |
A mask tray (132), used to hold and guide an X-ray mask (38) to the exposure column (36) of an X-ray lithography system (10), includes first and second holding means (148, 150) which engage vertical mask channels (140, 142) in the mask s...
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WO/1991/018259A1 |
An alignment system (86) for an X-ray lighography system (10) has an objective lens (110) positioned over an alignment mark (98) placed on a conventional X-ray mask membrane (37). Four orthogonally mounted light sources (126, 128, 130, a...
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WO/1991/018400A1 |
A pin chuck (68) holds a wafer (40) during translation in an X-ray lithography machine (10). The chuck (68) is designed to be the same size as the wafer (40) and includes a plurality of extensions (106) having tops along a common plane. ...
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WO/1991/010110A1 |
This invention relates to a lens system having chromatic aberration on the axis of a double-focus detector which utilizes chromatic aberration. One focal plane of the lens system consists of a light image forming plane of a short wavelen...
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WO/1990/013790A1 |
A positionng table for setting a work (17) in a predetermined position in a film forming apparatus, in which a base plate (2) movable in the X-direction is supported under a table (12) on which the work is placed, a reference member supp...
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WO/1990/013000A1 |
A projection/exposure device (1) according to this invention is comprised of an incidence optical system that projects obliquely light emitted from a light source 1 onto an exposed object (4), a detection device (3) that detects the inte...
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WO/1990/010891A1 |
A method and an apparatus for automation of the working step of cmposing in a process reproduction plant, wherein, based on a sketch of the product to be printed, first a layout pattern is created as computer-aided planning in the memory...
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WO/1990/002640A1 |
An apparatus for punching and/or cutting sheets of material carrying indicia, comprises a table (2) to receive sheets of material to be punched and/or cut, and means (4) for punching and/or cutting sheets of materials received on the tab...
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WO/1989/010584A1 |
An apparatus and a method for making a reticle mask is disclosed. A reticle mask (15) is made by the double pass method wherein scribe lines (14) are first drawn on the reticle mask (15). Thereafter, a product die pattern (32) is made in...
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WO/1989/006430A1 |
A step and repeat mechanism (16), used with an X-ray lithography system (10) for moving a wafer (40) to be exposed from position to position beneath the source of X-rays (34), includes means (46 and 48) for moving the wafer (40) to be ex...
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WO/1989/003051A1 |
An algorithmic based method and apparatus for registering halftone color separations using edge based registration techniques. Digital pictures are taken at two locations on each film, and, following optimal thresholding of the data, the...
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WO/1988/009945A1 |
The invention provides a positioning apparatus for accurately positioning one part of a device relative to another and is designed to be vacuum compatible for use in vacuum chambers at ultra-high vacuum. To achieve this, no lubrication i...
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WO/1988/000720A1 |
The image of a projection surface is first electro-optically traced in order to focus the image of an object projected onto a projection surface by optical means. Control signals for correcting the focussing position of the optical means...
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WO/1988/000362A1 |
A method of registering one image (6) of a reticle plate (5) formed by a projection lens (21) of an optical system on a coated substrate (1) with features created previously on the substrate by an earlier image projection, comprises form...
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WO/1987/004791A1 |
A printed circuit board imaging system automatically aligns (14) apertures on a board with reference points established by light beams (82, 84) located outside an exposure unit (12). The reference points have a known spatial relation to ...
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WO/1987/002791A1 |
The step-on-wafer process, also known as the step-and-repeat alignment process, for the production of very large scale integration (VLSI) microcircuitry with multi-layer interconnects, is greatly facilitated by incorporating, into at lea...
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WO/1987/002790A1 |
An apparatus for applying a phototool (48) to a light sensitive substrate (30) by means of a roller (40) for applying the phototool (48) to the substrate (30) and a vacuum restraining means (44) for restraining the phototool (48) to main...
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WO/1987/002178A1 |
This optical exposure apparatus is suitable for employment in the manufacture of semiconductors. It is desirable to minimize regions which cannot be used in exposure, which are produced around the circumferential edge of a surface being ...
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WO/1987/000968A1 |
A positioning table comprises: a single-bed table (11) supported so as to be rotatable and linearly movable within a plane; and feed means (18, 23, 28) for three axes, different in direction from each other, which are reciprocatable alon...
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